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Chemical beam epitaxy

Known as: CBE (disambiguation), GS-MBE, MOMBE 
Chemical beam epitaxy (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III-V semiconductor systems… 
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Papers overview

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2013
2013
InN epilayers were prepared on c-GaN/sapphire substrates by plasma-assisted metal-organic molecular beam epitaxy using N2 and… 
Highly Cited
2009
Highly Cited
2009
Abstract-We report Al<sub>2</sub>O<sub>3</sub>Zln<sub>0.53</sub>Ga<sub>0.47</sub>As MOSFETs having both self-aligned in situ Mo… 
2008
2008
Silicon carbide (SiC) is a promising material for high power and high frequency devices due to its wide bandgap, high break down… 
2001
2001
We fabricated a 1200 nm range GaInNAs/GaAs quantum wells vertical cavity surface emitting laser grown by chemical beam epitaxy… 
Review
1995
Review
1995
The heteroepitaxial overgrowth of silicon by nearly lattice‐matched compound semiconductors is reviewed in the context of the… 
1993
1993
p-n-p InP/InGaAs heterojunction bipolar transistors (HBTs) are reported for the first time. The transistors, grown by metal… 
1991
1991
Selective area epitaxy and growth over patterned substrate using chemical beam epitaxy (CBE) were investigated. Truly selective… 
1987
1987
InP/InGaAsP/InGaAs avalanche photodiodes with separate absorption, grading, and multiplication regions (SAGM-APD's) have been…