Skip to search formSkip to main contentSkip to account menu

Dry etching

Known as: Dry-etch 
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of… 
Wikipedia (opens in a new tab)

Related topics

Related topics

12 relations

Broader (1)

Etching (microfabrication)
Isotropic etchingMicroelectromechanical systemsPlasma ashingPlasma etcher

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2017
Highly Cited
2017
Dry‐etching‐assisted femtosecond laser machining
Femtosecond laser machining has been widely used for fabricating arbitrary 2.5 dimensional (2.5D) structures. However, it suffers… 
Review
2014
Review
2014
A review of microfabrication techniques and dielectrophoretic microdevices for particle manipulation and separation
The development of lab-on-a-chip (LOC) devices over the past decade has attracted growing interest. LOC devices aim to achieve… 
Highly Cited
2009
Highly Cited
2009
Low-loss amorphous silicon-on-insulator technology for photonic integrated circuitry
Highly Cited
2008
Highly Cited
2008
Vertical Silicon-Nanowire Formation and Gate-All-Around MOSFET
This letter presents a vertical gate-all-around silicon nanowire transistor on bulk silicon wafer utilizing fully CMOS compatible… 
Highly Cited
2006
Highly Cited
2006
Fabrication and performance of MEMS-based piezoelectric power generator for vibration energy harvesting
Highly Cited
2005
Highly Cited
2005
Luminescence properties of defects in GaN
Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented… 
Highly Cited
2004
Highly Cited
2004
Nanoscale protein patterning by imprint lithography
Selective localization of active proteins to patterns or specific sites is important for development of biosensors, bioMEMS… 
Highly Cited
2004
Highly Cited
2004
Fabrication of Size-Controllable Nanofluidic Channels by Nanoimprinting and Its Application for DNA Stretching
We report a new approach to greatly simplify the fabrication of nanofluidic channels with well-controlled dimensions. It is… 
Highly Cited
2002
Highly Cited
2002
Dry etching of polydimethylsiloxane for microfluidic systems
A fluorine-based reactive ion etch (RIE) process has been developed to anisotropically dry etch the silicone elastomer… 
Highly Cited
1996
Highly Cited
1996
Realization of atomic layer etching of silicon
An experimental system and methodology were developed to realize dry etching of single crystal silicon with monolayer accuracy… 
By clicking accept or continuing to use the site, you agree to the terms outlined in our Privacy Policy (opens in a new tab), Terms of Service (opens in a new tab), and Dataset License (opens in a new tab)