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Deep reactive-ion etching

Known as: Bosch process (microtechnology), DRIE, Bosch process 
Deep reactive-ion etching (DRIE) is a highly anisotropic etch process used to create deep penetration, steep-sided holes and trenches in wafers… 
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Broader (2)

Etching (microfabrication)Semiconductor device fabrication
Integrated circuitMicroelectromechanical systemsReactive-ion etchingThrough-silicon via

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2009
2009
Cryogenic deep reactive ion etching of silicon micro and nanostructures
OF DOCTORAL DISSERTATION HELSINKI UNIVERSITY OF TECHNOLOGY P.O. BOX 1000, FI-02015 TKK 
2006
2006
A CMOS Compatible Ultrasonic Transducer Fabricated With Deep Reactive Ion Etching
This paper describes design, fabrication, and test of an integrated micromachined ultrasound transducer (MUT). This MUT can work… 
2005
2005
Uniformity-improving dummy structures for deep reactive ion etching (DRIE) processes
In typical DRIE processes, the etch rate variation across the wafer increases with pattern density, severely limiting the pattern… 
2004
2004
Planarize the sidewall ripples of silicon deep reactive ion etching
In order to diminish the sidewall defects in silicon deep reactive ion etching process, depositing doped silicon dioxide and post… 
2004
2004
Refractive variable optical attenuator fabricated by silicon deep reactive ion etching
We report on a novel refractive variable optical attenuator with a wedge-shaped silicon optical leaker, in which a part of the… 
2003
2003
Deep reactive ion etching characteristics of a macromachined chemical reactor
While deep reactive ion etching using an inductively coupled plasma (ICP) source has proven to be a boon to the fabrication of… 
Highly Cited
2003
Highly Cited
2003
Critical aspect ratio dependence in deep reactive ion etching of silicon
Aspect ratio dependent etching and microloading effects are two mechanisms leading to non-uniformities in the etching of silicon… 
2003
2003
High-power optical microswitch fabricated by deep reactive ion etching (DRIE)
Development of a high power optical micro switch fabricated by deep reactive ion etching (DRIE) in silicon on insulator (SOI… 
2001
2001
Low-frequency process for silicon-on-insulator deep reactive ion etching
Due to the inherently non-uniform etching effects in the standard DRIE (Deep Reactive Ion Etch) process, a new technique has been… 
2000
2000
Deep reactive ion etching for lateral field emission devices
The authors describe the design, fabrication and testing of lateral field emission diodes utilizing the deep reactive ion etch… 
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