Optimal tuning of epitaxy pyrometers

@article{Susto2012OptimalTO,
  title={Optimal tuning of epitaxy pyrometers},
  author={Gian Antonio Susto and Simone Pampuri and Andrea Schirru and Alessandro Beghi},
  journal={2012 SEMI Advanced Semiconductor Manufacturing Conference},
  year={2012},
  pages={294-299}
}
Epitaxy is a process strongly dependent on wafer temperature. Unfortunately, the performance of the pyrometers in charge of sensing wafer temperature deteriorate with the usage. This represents the major maintenance issue for epitaxy process engineers who have to frequently calibrate pyrometers emissivity coefficient. At the present state the change of the emissivity coefficient is heuristically based on fab tradition and process engineers experience. We present a statistical tool to map the… CONTINUE READING

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