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Furnace anneal

Furnace annealing is a process used in semiconductor device fabrication which consist of heating multiple semiconductor wafers in order to affect… 
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Papers overview

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2014
2014
Channel hot-carrier (CHC) reliability in p-FinFET devices is studied related to the postdeposition anneal (PDA) process. Clearly… 
2002
2002
Silicon oxynitride films are grown by plasma-enhanced chemical vapour deposition on single-crystal Si(100) and textured Si solar… 
2000
2000
  • L. KangY. Jeon J.C. Lee
  • 2000
  • Corpus ID: 62810790
MOSCAPs and MOSFETs of a single-layer thin HfO/sub 2/ gate dielectric with n+ polysilicon gate were fabricated and characterized… 
1997
1997
Ultrathin gate dielectrics are important to realize high performance and low-voltage operation CMOS devices. An advanced… 
1990
1990
Notch ductility, fracture toughness and tensile property trends of two high copper content, submerged arc welds with 288{degree}C…