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Lift-off (microtechnology)

Known as: Lift Off Process 
Lift-off process in microstructuring technology is a method of creating structures (patterning) of a target material on the surface of a substrate (e… 
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Related topics

Related topics

5 relations
Etching (microfabrication)Ohmic contactSputter depositionWafer (electronics)

Broader (1)

Semiconductor device fabrication

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2017
Highly Cited
2017
Demonstration of RF and Microwave Passive Circuits Through 3-D Printing and Selective Metalization
The ultimate goal of this paper is to print radio frequency (RF) and microwave structures using a 3-D platform and to pattern… 
Highly Cited
2013
Highly Cited
2013
Arsenic Formation on GaAs during Etching in HF Solutions: Relevance for the Epitaxial Lift-Off Process
The d-f emission from Ce3+ and Pr3+ in garnets is attracting considerable attention, especially in relation to application in… 
Highly Cited
2011
Highly Cited
2011
High-throughput micromixers based on acoustic streaming induced by surface acoustic wave
Flow characteristics in microfluidic devices is naturally laminar due to the small channel dimensions. Mixing based on molecular… 
Highly Cited
2007
Highly Cited
2007
Nanoscale Patterning and Electronics on Flexible Substrate by Direct Nanoimprinting of Metallic Nanoparticles
Recent years have witnessed an expanding interest in the application of flexible polymer materials (e.g., polyimide, polyester… 
Highly Cited
2006
Highly Cited
2006
Multidirectional UV Lithography for Complex 3-D MEMS Structures
Various three-dimensionally (3-D) complex MEMS structures are fabricated using multidirectional ultraviolet (UV) lithography… 
Review
2005
Review
2005
3D chip stack technology using through-chip interconnects
The current technology in micro-and nano-electronics is insufficient to meet future demands for several applications. Most state… 
Highly Cited
2005
Highly Cited
2005
One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography
We have developed a process to fabricate a cross-bar structure using UV-curable nanoimprint lithography with a UV-curable double… 
Highly Cited
2004
Highly Cited
2004
Gap-Dependent Optical Coupling of Single “Bowtie” Nanoantennas Resonant in the Visible
Metallic “bowtie” nanoantennas consisting of two opposing tip-to-tip Au triangles have been fabricated with triangle lengths of… 
Highly Cited
2001
Highly Cited
2001
Patterning nonflat substrates with a low pressure, room temperature, imprint lithography process
Step and flash imprint lithography (SFIL) is a technique that has the potential to replace photolithography for patterning resist… 
Highly Cited
1998
Highly Cited
1998
Development and applications of very high flux microfiltration membranes
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