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Plasma etching

Known as: Plasma etch 
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an… 
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Papers overview

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2007
2007
We have used nanoporous anodic aluminum oxide (AAO) as a template to fabricate amorphous carbon (a-C) coated silicon nanotips by… 
2006
2006
In conventional GaN light-emitting diodes (LEDs), a significant gap exists between the internal and external efficiencies owing… 
Highly Cited
2003
Highly Cited
2003
The electronic transport characteristics of self-assembled monolayers of phenylene-based -conjugated molecules were measured in a… 
1993
1993
We present the fabrication of sub‐50 nm Si pillars, ridges, and trenches with aspect ratios greater than 10 using ultrahigh… 
Highly Cited
1985
Highly Cited
1985
1. Introduction. 2. Plasma Excitation and Reactor Design. 3. Silicon and Silicon Dioxide Etching in Plasmas. 4. Aluminium Etching… 
Highly Cited
1979
Highly Cited
1979
Mass spectrometric sampling of fluorocarbon glow discharges and in situ measurements of the etch rate of Si and SiO2, with quartz… 
Highly Cited
1979
Highly Cited
1979
Experimental and theoretical results from our work on current-access technology show promise for high-density, ∼10<sup>7</sup…