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Dry etching
Known as:
Dry-etch
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of…
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Related topics
Related topics
12 relations
Broader (1)
Etching (microfabrication)
Isotropic etching
Microelectromechanical systems
Plasma ashing
Plasma etcher
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2017
Highly Cited
2017
Dry‐etching‐assisted femtosecond laser machining
Xue‐Qing Liu
,
Qidai Chen
,
+5 authors
Hongbo Sun
2017
Corpus ID: 43982479
Femtosecond laser machining has been widely used for fabricating arbitrary 2.5 dimensional (2.5D) structures. However, it suffers…
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Review
2014
Review
2014
A review of microfabrication techniques and dielectrophoretic microdevices for particle manipulation and separation
M. Li
,
W. H. Li
,
J. Zhang
,
G. Alici
,
W. Wen
2014
Corpus ID: 53632619
The development of lab-on-a-chip (LOC) devices over the past decade has attracted growing interest. LOC devices aim to achieve…
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Highly Cited
2009
Highly Cited
2009
Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry
S. Selvaraja
,
E. Sleeckx
,
+4 authors
R. Baets
2009
Corpus ID: 31245471
Highly Cited
2008
Highly Cited
2008
Vertical Silicon-Nanowire Formation and Gate-All-Around MOSFET
B. Yang
,
K. Buddharaju
,
S. Teo
,
N. Singh
,
G. Lo
,
D. Kwong
IEEE Electron Device Letters
2008
Corpus ID: 32235120
This letter presents a vertical gate-all-around silicon nanowire transistor on bulk silicon wafer utilizing fully CMOS compatible…
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Highly Cited
2006
Highly Cited
2006
Fabrication and performance of MEMS-based piezoelectric power generator for vibration energy harvesting
Hua-Bin Fang
,
Jingquan Liu
,
+5 authors
Yue Liu
Microelectronics Journal
2006
Corpus ID: 41761756
Highly Cited
2005
Highly Cited
2005
Luminescence properties of defects in GaN
M. Reshchikov
,
H. Morkoç
2005
Corpus ID: 120154864
Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented…
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Highly Cited
2004
Highly Cited
2004
Nanoscale protein patterning by imprint lithography
J. D. Hoff
,
Li-Jing Cheng
,
E. Meyhofer
,
L. Guo
,
A. Hunt
2004
Corpus ID: 14260723
Selective localization of active proteins to patterns or specific sites is important for development of biosensors, bioMEMS…
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Highly Cited
2004
Highly Cited
2004
Fabrication of Size-Controllable Nanofluidic Channels by Nanoimprinting and Its Application for DNA Stretching
L. Guo
,
Xing Cheng
,
C. Chou
2004
Corpus ID: 13981183
We report a new approach to greatly simplify the fabrication of nanofluidic channels with well-controlled dimensions. It is…
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Highly Cited
2002
Highly Cited
2002
Dry etching of polydimethylsiloxane for microfluidic systems
J. Garra
,
T. Long
,
J. Currie
,
Thomas D. Schneider
,
Robert I. White
,
M. Paranjape
2002
Corpus ID: 97892173
A fluorine-based reactive ion etch (RIE) process has been developed to anisotropically dry etch the silicone elastomer…
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Highly Cited
1996
Highly Cited
1996
Realization of atomic layer etching of silicon
S. Athavale
,
D. J. Economou
1996
Corpus ID: 98621576
An experimental system and methodology were developed to realize dry etching of single crystal silicon with monolayer accuracy…
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