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Dry etching

Known as: Dry-etch 
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of… 
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Papers overview

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Highly Cited
2017
Highly Cited
2017
Femtosecond laser machining has been widely used for fabricating arbitrary 2.5 dimensional (2.5D) structures. However, it suffers… 
Review
2014
Review
2014
The development of lab-on-a-chip (LOC) devices over the past decade has attracted growing interest. LOC devices aim to achieve… 
Highly Cited
2008
Highly Cited
2008
This letter presents a vertical gate-all-around silicon nanowire transistor on bulk silicon wafer utilizing fully CMOS compatible… 
Highly Cited
2006
Highly Cited
2005
Highly Cited
2005
Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented… 
Highly Cited
2004
Highly Cited
2004
Selective localization of active proteins to patterns or specific sites is important for development of biosensors, bioMEMS… 
Highly Cited
2004
Highly Cited
2004
We report a new approach to greatly simplify the fabrication of nanofluidic channels with well-controlled dimensions. It is… 
Highly Cited
2002
Highly Cited
2002
A fluorine-based reactive ion etch (RIE) process has been developed to anisotropically dry etch the silicone elastomer… 
Highly Cited
1996
Highly Cited
1996
An experimental system and methodology were developed to realize dry etching of single crystal silicon with monolayer accuracy…