Skip to search formSkip to main contentSkip to account menu

Isotropic etching

Known as: Etching (isotropic), Etching (plasma) 
Isotropic etching (e.g. wet etching or chemical etching) is a method commonly used in semi-conductor technology to remove material from a substrate… 
Wikipedia (opens in a new tab)

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Review
2012
Review
2012
During the last 25 to 30 yr, micromodels have been increasingly used to study the behavior of fluids inside microstructures in… 
Highly Cited
2006
Highly Cited
2006
This work quantifies and explains the direct physical effects of slope angle on infiltration and runoff generation by extending… 
Highly Cited
2005
Highly Cited
2005
This paper is an attempt to apply the Palmer–Rice fracture mechanics approach to the shear band propagation in sands and normally… 
Highly Cited
2004
Highly Cited
2004
We demonstrate the production of integrated-gate nanocathodes which have a single carbon nanotube or silicon nanowire/whisker per… 
Highly Cited
2000
Highly Cited
2000
A three-dimensional serpentine microchannel design with a "C shaped" repeating unit is presented in this paper as a means of… 
Highly Cited
1980
Highly Cited
1980
A process for fabricating experimental Josephson integrated circuits is described that is based primarily on the use of vacuum… 
Highly Cited
1977
Highly Cited
1977
The plastic deformation produced by laser induced stress waves was investigated on an Fe-3 wt pct Si alloy. The intensity and…