Skip to search form
Skip to main content
Skip to account menu
Semantic Scholar
Semantic Scholar's Logo
Search 237,529,534 papers from all fields of science
Search
Sign In
Create Free Account
Isotropic etching
Known as:
Etching (isotropic)
, Etching (plasma)
Isotropic etching (e.g. wet etching or chemical etching) is a method commonly used in semi-conductor technology to remove material from a substrate…
Expand
Wikipedia
(opens in a new tab)
Create Alert
Alert
Related topics
Related topics
3 relations
Dry etching
Etching (microfabrication)
Reactive-ion etching
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
Herstellung und Charakterisierung eines CMOS-kompatiblen Multi-Elektroden-Arrays, nanomodifiziert mit Kohlenstoff-Nanoröhren und Ruthenium-Nano-Rasen
Andreas Jupe
2015
Corpus ID: 93761450
Die vorliegende Arbeit beschaftigt sich mit der Herstellung und Charakterisierung CMOS-kompatibler, nanomodifizierter Multi…
Expand
2011
2011
Studies on skin-core structure of stabilized PAN fibers by ultrasonic etching method
Wang Qi-fen
2011
Corpus ID: 99094134
After ultrasonic etching treatment,the morphology and the chemical constitution difference between the skin and the core of the…
Expand
2010
2010
Surface and thin film studies of the etching of molybdenum by xenon difluoride
O. Celik
2010
Corpus ID: 94225064
2009
2009
Microtrenching effect of SiC ICP etching in SF6/O2 plasma
丁瑞雪
,
杨银堂
,
韩茹
2009
Corpus ID: 135689986
2006
2006
Experimental verification of the diffusion theory for wet isotropic etching of si via circular mask openings
V. Svetovoy
,
J. Berenschot
,
M. Elwenspoek
2006
Corpus ID: 124254683
Isotropic etching of silicon in HF based solutions is expected to be controlled by the diffusion of fluorine to the silicon…
Expand
2005
2005
Finite Element Analysis and Life Estimation of a Permanent Cylindrical Mold with ANSYS and Coffin-Manson Approach
A. Roy
2005
Corpus ID: 109365857
2002
2002
Morphology and Effects of Hydrogen Etching of Porous SiC
A. Sagar
,
C. D. Lee
,
R. Feenstra
,
C. K. Inoki
,
T. Kuan
2002
Corpus ID: 30703567
The morphology of the porous network in porous SiC has been studied. It has been found that pore formation starts with a few…
Expand
1997
1997
Wafer-cleaning process after plasma metal etch
D. Louis
,
Wai-Mun Lee
,
D. Holmes
Advanced Lithography
1997
Corpus ID: 136828786
The developments associated with a new plasma etching technique for sub micron process using DUV resist has placed a new…
Expand
1997
1997
Sacrificial aluminum etching for CMOS microstructures
Oliver Paul
,
D. Westberg
,
M. Hornung
,
V. Ziebart
,
H. Baltes
Proceedings IEEE The Tenth Annual International…
1997
Corpus ID: 110469252
This paper reports recent advances in surface micromachining by sacrificial aluminum etching (SALE). This method is applied to…
Expand
1995
1995
3-Dimensional Process Simulation
Springer Vienna
1995
Corpus ID: 29083449