Plasma etcher

A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas… (More)
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Topic mentions per year

Topic mentions per year

1979-2017
012319792017

Papers overview

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2017
2017
An inductively-coupled plasma-reactive ion etching system (ICP-RIE) for a half-inch wafer process is developed. The machine is in… (More)
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2016
2016
The paper is devoted to the study of deep reactive ion etching of silicon using diode plasma etcher system with a low-power… (More)
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2015
2015
The correlation between the change in the etching rate of SiN and the change in the monitored plasma impedance was investigated… (More)
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2009
2009
Often the greatest cost for developing a new package or system is the acquisition of bare chips. To meet this challenge, a unique… (More)
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2008
2008
  • Herbert H. Sawin
  • 2008
Variation in a plasma etch process is shown to be reduced through design of processing equipment for effective control. A dual… (More)
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2003
2003
In this paper, dry etching of silicon micro-trenches were completed with a time multiplexed inductively coupled plasma (ICP… (More)
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2002
2002
Increasingly there is a need for fast, accurate, and sensitive detection of equipment and process faults to maintain high process… (More)
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Review
2000
Review
2000
OVERVIEW: In the rapid evolution of VLSI technology toward smaller geometries and increased levels of chip integration, minimum… (More)
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2000
2000
  • Sang Hoon Kim, Hosung Moon, Jinho Ahn
  • Digest of Papers Microprocesses and…
  • 2000
The effect of SF/sub 6/ addition in O/sub 2/ plasma on the etching characteristics of polyimide-one of the promising low-k… (More)
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1979
1979
The utilization of plasma etching for selective layer removal of semiconductor device passivation films, polysilicon or substrate… (More)
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