Skip to search formSkip to main contentSkip to account menu

Molecular beam epitaxy

Known as: ATG instability, Molecular-beam epitaxy, Thermal reactive evaporation 
Molecular beam epitaxy (MBE) is an epitaxy method for thin-film deposition of single crystals. It was invented in the late 1960s at Bell Telephone… 
Wikipedia (opens in a new tab)

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2006
Highly Cited
2006
We study the effect of different deposition conditions on the properties of In-polar InN grown by plasma-assisted molecular beam… 
2004
2004
We study the impact of different buffer layers and growth conditions on the properties of InN layers grown on 6H–SiC(0001) by… 
Highly Cited
2003
Highly Cited
2003
We report noise characteristics, carrier capture probability, and photoconductive gain of InAs quantum-dot infrared… 
1995
1995
Thin film AlN has been grown on Al2O3 and GaAs substrates by metalorganic molecular beam epitaxy using amine bonded alane… 
Highly Cited
1991
Highly Cited
1991
We report the development of a new, integrable photoconductive detector, based on low‐temperature‐grown GaAs, that has a response… 
1991
1991
A combined molecular‐beam epitaxy and scanning tunneling microscopy system has been constructed. The design has been optimized… 
Highly Cited
1990
Highly Cited
1990
We have grown film structures by molecular beam epitaxy which include GaAs buffer layers grown at low substrate temperatures (250… 
Highly Cited
1983
Highly Cited
1983
High‐quality, nominally undoped, low‐resistivity ZnSe thin films are grown by molecular beam epitaxy (MBE). The MBE ZnSe shows… 
1976
1976
This paper reports the fabrication of low parasitic capacitance planar beam-leaded structures by means of a novel new technology…