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Rapid thermal processing

Known as: RTP, Rapid thermal anneal, RTA 
Rapid Thermal Processing (RTP) refers to a semiconductor manufacturing process which heats silicon wafers to high temperatures (over 1,000 °C) on a… 
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Related topics

Related topics

10 relations
DopantDopant ActivationFurnace annealIon implantation

Broader (1)

Semiconductor device fabrication

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2018
2018
Effects of Rapid Thermal Annealing on Ar Inductively Coupled Plasma-Treated n-Type 4H-SiC Schottky and Ohmic Contacts
The effects of Ar inductively coupled plasma (ICP) treatment followed by a 600 °C–1000 °C rapid thermal annealing (RTA) on the n… 
2007
2007
Rapid thermal annealing induced change of the mechanism of multiphonon resonant Raman scattering from ZnO nanorods
2002
2002
Enhanced nitrogen incorporation by pulsed laser annealing of GaNxAs1-x formed by N ion implantation
We demonstrate that pulsed laser annealing followed by rapid thermal annealing greatly enhances incorporation of substitutional N… 
Highly Cited
2000
Highly Cited
2000
High nitrogen composition GaAsN by atmospheric pressure metalorganic vapor-phase epitaxy
1999
1999
THERMAL MODEL OF RAPID THERMAL PROCESSING SYSTEMS
Continuously shrinking device parameters and the enlargement of wafer diameters in semiconductor industry require best… 
Highly Cited
1993
Highly Cited
1993
Rapid thermal processing : science and technology
1. Rapid Thermal Processing - A Justification 2. Rapid Thermal Processing - Based Epitaxy 3. Rapid Thermal Growth and Processing… 
1993
1993
Control of rapid thermal processing: a system theoretic approach
Abstract Tight control of the wafer temperature is essential in Rapid Thermal Processing (RTP) of semiconductor wafers. Of the… 
1991
1991
Emissivity of silicon wafers during rapid thermal processing
The emissivity of silicon wafers was measured for two specfic conditions. Firstly the emissivity of silicon wafers below 700 C… 
1990
1990
Modelling of wafer heating during rapid thermal processing
A theory of wafer heating during rapid thermal processing is presented. It is demonstrated that temperature uniformity is not… 
Highly Cited
1989
Highly Cited
1989
Improved hot-carrier immunity in submicrometer MOSFETs with reoxidized nitrided oxides prepared by rapid thermal processing
The fabrication of 0.8- mu m MOSFETs using 7.7-nm-thick nitrided oxides reoxidized by rapid thermal processing at 900-1150… 
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