Plasma etching

Known as: Plasma etch 
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an… (More)
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2008
2008
The development of plasma etching processes is challenged by the complexity of the chemistries and the unpredictability in the… (More)
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2007
2007
The optical interferometry is a non-invasive plasma diagnostic method. Etch experiment were carried out in a high density plasma… (More)
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2006
2006
Plasma etching of lithium niobate with fluorine gases is limited by the redeposition LiF. This results in a low etch rate and… (More)
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2005
2005
The technology of selective oxygen plasma etching is presented. It enables the evaluation of the state of pigment dispersion, as… (More)
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2004
2004
The thick photoresist SU8, by virtue of its good mechanical durability, water impermeability and dielectric properties on… (More)
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2000
2000
The effect and influence of dry plasma etching processes of Si=SiGe using HBr for the formation of diode mesa structures has been… (More)
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1999
1999
Patterning of highly oriented pyrolytic graphite ~HOPG! was demonstrated by oxygen plasma etching of lithographically patterned… (More)
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1991
1991
CV measurement is shown to be a more sensitive technique for characterizing plasma-etching induced damage than oxide breakdown… (More)
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1980
1980
The use of plasma etching through multilayer structures is now a common practice in the IC industry. The control of etched… (More)
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1976
1976
Experimental plasma etching apparatus and methods utilizing BCl3etch gas have been developed for the accurate patterning of thin… (More)
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