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Sputter deposition
Known as:
Co-sputters
, Sputter coating
, Reactive sputtering
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Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target…
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Related topics
Related topics
25 relations
Diamond-like carbon
Evaporation (deposition)
Hard disk drive
Indium tin oxide
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Broader (1)
Semiconductor device fabrication
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2007
Highly Cited
2007
ZnO-based light-emitting metal-insulator-semiconductor diodes
D. Hwang
,
M. Oh
,
Jae-Hong Lim
,
Yong‐Seok Choi
,
Seong-Ju Park
2007
Corpus ID: 121157072
The ZnO-based metal-insulator-semiconductor (MIS) diode was fabricated by using an insulator ZnO layer and an n-ZnO layer grown…
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Highly Cited
2006
Highly Cited
2006
Structure, optical, and magnetic properties of sputtered manganese and nitrogen-codoped ZnO films
Z. Gu
,
Ming-Hui Lu
,
+7 authors
Xiaoqing Pan
2006
Corpus ID: 120062979
To realize the hole-mediated ferromagnetism, manganese and nitrogen-codoped ZnO (Zn1−xMnxO:N) films were prepared on sapphire…
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Highly Cited
2002
Highly Cited
2002
Manufacture of specific structure of aluminum-doped zinc oxide films by patterning the substrate surface
X. Jiang
,
C. Jia
,
B. Szyszka
2002
Corpus ID: 56196084
(0001)-oriented aluminum-doped zinc oxide films were prepared using a magnetron sputtering technique. High-resolution…
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2002
2002
Ordering of island-like FePt L10 thin films
Mu-gyeom Kim
,
Sung-chul Shin
,
K. Kang
2002
Corpus ID: 54681823
We report the island growth morphology of 50-nm-thick FePt thin films prepared on MgO substrates by dc magnetron sputtering. In…
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Highly Cited
2000
Highly Cited
2000
Photoluminescence and heteroepitaxy of ZnO on sapphire substrate (0001) grown by rf magnetron sputtering
Kyoung-Kok Kim
,
Jae-Hoon Song
,
+4 authors
Jeongyong Lee
2000
Corpus ID: 55078115
ZnO thin films were epitaxially grown on α-Al2O3 (0001) single-crystal substrates by rf magnetron sputtering. The films were…
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Highly Cited
1998
Highly Cited
1998
Run by run advanced process control of metal sputter deposition
T. Smith
,
D. Boning
,
J. Stefani
,
S. W. Butler
International Conference on Microelectronic Test…
1998
Corpus ID: 16988042
Metal sputter deposition processes for semiconductor manufacturing are characterized by a decrease in deposition rate from run to…
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Highly Cited
1997
Highly Cited
1997
Synthesis of carbon nitride films at low temperatures
P. Hammer
,
M. Baker
,
C. Lenardi
,
W. Gissler
1997
Corpus ID: 46680196
Carbon nitride films (CNx) have been deposited by sputtering a graphite target with nitrogen ions. Films were grown both with and…
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1993
1993
Sub-50 nm high aspect-ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching
P. Fischer
,
S. Chou
1993
Corpus ID: 6710769
We present the fabrication of sub‐50 nm Si pillars, ridges, and trenches with aspect ratios greater than 10 using ultrahigh…
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1986
1986
Properties of chromium nitrides deposited by reactive sputtering
O. Knotek
,
W. Bosch
,
M. Atzor
,
W. Münz
,
D. Hoffmann
,
J. Goebel
1986
Corpus ID: 100487264
Influence des parametres de pulverisation (pressions partielles des gaz, puissance, temperature) sur les proprietes des depots de…
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Highly Cited
1975
Highly Cited
1975
Properties of Sn‐Doped In2 O 3 Films Prepared by RF Sputtering
John C. C. Fan
,
F. Bachner
1975
Corpus ID: 116563117
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