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Plasma etching

Known as: Plasma etch 
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an… 
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Related topics

Related topics

15 relations
Capacitively coupled plasmaCopper interconnectEtching (microfabrication)Excited state

Broader (1)

Semiconductor device fabrication

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2012
2012
Disordered submicron structures integrated on glass substrate for broadband absorption enhancement of thin-film solar cells
2007
2007
Amorphous Carbon Coated Silicon Nanotips Fabricated by MPCVD Using Anodic Aluminum Oxide as the Template
We have used nanoporous anodic aluminum oxide (AAO) as a template to fabricate amorphous carbon (a-C) coated silicon nanotips by… 
2006
2006
Efficiency Improvement of GaN-Based LEDs with ITO Texturing Window Layers Using Natural Lithography
In conventional GaN light-emitting diodes (LEDs), a significant gap exists between the internal and external efficiencies owing… 
Highly Cited
2003
Highly Cited
2003
Absence of Strong Gate Effects in Electrical Measurements on Phenylene-Based Conjugated Molecules
The electronic transport characteristics of self-assembled monolayers of phenylene-based -conjugated molecules were measured in a… 
2003
2003
Electron collisions with the CF radicals using the R-matrix method
The R-matrix method is used to treat electron collisions with the diatomic radical CF as a function of internuclear separation, R… 
2001
2001
Holographic X-ray optical elements: transition between refraction and diffraction
1993
1993
Sub-50 nm high aspect-ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching
We present the fabrication of sub‐50 nm Si pillars, ridges, and trenches with aspect ratios greater than 10 using ultrahigh… 
Highly Cited
1985
Highly Cited
1985
Plasma Etching in Semiconductor Fabrication
1. Introduction. 2. Plasma Excitation and Reactor Design. 3. Silicon and Silicon Dioxide Etching in Plasmas. 4. Aluminium Etching… 
1981
1981
Deep UV photoresists I. Meldrum's diazo sensitizer
The design, synthesis, and evaluation of a new resist formulation tailored for use in the deep UV (254 nm) is described. The… 
Highly Cited
1979
Highly Cited
1979
Current-access magnetic bubble circuits
Experimental and theoretical results from our work on current-access technology show promise for high-density, ∼10<sup>7</sup… 
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