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Dry etching

Known as: Dry-etch 
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of… Expand
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Papers overview

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2017
2017
Femtosecond laser machining has been widely used for fabricating arbitrary 2.5 dimensional (2.5D) structures. However, it suffers… Expand
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Highly Cited
2011
Highly Cited
2011
Micro-strip metal–semiconductor–metal detectors for thermal neutron sensing were fabricated from hexagonal boron nitride (hBN… Expand
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Highly Cited
2008
Highly Cited
2008
This letter presents a vertical gate-all-around silicon nanowire transistor on bulk silicon wafer utilizing fully CMOS compatible… Expand
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Highly Cited
2006
Highly Cited
2006
When a liquid drop impinges a hydrophobic rough surface it can either bounce off the surface (fakir droplets) or be impaled and… Expand
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Highly Cited
2005
Highly Cited
2005
Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented… Expand
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Highly Cited
2004
Highly Cited
2004
Selective localization of active proteins to patterns or specific sites is important for development of biosensors, bioMEMS… Expand
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Highly Cited
2004
Highly Cited
2004
We report a new approach to greatly simplify the fabrication of nanofluidic channels with well-controlled dimensions. It is… Expand
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Highly Cited
2002
Highly Cited
2002
A fluorine-based reactive ion etch (RIE) process has been developed to anisotropically dry etch the silicone elastomer… Expand
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Highly Cited
1999
Highly Cited
1999
We observed the light propagation in 2-D photonic crystal waveguides with bends, which were composed of densely-packed holes… Expand
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Highly Cited
1999
Highly Cited
1999
Aligned carbon nanotubes have been synthesized on transition metal-coated silicon substrates with C2H2 using thermal chemical… Expand
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