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Isotropic etching

Known as: Etching (isotropic), Etching (plasma) 
Isotropic etching (e.g. wet etching or chemical etching) is a method commonly used in semi-conductor technology to remove material from a substrate… Expand
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Papers overview

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Highly Cited
2006
Highly Cited
2006
[1] This work quantifies and explains the direct physical effects of slope angle on infiltration and runoff generation by… Expand
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Highly Cited
2005
Highly Cited
2005
Abstract Different processes involving an inductively coupled plasma reactor are presented either for deep reactive ion etching… Expand
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Highly Cited
2005
Highly Cited
2005
This paper is an attempt to apply the Palmer–Rice fracture mechanics approach to the shear band propagation in sands and normally… Expand
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Highly Cited
2004
Highly Cited
2004
We demonstrate the production of integrated-gate nanocathodes which have a single carbon nanotube or silicon nanowire/whisker per… Expand
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2004
2004
The epitaxial lift- off process allows the separation of a thin layer of III/ V material from the substrate by selective etching… Expand
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2003
2003
Diamond coatings on Co cemented tungsten carbide (WC-Co) hard metal tools are widely used for cutting non-ferrous metals. It is… Expand
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Highly Cited
2000
Highly Cited
2000
A three-dimensional serpentine microchannel design with a "C shaped" repeating unit is presented in this paper as a means of… Expand
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1990
1990
SMALL crystals of silicon carbide, probably of interstellar origin, have previously been isolated from primitive meteorites by… Expand
Highly Cited
1980
Highly Cited
1980
A process for fabricating experimental Josephson integrated circuits is described that is based primarily on the use of vacuum… Expand
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Highly Cited
1977
Highly Cited
1977
The plastic deformation produced by laser induced stress waves was investigated on an Fe-3 wt pct Si alloy. The intensity and… Expand