Capacitively coupled plasma

Known as: CCP, Capcitively coupled plasma 
A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes… (More)
Wikipedia

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2018
2018
In this paper, the plasma uniformity was studied in a capacitively coupled plasma machine using Langmuir probe. The plasma… (More)
  • figure 1
  • figure 2
  • table 1
  • figure 3
  • figure 4
Is this relevant?
2015
2015
*Correspondence: Christine Charles, Space Plasma, Power and Propulsion Laboratory, Research School of Physics and Engineering… (More)
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2012
2012
A self-consistent analytical model for a high voltage, capacitively coupled plasma (CCP) sheath driven by three sinusoidal radio… (More)
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2010
2010
Wafer diameters for microelectronics fabrication will soon transition from 300 to 450 mm at a time when excitation frequencies… (More)
Is this relevant?
2010
2010
Dual frequency capacitively coupled plasma (DF-CCP) tools for etching and deposition for microelectronics fabrication typically… (More)
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2007
2007
We numerically investigated Si deep etching with several hundreds of micrometers such as that used in microelectromechanical… (More)
  • figure 1
  • table I
  • figure 2
  • figure 3
  • figure 4
Is this relevant?
2006
2006
The possibilities to control ion energy distribution functions (IEDFs) and ion angle distribution functions (IADFs) on electrodes… (More)
  • figure 4
Is this relevant?
2005
2005
Design of an all-in-one (main etch, PR ash and clean) dielectric etch chamber requires independent control of plasma generation… (More)
  • figure 1
  • figure 2
Is this relevant?
2003
2003
  • Mark J. Kushnera
  • 2003
Magnetically enhanced capacitively coupled plasma sources use transverse static magnetic fields to modify the performance of low… (More)
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 6
Is this relevant?
2003
2003
A one-dimensional particle-in-cell/Monte Carlo model is developed to study capacitively coupled ~cc! radio-frequency discharges… (More)
  • figure 1
  • table I
  • table II
  • figure 2
  • figure 3
Is this relevant?