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Dry etching
Known as:
Dry-etch
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of…
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Related topics
Related topics
12 relations
Broader (1)
Etching (microfabrication)
Isotropic etching
Microelectromechanical systems
Plasma ashing
Plasma etcher
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2017
Highly Cited
2017
Dry‐etching‐assisted femtosecond laser machining
Xue‐Qing Liu
,
Qidai Chen
,
+5 authors
Hongbo Sun
2017
Corpus ID: 43982479
Femtosecond laser machining has been widely used for fabricating arbitrary 2.5 dimensional (2.5D) structures. However, it suffers…
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Highly Cited
2015
Highly Cited
2015
Adaptive Virtual Metrology Design for Semiconductor Dry Etching Process Through Locally Weighted Partial Least Squares
Toshiya Hirai
,
M. Kano
IEEE transactions on semiconductor manufacturing
2015
Corpus ID: 23270400
In semiconductor manufacturing processes, virtual metrology (VM) has been investigated as a promising tool to predict important…
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Highly Cited
2012
Highly Cited
2012
Dielectric strength, optical absorption, and deep ultraviolet detectors of hexagonal boron nitride epilayers
J. Li
,
S. Majety
,
R. Dahal
,
W. P. Zhao
,
J. Lin
,
Hongxing Jiang
2012
Corpus ID: 7655359
Hexagonal boron nitride (hBN) epilayers have been synthesized by metal organic chemical vapor deposition and their dielectric…
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Highly Cited
2011
Highly Cited
2011
Hexagonal boron nitride epitaxial layers as neutron detector materials
Jing Li
,
R. Dahal
,
S. Majety
,
Jingyu Lin
,
Hongxing Jiang
2011
Corpus ID: 18482748
Highly Cited
2008
Highly Cited
2008
Vertical Silicon-Nanowire Formation and Gate-All-Around MOSFET
Bin Yang
,
K. Buddharaju
,
S. Teo
,
N. Singh
,
G. Lo
,
D. Kwong
IEEE Electron Device Letters
2008
Corpus ID: 32235120
This letter presents a vertical gate-all-around silicon nanowire transistor on bulk silicon wafer utilizing fully CMOS compatible…
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Highly Cited
2004
Highly Cited
2004
Nanoscale protein patterning by imprint lithography
J. D. Hoff
,
Li-Jing Cheng
,
E. Meyhöfer
,
L. Jay Guo
,
A. Hunt
2004
Corpus ID: 14260723
Selective localization of active proteins to patterns or specific sites is important for development of biosensors, bioMEMS…
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Highly Cited
2004
Highly Cited
2004
Fabrication of Size-Controllable Nanofluidic Channels by Nanoimprinting and Its Application for DNA Stretching
L. Jay Guo
,
Xing Cheng
,
C. Chou
2004
Corpus ID: 13981183
We report a new approach to greatly simplify the fabrication of nanofluidic channels with well-controlled dimensions. It is…
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Highly Cited
1999
Highly Cited
1999
Observation of light propagation in photonic crystal optical waveguides with bends
T. Baba
,
N. Fukaya
,
J. Yonekura
1999
Corpus ID: 56021649
We observed the light propagation in 2-D photonic crystal waveguides with bends, which were composed of densely-packed holes…
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Highly Cited
1999
Highly Cited
1999
Synthesis of aligned carbon nanotubes using thermal chemical vapor deposition
Cheol Jin Lee
,
D. W. Kim
,
+7 authors
J. M. Kim
1999
Corpus ID: 52243802
Highly Cited
1996
Highly Cited
1996
Realization of atomic layer etching of silicon
S. Athavale
,
D. J. Economou
1996
Corpus ID: 98621576
An experimental system and methodology were developed to realize dry etching of single crystal silicon with monolayer accuracy…
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