Skip to search formSkip to main content
You are currently offline. Some features of the site may not work correctly.

Capacitively coupled plasma

Known as: CCP, Capcitively coupled plasma 
A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes… Expand
Wikipedia

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2013
Highly Cited
2013
An atmospheric pressure direct current (DC) plasma jet is investigated in N2 and dry air in terms of plasma properties and… Expand
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2010
2010
Dual frequency, capacitively coupled plasma (DF-CCP) tools are now being used for etching of 30 cm diameter wafers during… Expand
  • figure 1
  • figure 2
  • figure 3
Is this relevant?
2010
2010
Wafer diameters for microelectronics fabrication will soon transition from 300 to 450 mm at a time when excitation frequencies… Expand
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 6
Is this relevant?
Highly Cited
2010
Highly Cited
2010
Abstract Here we present the first quantitative study of the gas to solid particle conversion in a Radio Frequency dusty plasma… Expand
  • figure 1
Is this relevant?
2007
2007
We numerically investigated Si deep etching with several hundreds of micrometers such as that used in microelectromechanical… Expand
  • figure 1
  • table I
  • figure 2
  • figure 3
  • figure 4
Is this relevant?
2005
2005
Design of an all-in-one (main etch, PR ash and clean) dielectric etch chamber requires independent control of plasma generation… Expand
  • figure 1
  • figure 2
Is this relevant?
2004
2004
Two-frequency capacitively coupled plasmas (2f-CCP) are widely used as one of the powerful tools for SiO/sub 2/ etching. We… Expand
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2004
2004
We propose a generalized model, based on a simple balance equation, explaining the temperature dependence of the agglomeration… Expand
  • figure 2
  • figure 1
  • figure 5
  • figure 3
  • figure 4
Is this relevant?
2003
2003
Magnetically enhanced capacitively coupled plasma sources use transverse static magnetic fields to modify the performance of low… Expand
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 6
Is this relevant?
Highly Cited
2003
Highly Cited
2003
A one-dimensional particle-in-cell/Monte Carlo model is developed to study capacitively coupled (cc) radio-frequency discharges… Expand
  • figure 1
  • table I
  • table II
  • figure 2
  • figure 3
Is this relevant?