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Isotropic etching

Known as: Etching (isotropic), Etching (plasma) 
Isotropic etching (e.g. wet etching or chemical etching) is a method commonly used in semi-conductor technology to remove material from a substrate… 
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Related topics

Related topics

3 relations
Dry etchingEtching (microfabrication)Reactive-ion etching

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
Herstellung und Charakterisierung eines CMOS-kompatiblen Multi-Elektroden-Arrays, nanomodifiziert mit Kohlenstoff-Nanoröhren und Ruthenium-Nano-Rasen
Die vorliegende Arbeit beschaftigt sich mit der Herstellung und Charakterisierung CMOS-kompatibler, nanomodifizierter Multi… 
2008
2008
Low Cost Inkjet-printing Paper-Based Modules for RFID Sensing and Wireless Applications
A very low cost substrate, paper makes one of the best substrate candidates for applications of Radio Frequency Identification… 
2005
2005
Finite Element Analysis and Life Estimation of a Permanent Cylindrical Mold with ANSYS and Coffin-Manson Approach
  • A. Roy
  • 2005
  • Corpus ID: 109365857
Highly Cited
2003
Highly Cited
2003
Luminescence of GaN nanocolumns obtained by photon-assisted anodic etching
GaN nanocolumns with transverse dimensions of about 50 nm were obtained by illumination-assisted anodic etching of epilayers… 
2003
2003
Gas-cluster ion-beam smoothing of chemo-mechanical-polish processed GaSb(100) substrates
Gas-cluster ion-beam (GCIB) processing of surfaces provides individual atoms within an accelerated gas cluster (∼1,500 atoms per… 
2002
2002
Morphology and Effects of Hydrogen Etching of Porous SiC
The morphology of the porous network in porous SiC has been studied. It has been found that pore formation starts with a few… 
1998
1998
A new method of etching ABS plastic for plating by ultrasound
An ultrasonic etching method is effective for pretreatment of ABS plastic for plating with fewer chemicals and lower cost of… 
1997
1997
Wafer-cleaning process after plasma metal etch
The developments associated with a new plasma etching technique for sub micron process using DUV resist has placed a new… 
1997
1997
Sacrificial aluminum etching for CMOS microstructures
This paper reports recent advances in surface micromachining by sacrificial aluminum etching (SALE). This method is applied to… 
1995
1995
3-Dimensional Process Simulation
  • Springer Vienna
  • 1995
  • Corpus ID: 29083449
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