Chemical vapor deposition

Known as: Microwave plasma-assisted CVD, Low pressure chemical vapor deposition, PEVCD 
Chemical vapor deposition (CVD) is a chemical process used to produce high quality, high-performance, solid materials. The process is often used in… (More)
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Topic mentions per year

Topic mentions per year

1973-2017
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Papers overview

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2011
2011
There is large and growing interest in making a wide variety of materials and surfaces antimicrobial. Initiated chemical vapor… (More)
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2011
2011
An atmospheric pressure low-power, capacitively coupled RF plasma probe was designed and fabricated for selective-area chemical… (More)
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2009
2009
The conventional chemical vapor deposition system has been miniaturized to the micro scale, leading to several potential… (More)
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2008
2008
Centre Of Super-Diamond and Advanced Films (COSDAF), Department of Physics and Materials Science, City University of Hong Kong… (More)
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2003
2003
Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to… (More)
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1999
1999
The mechanism of copper chemical vapor deposition from Cu( II) bis-hexafluoroacetylacetonate [Cu ( hfac ) J and 1,5… (More)
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1999
1999
The fundamental surface chemistry underlying selectivity in copper chemical vapor deposition (CVD) from COD-Cu-hfac and Cu(hfac… (More)
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1998
1998
A model of a tungsten chemical vapor deposition (CVD) system is developed to study the CVD system thermal dynamics and wafer… (More)
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1981
1981
A simple mathematical model is established for low-pressure chemical vapor deposition (LPCVD) reactors which takes into account… (More)
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1975
1975
A new technique is described for the deposition of SnO<inf>2</inf>films based upon the pyrolysis of tetramethyltin (TMT) in… (More)
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