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Dry etching
Known as:
Dry-etch
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of…
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Related topics
Related topics
12 relations
Broader (1)
Etching (microfabrication)
Isotropic etching
Microelectromechanical systems
Plasma ashing
Plasma etcher
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2012
2012
Dry Etching
E. Stamate
,
G. Yeom
Handbook of Visual Display Technology
2012
Corpus ID: 34706661
We covered wet etching which is essentially chemical and isotropic (because it is chemical, it is highly selective) Now we…
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2008
2008
Transpiration as a Mechanism for Mechanical and Electrical Energy Conversion.
R. T. Borno
2008
Corpus ID: 107774561
2004
2004
Probing the annular electronic shell structure of a magnetic corral
D. Uzur
,
A. Nogaret
,
H. Beere
,
D. Ritchie
,
C. Marrows
,
B. Hickey
2004
Corpus ID: 55247168
We report on B-periodic oscillations in the magnetoresistance of a circular magnetic billiard. These arise from singly periodic…
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2003
2003
Threshold dependence on the spectral alignment between the quantum-well gain peak and the cavity resonance in InGaAsP photonic crystal lasers
J. Cao
,
W. Kuang
,
S. Choi
,
Po-Tsung Lee
,
J. O'Brien
,
P. Dapkus
2003
Corpus ID: 121943560
Lithographically defined multiwavelength photonic crystal laser arrays are reported. The dependence of the threshold pump power…
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2003
2003
Deep dry etching process development for InP-based photonic crystals
van der Rw Rob Heijden
,
van der Ewjm Drift
,
+4 authors
H. Salemink
2003
Corpus ID: 59022203
A double layer mask strategy involving e-beam lithography, Reactive Ion Etching (RIE) of a SixNy-mask and deep Inductively…
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2002
2002
Characteristics of plasmaless dry etching of silicon-related materials using chlorine trifluoride gas
Yoji Saito
2002
Corpus ID: 101951722
Silicon substrates and thermally grown oxide films were exposed to ClF 3 gas at various temperatures between room temperature and…
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2002
2002
High-performance resist materials for ArF excimer laser and electron beam lithography
K. Nozaki
,
E. Yano
2002
Corpus ID: 59518468
High-performance resist materials for ArF (argon fluoride) excimer laser (λ = 193 nm) and electron beam (EB) lithography for…
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2000
2000
GaN-based NDR Devices for THz Generation
E. Alekseev
,
A. Eisenbach
,
D. Pavlidis
,
S. Hubbard
2000
Corpus ID: 16681721
GaN-based Negative Differential Resistance (NDR) diode oscillators have been studied by employing Gunn design criteria applicable…
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1996
1996
Future prospects for dry etching
Keizo Suzuki
,
N. Itabashi
1996
Corpus ID: 53765551
Abstract
1980
1980
1-/spl mu/m MOS Process Using Anisotropic Dry Etching
Nobuhiro Endo
,
Y. Kurogi
IEEE Journal of Solid-State Circuits
1980
Corpus ID: 778044
Anisotropic and selective etching of silicon has been obtained using a planar-reactive sputter-etching system and CC1/sub 3/F gas…
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