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Plasma ashing

Known as: Ash (disambiguation) 
In semiconductor manufacturing plasma ashing is the process of removing the photoresist (light sensitive coating) from an etched wafer. Using a… 
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Papers overview

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2013
2013
The commercially available hydrogensilsesquioxane (HSQ) offers a low dielectric constant. In this paper, the impact of oxygen… 
2011
2011
In this paper, a new approach has been proposed to fabricate holographic blazed grating. Firstly, a rectangular or trapezoidal… 
2010
2010
This paper investigated the plasma ashing damage to patterned porous low k structures with the objective to minimize the plasma… 
2005
2005
Effects of oxygen plasma ashing on barrier dielectric SiCN films have been studied for various ashing conditions. According to X… 
2004
2004
Fourier transform infrared (FTIR) spectroscopy, goniometry, and electrical measurements were used to investigate the effect of… 
2004
2004
We evaluated automated methods for measurement of unnary iodine (UI) over a range expected in iodine-replete and iodine… 
2003
2003
Using a low temperature process flow, a photoresist ashing technique was developed to define nano-gaps for the fabrication of…