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Plasma ashing
Known as:
Ash (disambiguation)
In semiconductor manufacturing plasma ashing is the process of removing the photoresist (light sensitive coating) from an etched wafer. Using a…
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Related topics
Related topics
5 relations
Dry etching
Etching (microfabrication)
Plasma cleaning
Semiconductor
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2013
2013
Polymeric waveguide platform fabrication optimization
Moran Bin-Nun
2013
Corpus ID: 55549742
2013
2013
Effect of Oxygen Plasma on Low Dielectric Constant HSQ (Hydrogensilsesquioxane) Films
Q. Yuan 袁
,
G. Yin 殷
,
Z. Ning 宁
2013
Corpus ID: 250869238
The commercially available hydrogensilsesquioxane (HSQ) offers a low dielectric constant. In this paper, the impact of oxygen…
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2011
2011
A method of fabricating blazed grating by homogenous grating mask
Minghui Chen
,
Quan Liu
,
Jianhong Wu
International Conference on Optical Instruments…
2011
Corpus ID: 137537028
In this paper, a new approach has been proposed to fabricate holographic blazed grating. Firstly, a rectangular or trapezoidal…
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2010
2010
Minimization of plasma ashing damage to OSG low-k dielectrics
H. Shi
,
H. Huang
,
+5 authors
D. Kyser
IEEE International Interconnect Technology…
2010
Corpus ID: 33210212
This paper investigated the plasma ashing damage to patterned porous low k structures with the objective to minimize the plasma…
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2005
2005
Effects of Oxygen Plasma Ashing on Barrier Dielectric SiCN Film
C. W. Chen
,
T. Chang
,
Po-Tsun Liu
,
T. Tsai
,
T. Tseng
2005
Corpus ID: 98840002
Effects of oxygen plasma ashing on barrier dielectric SiCN films have been studied for various ashing conditions. According to X…
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2004
2004
Condensation of silanol groups in porous methylsilsesquioxane films using Supercritical CO/sub 2/ and alcohol cosolvents
Bo Xie
,
A. Muscat
IEEE transactions on semiconductor manufacturing
2004
Corpus ID: 13305033
Fourier transform infrared (FTIR) spectroscopy, goniometry, and electrical measurements were used to investigate the effect of…
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2004
2004
Evaluation of Automated Urinary Iodine Methods : Problems of Intertering Substances
Identified WarwIckMay
,
DIanaWu
,
Bourdoux
,
Glen
2004
Corpus ID: 23252545
We evaluated automated methods for measurement of unnary iodine (UI) over a range expected in iodine-replete and iodine…
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2003
2003
Ashing Technique For Nano-gap Fabrication of Electrostatic Transducers
Marie-Ange Eyoum
,
E. Quevy
,
H. Takeuchi
,
T. King
,
R. Howe
2003
Corpus ID: 7946102
Using a low temperature process flow, a photoresist ashing technique was developed to define nano-gaps for the fabrication of…
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2001
2001
The effect of ammonia plasma treatment on low-k methyl-hybrido-silsesquioxane against photoresist stripping damage
T. Chang
,
Y. Mor
,
+4 authors
S. Sze
2001
Corpus ID: 55105418
1935
1935
The Problem Boy of the Indianapolis Public Schools: A Product of Social and Domestic Pathology
Agnes Mahoney
1935
Corpus ID: 151070046
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