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Chemical beam epitaxy

Known as: CBE (disambiguation), GS-MBE, MOMBE 
Chemical beam epitaxy (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III-V semiconductor systems… 
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Papers overview

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2011
2011
We report on the first synthesis and structural characterizations of a new Erbium (Er) compound, the erbium chloride silicate… 
2008
2008
Silicon carbide (SiC) is a promising material for high power and high frequency devices due to its wide bandgap, high break down… 
Highly Cited
2007
Highly Cited
2007
GaP/GaAsP/GaP segmented nanowires were grown by gas source molecular beam epitaxy on silicon (111) substrates. The nanowires were… 
2004
2004
We report on the transport properties of a tunable two-dimensional electron gas (2DEG) confined at the lower interface of a GaN… 
1995
1995
Thin film AlN has been grown on Al2O3 and GaAs substrates by metalorganic molecular beam epitaxy using amine bonded alane… 
1993
1993
p-n-p InP/InGaAs heterojunction bipolar transistors (HBTs) are reported for the first time. The transistors, grown by metal… 
1991
1991
Selective area epitaxy and growth over patterned substrate using chemical beam epitaxy (CBE) were investigated. Truly selective… 
1987
1987
We describe InP/In0.53Ga0.47As heterojunction phototransistors (HPT's) grown by chemical beam epitaxy (CBE). These devices…