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Plasma etching

Known as: Plasma etch 
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an… 
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Related topics

Related topics

15 relations
Capacitively coupled plasmaCopper interconnectEtching (microfabrication)Excited state

Broader (1)

Semiconductor device fabrication

Papers overview

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2008
2008
Ion orbits in plasma etching of semiconductors
Fabrication of high-speed semiconductor circuits depends on etching submicron trenches and holes with straight walls, guided by… 
2004
2004
Self-aligned, insulating-layer structure for integrated fabrication of organic self-assembled multilayer electronic devices
We demonstrate an approach for fabricating nanometer-scale devices with minimal device areas while still retaining compatibility… 
2004
2004
Laser direct exposure of photodefinable polymer masks using shaped-beam optics
In this paper, we explore laser direct-write photolithography and ablation processes to finely pattern polymer resists, enabling… 
2000
2000
Transient plasma-induced emission analysis of laser-desorbed species during Cl2 plasma etching of Si
The surface during the etching of Si in a Cl2 inductively-coupled plasma (ICP) was analyzed by laser desorption (LD), followed by… 
1998
1998
Plasma etching : fundamentals and applications
1. Introduction 2. RF discharges 3. Physical basis of plasma etching process 4. Diagnostics of plasma particles and potentials 5… 
1996
1996
Future prospects for dry etching
Abstract 
1996
1996
Surface chemistry during plasma etching of silicon
Abstract 
1993
1993
Sub-50 nm high aspect-ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching
We present the fabrication of sub‐50 nm Si pillars, ridges, and trenches with aspect ratios greater than 10 using ultrahigh… 
1988
1988
Plasma etching of organic materials. II. Polyimide etching and passivation downstream of an O2–CF4–Ar microwave plasma
Parameters which influence the etching of polyimide (PI) downstream of an O2–CF4–Ar microwave (MW) plasma were studied. Of… 
Highly Cited
1979
Highly Cited
1979
Current-access magnetic bubble circuits
Experimental and theoretical results from our work on current-access technology show promise for high-density, ∼10<sup>7</sup…