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Ion implantation

Known as: SIMOX, Ion implanter, Ion irradiation 
Ion implantation is a materials engineering process by which ions of a material are accelerated in an electrical field and impacted into a solid… 
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Papers overview

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Highly Cited
2006
Highly Cited
2006
We report the observation of single photon emission from single SiV (silicon-vacancy) centres in diamond produced by ion… 
Highly Cited
2005
Highly Cited
2005
Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented… 
Highly Cited
2005
Highly Cited
2005
We demonstrate a method for the controlled implantation of single ions into a silicon substrate with energy of sub-20‐keV. The… 
Highly Cited
1984
Highly Cited
1984
We model, in an elementary way, the excited electronic states of semiconductor crystallites sufficiently small (∼ 50 A diam) that… 
Highly Cited
1977
Highly Cited
1977
Ion Implantation of Semiconductors.By G. Carter and W. A. Grant. Pp. viii + 214. (Arnold: London, 1976.) Boards £9.50; paper £5… 
Highly Cited
1974
Highly Cited
1974
This paper considers the design, fabrication, and characterization of very small Mosfet switching devices suitable for digital… 
Highly Cited
1974
Highly Cited
1974
A methodical gross examination should be undertaken in all births and the results incorporated in the patient’s record. 
Review
1972
Review
1972
Radiation damage is produced in a crystalline target whenever a moving ion transfers sufficient energy to a target atom to… 
Highly Cited
1946
Highly Cited
1946
Prof. Patten states in the Preface that his -book "represents an endeavor to set forth in simple and readable form the phases of…