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Furnace anneal
Furnace annealing is a process used in semiconductor device fabrication which consist of heating multiple semiconductor wafers in order to affect…
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6 relations
Dopant
Ion implantation
Rapid thermal processing
Semiconductor
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2013
2013
Wafer-Level Integration of High-Quality Bulk Piezoelectric Ceramics on Silicon
E. Aktakka
,
R. L. Peterson
,
K. Najafi
IEEE Transactions on Electron Devices
2013
Corpus ID: 39646042
In this paper, we present a new post-CMOS-compatible piezoelectric thin/thick film technology that allows wafer-level integration…
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2012
2012
A study on electric properties for pulse laser annealing of ITO film after wet etching
C. J. Lee
,
H. K. Lin
,
+4 authors
J. Huang
2012
Corpus ID: 55986435
2012
2012
3D Structures in Battery Materials
J. Proell
,
R. Kohler
,
A. Mangang
,
S. Ulrich
,
C. Ziebert
,
Wilhelm Pfleging
2012
Corpus ID: 55158761
Efficient lithium-ion batteries will play an important role within the development of future mobile and stationary applications…
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2011
2011
Rapid thermal annealing of rare earth implanted ZnO epitaxial layers
S. Miranda
,
M. Peres
,
+5 authors
K. Lorenz
2011
Corpus ID: 76657520
2002
2002
Electronic structure of carbon-free silicon oxynitride films grown using an organic precursor hexamethyl-disilazane
A. Chainani
,
S. Nema
,
P. Kikani
,
P. I. John
2002
Corpus ID: 55236117
Silicon oxynitride films are grown by plasma-enhanced chemical vapour deposition on single-crystal Si(100) and textured Si solar…
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2002
2002
Phase transformation and paired-plate precipitate formation in Pb0.91La0.09Zr0.65Ti0.35O3 films grown on sapphire substrates
B. Tunaboylu
,
C. Ozkan
,
A. Ata
,
K. Ring
,
S. Esener
2002
Corpus ID: 54536413
2001
2001
Thickness-dependent microstructures and electrical properties of CaCu3Ti4O12 films derived from sol-gel process
Li-Chun Chang
,
Dai-Ying Lee
,
C. Ho
,
B. Chiou
2001
Corpus ID: 64672461
2000
2000
Single-layer thin HfO/sub 2/ gate dielectric with n+-polysilicon gate
L. Kang
,
Y. Jeon
,
+5 authors
J.C. Lee
Symposium on VLSI Technology. Digest of Technical…
2000
Corpus ID: 62810790
MOSCAPs and MOSFETs of a single-layer thin HfO/sub 2/ gate dielectric with n+ polysilicon gate were fabricated and characterized…
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1999
1999
Stress relief of tetrahedral amorphous carbon films by post- deposition thermal annealing
B. Tay
,
Xuetao Shi
,
+4 authors
J. R. Shi
1999
Corpus ID: 20280286
1990
1990
Investigations of Irradiation-Anneal-Reirradiation (IAR) properties trends of RPV welds
J. Hawthorne
,
A. Hiser
1990
Corpus ID: 136565364
Notch ductility, fracture toughness and tensile property trends of two high copper content, submerged arc welds with 288{degree}C…
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