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Virtual metrology
In semiconductor manufacturing, virtual metrology refers to methods to predict properties of a wafer based on machine parameters and sensor data of…
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Related topics
Related topics
4 relations
Chemical vapor deposition
Etching (microfabrication)
Semiconductor device fabrication
Wafer (electronics)
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Partial co-training for virtual metrology
C. Nguyen
,
Xin Li
,
R. D. Blanton
,
Xiang Li
IEEE International Conference on Emerging…
2017
Corpus ID: 42744836
Virtual metrology is an important tool for industrial automation. To accurately build regression models for virtual metrology, we…
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2013
2013
Prediction and Control of Transistor Threshold Voltage by Virtual Metrology (Virtual PCM) Using Equipment Data
Tomoya Tanaka
,
S. Yasuda
IEEE transactions on semiconductor manufacturing
2013
Corpus ID: 22163140
This paper is a description of how to predict and control the transistor threshold voltage ( Vth) for an advanced system on chip…
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2012
2012
Optimal tuning of epitaxy pyrometers
Gian Antonio Susto
,
S. Pampuri
,
A. Schirru
,
A. Beghi
SEMI Advanced Semiconductor Manufacturing…
2012
Corpus ID: 10483152
Epitaxy is a process strongly dependent on wafer temperature. Unfortunately, the performance of the pyrometers in charge of…
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2011
2011
Multilevel Lasso applied to Virtual Metrology in semiconductor manufacturing
S. Pampuri
,
A. Schirru
,
G. Fazio
,
G. Nicolao
IEEE International Conference on Automation…
2011
Corpus ID: 12167160
In semiconductor manufacturing, the state of the art for wafer quality control is based on product monitoring and feedback…
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2011
2011
Benefit Model of Virtual Metrology and Integrating AVM Into MES
F. Cheng
,
J. Chang
,
Hsien-Cheng Huang
,
Chi-An Kao
,
Ying-Lin Chen
,
Ju-Lei Peng
IEEE transactions on semiconductor manufacturing
2011
Corpus ID: 27113997
Frequent monitoring in both tool and process is required to detect the quality issue early so as to improve the process stability…
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2008
2008
Performance Analysis of EWMA Controllers Subject to Metrology Delay
Ming-Feng Wu
,
Chien-Hua Lin
,
D. Wong
,
Shi-Shang Jang
,
S. Tseng
IEEE transactions on semiconductor manufacturing
2008
Corpus ID: 19392492
Metrology delay is a natural problem in the implementation of advanced process control scheme in semiconductor manufacturing…
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2007
2007
Development of a Generic Virtual Metrology Framework
Hsien-Cheng Huang
,
Y. Su
,
F. Cheng
,
Jiaqing Jian
IEEE International Conference on Automation…
2007
Corpus ID: 6639397
Virtual metrology (VM) is a technology to predict metrology variables using information about the state of the process for every…
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2006
2006
Multivariate simulation assessment for virtual metrology
Yeh-Tung Chen
,
Haw-Ching Yang
,
F. Cheng
Proceedings IEEE International Conference on…
2006
Corpus ID: 442894
To reduce cost, this paper proposes a system architecture to simulate and assess the multivariate of equipment properties. The…
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2006
2006
Importance of Data Quality in Virtual Metrology
Yi-Ting Huang
,
F. Cheng
,
Yeh-Tung Chen
Annual Conference of the IEEE Industrial…
2006
Corpus ID: 37144455
The purpose of VM is to enable the manufacturers to conjecture the wafer quality and deduce the causes of defects without…
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2004
2004
ON THE FUTURE OF 3-D VISUALIZATION IN NON-MEDICAL INDUSTRIAL X-RAY COMPUTED TOMOGRAPHY
J. M. Wells
2004
Corpus ID: 15071473
: The purpose of imaging is to capture and record the details of an object for both current and future analysis in a…
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