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Reactive-ion etching

Known as: RIE, Reactive ion etch, Reactive ion etching 
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than… 
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Related topics

Related topics

13 relations
Antenna effectCapacitively coupled plasmaDeep reactive-ion etchingDry etching

Broader (2)

Etching (microfabrication)Semiconductor device fabrication

Papers overview

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Highly Cited
2007
Highly Cited
2007
Spin transport through multilayer graphene
The magnetoresistance (MR) of Co/multilayer graphene/Co spin valve structures has been studied. A positive MR of up to 0.39% at… 
2006
2006
Reactive ion etching of fluorine containing photoresist
Photoresist are commonly used in semiconductor processing as soft masks for pattern transfer into multilayer stacks using… 
Highly Cited
2006
Highly Cited
2006
Fabrication of densely packed, well-ordered, high-aspect-ratio silicon nanopillars over large areas using block copolymer lithography
2005
2005
Nano-patterning using an embedded particle monolayer as an etch mask
2004
2004
Monolithic suspended optical waveguides for InP MEMS
We present a novel waveguide design for InP microelecromechanical systems. The substrate is removed from underneath the waveguide… 
Highly Cited
2002
Highly Cited
2002
Gallium Nitride Nanorods Fabricated by Inductively Coupled Plasma Reactive Ion Etching
We report a novel method of fabricating gallium nitride (GaN) nanorods of controllable dimension and density from GaN epitaxial… 
2001
2001
Indirect adaptive control of reactive ion etching using neural networks
This paper explores the use of neural networks for real-time, model-based feedback control of reactive ion etching (RIE). This… 
1996
1996
Very narrow linewidth asymmetric cladding InGaAs-GaAs ridge waveguide distributed Bragg reflector lasers
Asymmetric cladding InGaAs-GaAs ridge waveguide distributed Bragg reflector (RW-DBR) lasers are demonstrated with a spectral… 
1994
1994
Reactive ion etching of microlens arrays into fused silica
Microlens arrays made in photoresist can be transferred into fused silica substrates by reactive ion etching herby, the etch… 
1990
1990
Damage To Gate Oxides In Reactive Ion Etching
The damage incurred during reactive ion etching is studied by using MOS capacitors with various sizes of surface metal pads… 
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