Isotropic etching

Known as: Etching (isotropic), Etching (plasma) 
Isotropic etching (e.g. wet etching or chemical etching) is a method commonly used in semi-conductor technology to remove material from a substrate… (More)
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Papers overview

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2014
2014
A multi-step plasma etching technique is developed to obtain deep-grooved micro-scale ball-bearing raceways and employed in the… (More)
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Highly Cited
2014
Highly Cited
2014
The most successful 2D object detection methods require a large number of images annotated with object bounding boxes to be… (More)
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2011
2011
This paper reports the results of a side-by-side comparison study of HF-HNO3 isotropic etching of circular pits in <111> and… (More)
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2007
2007
This paper reports a new design and microfabrication process for high sensing guard-armed silicon dioxide (SiO2 ) microcantilever… (More)
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2007
2007
This paper describes the concept of a new fractal multi-band antenna based on the hexagon shape. Three iterations of the… (More)
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2006
2006
Isotropic etching of silicon in HF-based solutions is expected to be controlled by the diffusion of fluoride to the silicon… (More)
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Highly Cited
2005
Highly Cited
2005
Different processes involving an inductively coupled plasma reactor are presented either for deep reactive ion etching or for… (More)
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2003
2003
We show how it was possible to develop an etching process of SiGe with a high selectivity to similar materials such as nitride… (More)
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Highly Cited
2000
Highly Cited
2000
A three-dimensional serpentine microchannel design with a "C shaped" repeating unit is presented in this paper as a means of… (More)
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1998
1998
This paper reports a self-limiting etching behavior of an isotropic silicon etchant (consisted of HF, HN03, and acetic acid… (More)
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