Furnace anneal

Furnace annealing is a process used in semiconductor device fabrication which consist of heating multiple semiconductor wafers in order to affect… (More)
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2010
2010
Idea of a very short time annealing technology has evaluated in 1980s. Engineers tried to use Flash lamp, laser or some other… (More)
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2010
2010
The influence of laser plasma soft X-ray (LPX) irradiation on crystallization of a-Si film by infrared (IR) furnace annealing is… (More)
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2010
2010
In this paper the furnace annealing effects on the titanium silicide formation over a range of temperatures are investigated… (More)
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2006
2006
Copper electrochemical plating (ECP) has contributed to a significant rise in both systematic and random defects. A "missing… (More)
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2004
2004
Shape Memory Alloy (SMA) thin films are of particular interest as micro-actuators. Thus far, their use in microsystems is still… (More)
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2004
2004
The effects of regular furnace and high-temperature rapid thermal annealing (RTA) on the residual stress of LPCVD-polysilicon… (More)
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2003
2003
NiSi-silicided pn shallow junctions are fabricated using BF 2 1 implantation into/through thin NiSi silicide layer ~implant… (More)
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1999
1999
Solid phase crystallization of amorphous silicon films for poly-Si thin film transistors (TFTs) has advantages of low cost and… (More)
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1996
1996
In this work, we present a new post-deposition annealing technique that employs furnace annealing in N/sub 2/O (FN/sub O/) to… (More)
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Review
1995
Review
1995
A spray pyrolysis route to superconducting Pb-, Sr-, and Ag-substituted Tl-Ba-Ca-Cu-O thick films has been developed. First, a… (More)
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