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Plasma etching
Known as:
Plasma etch
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an…
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Related topics
Related topics
15 relations
Capacitively coupled plasma
Copper interconnect
Etching (microfabrication)
Excited state
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Broader (1)
Semiconductor device fabrication
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2012
2012
Selective area growth of a- and c-plane GaN nanocolumns by molecular beam epitaxy using colloidal nanolithography
A. Bengoechea-Encabo
,
S. Albert
,
+8 authors
E. Calleja
2012
Corpus ID: 44092777
2012
2012
Disordered submicron structures integrated on glass substrate for broadband absorption enhancement of thin-film solar cells
Y. Song
,
J. Jang
,
J. Lee
,
E. Kang
,
Y. T. Lee
2012
Corpus ID: 92988301
2007
2007
Amorphous Carbon Coated Silicon Nanotips Fabricated by MPCVD Using Anodic Aluminum Oxide as the Template
Te-Ming Chen
,
F. Pan
,
J. Hung
,
L. Chang
,
Shich-Chuan Wu
,
Chia-Fu Chen
2007
Corpus ID: 56568063
We have used nanoporous anodic aluminum oxide (AAO) as a template to fabricate amorphous carbon (a-C) coated silicon nanotips by…
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2006
2006
Efficiency Improvement of GaN-Based LEDs with ITO Texturing Window Layers Using Natural Lithography
R. Horng
,
Shao-hua Huang
,
C. Yang
,
D. Wuu
IEEE Journal of Selected Topics in Quantum…
2006
Corpus ID: 25215754
In conventional GaN light-emitting diodes (LEDs), a significant gap exists between the internal and external efficiencies owing…
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Highly Cited
2003
Highly Cited
2003
Absence of Strong Gate Effects in Electrical Measurements on Phenylene-Based Conjugated Molecules
Jeong-O Lee
,
G. Lientschnig
,
+6 authors
C. Dekker
2003
Corpus ID: 15534581
The electronic transport characteristics of self-assembled monolayers of phenylene-based -conjugated molecules were measured in a…
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2001
2001
Holographic X-ray optical elements: transition between refraction and diffraction
I. Snigireva
,
A. Snigirev
,
+8 authors
E. Voges
2001
Corpus ID: 56073571
1993
1993
Sub-50 nm high aspect-ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching
P. Fischer
,
S. Chou
1993
Corpus ID: 6710769
We present the fabrication of sub‐50 nm Si pillars, ridges, and trenches with aspect ratios greater than 10 using ultrahigh…
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Highly Cited
1985
Highly Cited
1985
Plasma Etching in Semiconductor Fabrication
R. Morgan
1985
Corpus ID: 136830309
1. Introduction. 2. Plasma Excitation and Reactor Design. 3. Silicon and Silicon Dioxide Etching in Plasmas. 4. Aluminium Etching…
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Highly Cited
1979
Highly Cited
1979
Some chemical aspects of the fluorocarbon plasma etching of silicon and its compounds
J. Coburn
,
E. Kay
1979
Corpus ID: 62183402
Mass spectrometric sampling of fluorocarbon glow discharges and in situ measurements of the etch rate of Si and SiO2, with quartz…
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Highly Cited
1979
Highly Cited
1979
Current-access magnetic bubble circuits
A. Bobeck
,
S. Blank
,
A. Butherus
,
F. Ciak
,
W. Strauss
Bell Labs technical journal
1979
Corpus ID: 10100461
Experimental and theoretical results from our work on current-access technology show promise for high-density, ∼10<sup>7</sup…
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