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Capacitively coupled plasma
Known as:
CCP
, Capcitively coupled plasma
A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes…
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Related topics
Related topics
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Etching (microfabrication)
Microfabrication
Plasma etching
Plasma-immersion ion implantation
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Semantic Scholar uses AI to extract papers important to this topic.
Review
2015
Review
2015
Electromagnetic Effects in Capacitively Coupled Plasmas
D. Eremin
2015
Corpus ID: 118454935
Following requirements of the plasma processing industry for increasing throughput, capacitively coupled plasma reactors with…
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2012
2012
Radial density uniformity of dual frequency capacitively coupled plasma
Jiang Xiangzhan
,
L. Yongxin
,
Bing Zhenhua
,
Lu Wenqi
,
W. Younian
2012
Corpus ID: 101766795
The influences on dual frequency capacitively coupled plasma radial uniformity are studied with a newly developed complete…
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2009
2009
Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
Hongyu Wang
,
Wei Jiang
,
Z. Bi
,
You-nian Wang
2009
Corpus ID: 119168754
We proposed an altered configuration for dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs…
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2008
2008
CHF3 Dual-Frequency Capacitively Coupled Plasma by Optical Emission Spectroscopy
徐轶君
,
叶超
,
黄晓江
,
袁静
,
邢振宇
,
宁兆元
2008
Corpus ID: 93565370
我们在 CHF3 13.56 MHz/2MHz 调查中间的煤气的阶段双频率电容地联合血浆(CCP ) 因为蚀刻的 SiCOH 低绝缘的常数(low-k ) 电影，和 2MHz 的效果在激进分子上驱动集中。在 13.56 MHz CCP 的 CHF3…
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2008
2008
Characteristics of electron energy distribution function of capacitively coupled plasma excited by 60MHz RF source
S. Kai
,
Xin Yu
,
Hu Xiao-jiang
,
YU Qiang-Hua
,
Ning Zhaoyuan
2008
Corpus ID: 92762057
Capacitively coupled plasma (CCP) source excited by very-high-frequency (VHF) source has attracted much attention in…
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2008
2008
Capacitively coupled plasma reactor
魏淳任
2008
Corpus ID: 93751893
A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality…
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2005
2005
Treatment of Waste Tyre Powder Using a High-frequency Capacitively Coupled Plasma Reactor
T. Lan
,
Huang Hai-tao
2005
Corpus ID: 102476062
A high-frequency (HF) capacitively coupled plasma reactor was developed to study the pyrolysis of waste tyre powder. The main…
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2004
2004
Modelling of dual frequency capacitively coupled plasma devices
P. Boyle
2004
Corpus ID: 93885277
Dual frequency capacitive discharges are designed to offer independent control of the flux and energy of ions impacting on an…
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2000
2000
Capacitive Discharge Excilamps
E. A. Sosnin
,
M. V. Erofeev
,
V. Tarasenko
,
D. V. Shitz
LASE
2000
Corpus ID: 95628669
UV radiating sources on KrCl (λ ∼ 222 nm), XeCl (λ ∼ 308 nm), and XeBr (λ ∼ 282 nm) molecules excited by a capacitive discharge…
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1998
1998
Phasespace modelling of a radiofrequency plasma interacting with surfaces
T. Makabe
,
J. Matsui
,
N. Nakano
1998
Corpus ID: 54655613
Abstract