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Lift-off (microtechnology)

Known as: Lift Off Process 
Lift-off process in microstructuring technology is a method of creating structures (patterning) of a target material on the surface of a substrate (e… 
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Papers overview

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Highly Cited
2017
Highly Cited
2017
The ultimate goal of this paper is to print radio frequency (RF) and microwave structures using a 3-D platform and to pattern… 
Highly Cited
2013
Highly Cited
2013
The d-f emission from Ce3+ and Pr3+ in garnets is attracting considerable attention, especially in relation to application in… 
Highly Cited
2011
Highly Cited
2011
Flow characteristics in microfluidic devices is naturally laminar due to the small channel dimensions. Mixing based on molecular… 
Highly Cited
2007
Highly Cited
2007
Recent years have witnessed an expanding interest in the application of flexible polymer materials (e.g., polyimide, polyester… 
Highly Cited
2006
Highly Cited
2006
Various three-dimensionally (3-D) complex MEMS structures are fabricated using multidirectional ultraviolet (UV) lithography… 
Review
2005
Review
2005
The current technology in micro-and nano-electronics is insufficient to meet future demands for several applications. Most state… 
Highly Cited
2005
Highly Cited
2005
We have developed a process to fabricate a cross-bar structure using UV-curable nanoimprint lithography with a UV-curable double… 
Highly Cited
2004
Highly Cited
2004
Metallic “bowtie” nanoantennas consisting of two opposing tip-to-tip Au triangles have been fabricated with triangle lengths of… 
Highly Cited
2001
Highly Cited
2001
Step and flash imprint lithography (SFIL) is a technique that has the potential to replace photolithography for patterning resist…