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Plasma etching

Known as: Plasma etch 
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an… Expand
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Papers overview

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Highly Cited
2011
Highly Cited
2011
In this paper, we report a study of graphene and graphene field effect devices after their exposure to a series of short pulses… Expand
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Highly Cited
2010
Highly Cited
2010
This research tests the hypothesis that plasma will cause differential etching of wood cell walls because of variation in the… Expand
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Highly Cited
2009
Highly Cited
2009
A simple top-down method for realizing an array of vertically stacked nanowires is presented. The process utilizes the… Expand
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Highly Cited
2008
Highly Cited
2008
We report the experimental observation of subband formation in graphene nanoribbons, where conductance becomes quantized due to… Expand
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Highly Cited
2007
Highly Cited
2007
We demonstrate a method that uses the pillars on a stamp to cut and exfoliate graphene islands from a graphite and then uses… Expand
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Highly Cited
2007
Highly Cited
2007
In this paper, we present a silicon carbide MEMS resonant strain sensor for harsh environment applications. The sensor is a… Expand
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Highly Cited
2004
Highly Cited
2004
Conductance switching in metal/molecule/metal structures has attracted tremendous and broad interest. Understanding the switching… Expand
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Highly Cited
2003
Highly Cited
2003
This letter describes the use of nanotransfer printing (nTP) for forming three-dimensional (3D) structures with feature sizes… Expand
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Highly Cited
2003
Highly Cited
2003
The electronic transport characteristics of self-assembled monolayers of phenylene-based -conjugated molecules were measured in a… Expand
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Highly Cited
2000
Highly Cited
2000
  • P. May
  • Philosophical Transactions of the Royal Society…
  • 2000
  • Corpus ID: 8028237
Diamond has some of the most extreme physical properties of any material, yet its practical use in science or engineering has… Expand
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