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Dry etching

Known as: Dry-etch 
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of… 
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Papers overview

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2013
2013
The formation of large scale, highly uniform and controllable GaN microdome arrays based on a self-assembled low cost method was… 
2006
2006
Issues surrounding the integration of Hf-based high-/spl kappa/ dielectrics with metal gates in a conventional CMOS flow are… 
2004
2004
We have developed a technique based on nanoimprint lithography for the fabrication of nanogratings with controllable line widths… 
Highly Cited
2002
Highly Cited
2000
Highly Cited
2000
  • B. LeeR. Choi J. Lee
  • 2000
  • Corpus ID: 56269695
MOSFET's with equivalent oxide thickness of 8-12 /spl Aring/ have been demonstrated by using high-K gate dielectric thin films… 
1998
1998
The fabrication and characterization of micromachined capacitive ultrasonic transducers are discussed with emphasis on the array… 
1993
1993
A fast three-dimensional volume removal algorithm for resist dissolution is presented and verified with applications to optical…