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Plasma ashing

Known as: Ash (disambiguation) 
In semiconductor manufacturing plasma ashing is the process of removing the photoresist (light sensitive coating) from an etched wafer. Using a… 
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Related topics

Related topics

5 relations
Dry etchingEtching (microfabrication)Plasma cleaningSemiconductor

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2018
2018
High-order Proximity Preserving Information Network Hashing
Information network embedding is an effective way for efficient graph analytics. However, it still faces with computational… 
2018
2018
Cross-modal hashing based on category structure preserving
2015
2015
Investigations into the air heater ash deposit formation in large scale pulverised coal fired boiler
2014
2014
Effects of plasma and vacuum-ultraviolet exposure on the mechanical properties of low-k porous organosilicate glass
The effects of plasma exposure and vacuum-ultraviolet (VUV) irradiation on the mechanical properties of low-k porous… 
2014
2014
Organic matter removal for the analysis of carbon and oxygen isotope compositions of siderite
2010
2010
Minimization of plasma ashing damage to OSG low-k dielectrics
This paper investigated the plasma ashing damage to patterned porous low k structures with the objective to minimize the plasma… 
2006
2006
Heat, moisture and chemical resistance on low dielectric constant (low-k) film using Diethoxymethylsilane (DEMS) prepared by plasma enhanced chemical vapor deposition
2005
2005
Effects of Oxygen Plasma Ashing on Barrier Dielectric SiCN Film
Effects of oxygen plasma ashing on barrier dielectric SiCN films have been studied for various ashing conditions. According to X… 
2004
2004
Condensation of silanol groups in porous methylsilsesquioxane films using Supercritical CO/sub 2/ and alcohol cosolvents
Fourier transform infrared (FTIR) spectroscopy, goniometry, and electrical measurements were used to investigate the effect of… 
1995
1995
Large area radio frequency plasma for microelectronics processing
Radio‐frequency (rf) inductively coupled planar plasma (ICP) provides a better way to generate spatially confined high density… 
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