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Dry etching

Known as: Dry-etch 
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of… 
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Papers overview

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Highly Cited
2017
Highly Cited
2017
Femtosecond laser machining has been widely used for fabricating arbitrary 2.5 dimensional (2.5D) structures. However, it suffers… 
Highly Cited
2015
Highly Cited
2015
In semiconductor manufacturing processes, virtual metrology (VM) has been investigated as a promising tool to predict important… 
Highly Cited
2012
Highly Cited
2012
Hexagonal boron nitride (hBN) epilayers have been synthesized by metal organic chemical vapor deposition and their dielectric… 
Highly Cited
2008
Highly Cited
2008
This letter presents a vertical gate-all-around silicon nanowire transistor on bulk silicon wafer utilizing fully CMOS compatible… 
Highly Cited
2004
Highly Cited
2004
Selective localization of active proteins to patterns or specific sites is important for development of biosensors, bioMEMS… 
Highly Cited
2004
Highly Cited
2004
We report a new approach to greatly simplify the fabrication of nanofluidic channels with well-controlled dimensions. It is… 
Highly Cited
1999
Highly Cited
1999
We observed the light propagation in 2-D photonic crystal waveguides with bends, which were composed of densely-packed holes… 
Highly Cited
1996
Highly Cited
1996
An experimental system and methodology were developed to realize dry etching of single crystal silicon with monolayer accuracy…