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Dry etching

Known as: Dry-etch 
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of… 
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Related topics

Related topics

12 relations

Broader (1)

Etching (microfabrication)
Isotropic etchingMicroelectromechanical systemsPlasma ashingPlasma etcher

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2013
2013
Experimental exploration of the fabrication of GaN microdome arrays based on a self-assembled approach
The formation of large scale, highly uniform and controllable GaN microdome arrays based on a self-assembled low cost method was… 
2006
2006
Highly manufacturable advanced gate-stack technology for sub-45-nm self-aligned gate-first CMOSFETs
Issues surrounding the integration of Hf-based high-/spl kappa/ dielectrics with metal gates in a conventional CMOS flow are… 
2006
2006
Embedded active device packaging technology for next-generation chip-in-substrate package, CiSP
As the demands for high-density, high-speed, high-performance, and multi-function in portable electronic products, packaging… 
2006
2006
Growth of mechanically fixed and isolated vertically aligned carbon nanotubes and nanofibers by DC plasma-enhanced hot filament chemical vapor deposition
2004
2004
Triangular Profile Imprint Molds in Nanograting Fabrication
We have developed a technique based on nanoimprint lithography for the fabrication of nanogratings with controllable line widths… 
Highly Cited
2002
Highly Cited
2002
Technology development of 3D detectors for high-energy physics and imaging
Highly Cited
2000
Highly Cited
2000
Characteristics of TaN gate MOSFET with ultrathin hafnium oxide (8 /spl Aring/-12 /spl Aring/)
  • B. LeeR. Choi J. Lee
  • International Electron Devices Meeting…
  • 2000
  • Corpus ID: 56269695
MOSFET's with equivalent oxide thickness of 8-12 /spl Aring/ have been demonstrated by using high-K gate dielectric thin films… 
1998
1998
Microbolometer uncooled infrared camera with 20-mK NETD
Raytheon Sensors and Communications Systems has developed a prototype infrared imaging rifle-sight using an uncooled… 
1997
1997
High aspect ratio quarter-micron electroless copper integrated technology
1993
1993
An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification
A fast three-dimensional volume removal algorithm for resist dissolution is presented and verified with applications to optical… 
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