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Sputter deposition

Known as: Co-sputters, Sputter coating, Reactive sputtering 
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a "target… Expand
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Highly Cited
2010
Highly Cited
2010
Publisher Summary Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based on… Expand
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Highly Cited
2008
Highly Cited
2008
Simulation of the Sputtering Process.- Electron Emission from Surfaces Induced by Slow Ions and Atoms.- Modeling of the Magnetron… Expand
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Highly Cited
2008
Highly Cited
2008
Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as the new paradigm of advanced sputtering… Expand
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Highly Cited
2007
Highly Cited
2007
Zinc oxide thin films were deposited by radio frequency magnetron sputtering at room temperature using a metallic zinc target in… Expand
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Highly Cited
2006
Highly Cited
2006
Abstract Biaxially aligned thin films have not only a preferential crystallographic out-of-plane orientation, but also have an… Expand
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Highly Cited
2006
Highly Cited
2006
The effect of the high pulse current and the duty cycle on the deposition rate in high power pulsed magnetron sputtering (HPPMS… Expand
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Highly Cited
2003
Highly Cited
2003
Abstract A combined investigation of mechanical stress generation by in situ substrate curvature measurements during the growth… Expand
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Highly Cited
2003
Highly Cited
2003
Nanocrystalline porous nitrogen doped titanium dioxide (TiO2) thin films were prepared by DC magnetron sputtering. Films were… Expand
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Highly Cited
2001
Highly Cited
2001
A combined theoretical and experimental approach has been used to study nanoscale CoFe/Cu/CoFe multilayer films grown by sputter… Expand
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Highly Cited
1996
Highly Cited
1996
The origin and interpretation of the Raman features of amorphous (hydrogenated) carbonfilmsdeposited at room temperature in the… Expand
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