Sputter deposition

Known as: Co-sputters, Sputter coating, Reactive sputtering 
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target… (More)
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Papers overview

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2017
2017
We have succeeded in the rf magnetron sputter deposition of high resistivity boron carbide (B1−xCx). This has been accomplished… (More)
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2014
2014
A physical vapor deposition (PVD) method using plasma discharge-glancing angle deposition (GLAD), based on a variation of the… (More)
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2011
2011
Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of… (More)
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2009
2009
Nanostructured silver films were deposited at room temperature on polypropylene non-wovens by radio frequency magnetron sputter… (More)
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2008
2008
The prapamtion of fully dense, boron targets for use in planar magnetron sources has lead to the synthesis of Boron Nitride (BN… (More)
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2006
2006
The application of either hydroxyapatite (HA) or titanium dioxide (TiO2) as coatings onto existing bioinert materials has been… (More)
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2006
2006
The ion beam sputter deposition (IBSD) and electroless plating techniques have been combined to achieve the precipitation of Cu… (More)
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2005
2005
In this study a simple route to preparing photochromic silver nanoparticles in a TiO 2 matrix is presented, which is based upon… (More)
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1998
1998
Metal sputter deposition processes for semiconductor manufacturing are characterized by a decrease in deposition rate from run to… (More)
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1998
1998
A -1 040 Vienna, Austria pyka@iue.tuwien.ac.at We simulate the DC-magnetron sputter deposition of TiN-films to investigate the… (More)
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