Remote plasma

A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a… (More)
Wikipedia

Topic mentions per year

Topic mentions per year

1994-2018
051019942018

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
Current–voltage measurements of Au contacts deposited on ex situ cleaned, n-type ZnO!0001" #!0001̄"$ surfaces showed reverse bias… (More)
  • figure 2
  • figure 1
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2013
2013
Laboratory training and student research work are extremely important components characterizing the level and efficiency of… (More)
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2013
2013
PbSe nanocrystal thin-film transistors (TFTs) were passivated using remote plasma atomic layer deposition (ALD) of a ~10 nm thick… (More)
  • figure 1
  • figure 2
  • figure 3
  • figure 4
Is this relevant?
2012
2012
This paper describes a systematic approach to analyze the simultaneous impact of various reactant plasma parameters of remote… (More)
  • figure 2
  • figure 1
  • figure 3
  • figure 4
Is this relevant?
2011
2011
A novel low-stress process for transferring thermal CVD single-layer graphene from copper foils to destination substrates is… (More)
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2009
2009
We have succeeded in fabricating ultrafine carbon nanotube (CNT) via interconnects with SiOC interlayer dielectrics. High-quality… (More)
  • figure 1
  • figure 4
  • figure 2
  • figure 5
  • figure 3
Is this relevant?
2007
2007
In this paper, the remote plasma generated in a pulsed-dc powered gas-flow hollow-cathode discharge in Ar with Al and Cu targets… (More)
  • figure 1
  • figure 2
  • figure 3
  • table I
  • figure 4
Is this relevant?
2006
2006
Bi-layer gate stacks consisting of a HfO/sub 2/ and an interfacial layer are fabricated by remote plasma oxidation (RPO) of Hf… (More)
  • table 1
  • figure 1
  • figure 2
  • figure 4
  • figure 3
Is this relevant?
2000
2000
Nitrogen trifluoride (NF3) is a likely candidate to replace perfluorocompounds ~PFCs! in stripping and reactor cleaning… (More)
  • figure 1
  • figure 3
  • figure 2
  • figure 4
  • figure 6
Is this relevant?
1999
1999
Remote plasma activated chemical vapor deposition (RPACVD) is an attractive fabrication technique owing to the increased… (More)
  • figure 2
Is this relevant?