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Dry etching
Known as:
Dry-etch
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of…
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Related topics
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12 relations
Broader (1)
Etching (microfabrication)
Isotropic etching
Microelectromechanical systems
Plasma ashing
Plasma etcher
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2013
2013
Experimental exploration of the fabrication of GaN microdome arrays based on a self-assembled approach
Lu Han
,
Tyler A. Piedimonte
,
Hongping Zhao
2013
Corpus ID: 41157105
The formation of large scale, highly uniform and controllable GaN microdome arrays based on a self-assembled low cost method was…
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2006
2006
Highly manufacturable advanced gate-stack technology for sub-45-nm self-aligned gate-first CMOSFETs
Seung-Chul Song
,
Zhibo Zhang
,
+7 authors
Byoung Hun Lee
IEEE Transactions on Electron Devices
2006
Corpus ID: 22589562
Issues surrounding the integration of Hf-based high-/spl kappa/ dielectrics with metal gates in a conventional CMOS flow are…
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2004
2004
Triangular Profile Imprint Molds in Nanograting Fabrication
Zhaoning Yu
,
S. Chou
2004
Corpus ID: 10609045
We have developed a technique based on nanoimprint lithography for the fabrication of nanogratings with controllable line widths…
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2004
2004
The dispensing well plate: a novel nanodispenser for the multiparallel delivery of liquids (DWP Part I)
P. Koltay
,
R. Steger
,
B. Bohl
,
R. Zengerle
2004
Corpus ID: 52950833
2003
2003
Quantum sensing using Type II InAs/GaSb superlattice for infrared detection
M. Razeghi
,
A. Gin
,
Yajun Wei
,
J. Bae
,
J. Nah
Microelectronics Journal
2003
Corpus ID: 40270783
Highly Cited
2002
Highly Cited
2002
Technology development of 3D detectors for high-energy physics and imaging
G. Pellegrini
,
P. Roy
,
+10 authors
M. Rahman
2002
Corpus ID: 59329471
Highly Cited
2000
Highly Cited
2000
Characteristics of TaN gate MOSFET with ultrathin hafnium oxide (8 /spl Aring/-12 /spl Aring/)
B. Lee
,
R. Choi
,
+7 authors
J. Lee
International Electron Devices Meeting…
2000
Corpus ID: 56269695
MOSFET's with equivalent oxide thickness of 8-12 /spl Aring/ have been demonstrated by using high-K gate dielectric thin films…
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1999
1999
Effect of inert gas additive species on Cl 2 high density plasma etching of compound semiconductors
Y. Hahn
,
Dustin C. Hays
,
+4 authors
R. Shul
1999
Corpus ID: 93102265
1998
1998
Micromachined capacitive transducer arrays for medical ultrasound imaging
X. Jin
,
F. Degertekin
,
S. Calmes
,
X.J. Zhang
,
I. Ladabaum
,
B. Khuri-Yakub
IEEE Ultrasonics Symposium. Proceedings (Cat. No…
1998
Corpus ID: 32141473
The fabrication and characterization of micromachined capacitive ultrasonic transducers are discussed with emphasis on the array…
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1993
1993
An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification
E. W. Scheckler
,
N. Tam
,
A. K. Pfau
,
A. Neureuther
IEEE Trans. Comput. Aided Des. Integr. Circuits…
1993
Corpus ID: 32169601
A fast three-dimensional volume removal algorithm for resist dissolution is presented and verified with applications to optical…
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