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Lift-off (microtechnology)

Known as: Lift Off Process 
Lift-off process in microstructuring technology is a method of creating structures (patterning) of a target material on the surface of a substrate (e… 
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Related topics

Related topics

5 relations
Etching (microfabrication)Ohmic contactSputter depositionWafer (electronics)

Broader (1)

Semiconductor device fabrication

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2016
2016
Device characterization of the VCSEL-on-silicon as an on chip light source
Advancement of silicon photonics technology can offer a new dimension in data communications with un-precedent bandwidth… 
2014
2014
Fabrication of a 77 GHz Rotman Lens on a High Resistivity Silicon Wafer Using Lift-Off Process
Fabrication of a high resistivity silicon based microstrip Rotman lens using a lift-off process has been presented. The lens… 
2008
2008
Fabrication of carbon nanotube sensor device by inkjet printing
To overcome the limitation of conventional carbon nanotube fabrication techniques, inkjet printing was directly utilized on a… 
2006
2006
Ordered Arrays of Mesoporous Microrods from Recyclable Macroporous Silicon Templates
Ordered mesoporous materials fabricated by exploiting self-assembled surfactants as molecular templates have been intensively… 
2006
2006
A 385-500 GHz Low Noise Superconductor-Insulator- Superconductor Mixer for ALMA Band 8
We report on the design and experimental results of a fix-tuned Superconductor-Insulator-Superconductor (SIS) mixer for Atacama… 
2005
2005
Biomolecular linear motors confined to move upon micro-patterns on glass
Biomolecular linear motor proteins—kinesin and microtubules—are finely patterned on a conventional, flat glass substrate using a… 
2005
2005
High-Voltage Diamond Vertical Schottky rectifiers
We have designed, simulated and experimentally demonstrated high-voltage vertical diamond Schottky rectifiers. The rectifiers… 
2004
2004
Nanoimprint and Lift-Off Process Using Poly(vinyl alcohol)
We developed a lift-off process for a nanoimprint lithography (NIL) using poly(vinyl alcohol) (PVA) as the replicated material… 
1993
1993
Sub-50 nm high aspect-ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching
We present the fabrication of sub‐50 nm Si pillars, ridges, and trenches with aspect ratios greater than 10 using ultrahigh… 
1981
1981
Simple Metal Lift-Off Process For 1 Micron Al/5% Cu Lines
Two of the most challenging problems confronting processes aimed at 2μm pitch minimum geometries are: imaging on highly… 
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