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Isotropic etching

Known as: Etching (isotropic), Etching (plasma) 
Isotropic etching (e.g. wet etching or chemical etching) is a method commonly used in semi-conductor technology to remove material from a substrate… 
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Related topics

Related topics

3 relations
Dry etchingEtching (microfabrication)Reactive-ion etching

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2009
2009
Study on Wet Etching of AAO Template
The highly ordered anodic aluminum oxide (AAO) template was prepared with two-step anodization. The AAOtemplate was carried out… 
2009
2009
High resolution TEM and triple-axis XRD investigation into porous silicon formed on highly conducting substrates
2007
2007
Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching
Postdeposition chemical etching of spectral-hole filters, which were fabricated as chiral sculptured thin films with central 90… 
Highly Cited
2003
Highly Cited
2003
Luminescence of GaN nanocolumns obtained by photon-assisted anodic etching
GaN nanocolumns with transverse dimensions of about 50 nm were obtained by illumination-assisted anodic etching of epilayers… 
2002
2002
Morphology and Effects of Hydrogen Etching of Porous SiC
The morphology of the porous network in porous SiC has been studied. It has been found that pore formation starts with a few… 
1999
1999
An 0.03 μm gate-length enhancement-mode InAlAs/InGaAs/InP MODFET's with 300 GHz f/sub T/ and 2 S/mm extrinsic transconductance
We have developed high-performance enhancement-mode InP-based modulation-doped field-effect transistors with 0.03 /spl mu/m gate… 
Highly Cited
1988
Highly Cited
1988
Effect of Potential Field on Ion Deflection and Shape Evolution of Trenches during Plasma‐Assisted Etching
Modele mathematique pour etudier l'evolution de la forme des tranchees au cours de la gravure assistee par plasma 
Review
1987
Review
1987
PANDA2: Program for Minimum Weight Design of Stiffened, Composite, Locally Buckled Panels
Highly Cited
1980
Highly Cited
1980
Fabrication Process for Josephson Integrated Circuits
A process for fabricating experimental Josephson integrated circuits is described that is based primarily on the use of vacuum… 
1972
1972
Sputter-Etching of Heterogeneous Surfaces
In conventional sputter etching, heterogeneous surfaces are eroded at generally unpredictable rates. The reasons for this are… 
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