Skip to search formSkip to main content
You are currently offline. Some features of the site may not work correctly.

Remote plasma

A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a… Expand
Wikipedia

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2009
Highly Cited
2009
Platinum and platinum oxide films were deposited by remote plasma atomic layer deposition (ALD) from the combination of… Expand
  • table I
  • figure 2
  • figure 1
  • figure 3
  • figure 4
Is this relevant?
Highly Cited
2008
Highly Cited
2008
TaN and TiN films were deposited by remote plasma atomic layer deposition (ALD) using the combinations of Ta[N(CH 3 ) 2 ] 5… Expand
  • table I
  • figure 1
  • table II
  • figure 2
  • figure 3
Is this relevant?
Highly Cited
2008
Highly Cited
2008
In situ spectroscopic ellipsometry (SE) was applied to study the pyramidlike and pillarlike growth of Al doped ZnO (AZO) films… Expand
  • table I
  • figure 1
  • table II
  • figure 2
  • figure 3
Is this relevant?
Highly Cited
2007
Highly Cited
2007
An RF microplasma jet working at atmospheric pressure has been developed for thin film deposition application. It consists of a… Expand
  • figure 1
  • figure 2
  • figure 3
  • figure 4
Is this relevant?
2007
2007
Abstract Two structures of low dielectric constant (low- k ) SiOC films were elucidated in this work. Low- k thin film by remote… Expand
  • figure 1
  • figure 2
  • figure 3
  • table 1
  • figure 4
Is this relevant?
Highly Cited
2005
Highly Cited
2005
Current–voltage measurements of Au contacts deposited on ex situ cleaned, n-type ZnO(0001) [(0001¯)] surfaces showed reverse bias… Expand
  • figure 2
  • figure 1
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2001
2001
doubling every year or two forthe past 40 years. This remarkable increase in perfor-mance has required shrinking the integrated… Expand
  • figure 1
Is this relevant?
1998
1998
Interfacial Si suboxides (SiOx, x 500 °C initially there is a rapid segregation into amorphous Si (a-Si) surrounded by a SiO2… Expand
  • figure 1
  • figure 2
  • figure 3
  • figure 5
  • figure 4
Is this relevant?
1993
1993
Remote plasma‐activated chemical‐vapor deposition (RPACVD) provides a means to deposit thin dielectric films with low ion… Expand
  • figure 1
  • table I
  • table II
  • table II
  • figure 2
Is this relevant?
1991
1991
The temperature for thermal desorption of the gallium oxide from GaAs is shown to increase linearly with oxide thickness. In… Expand
  • figure I
  • figure 3
  • figure 2
  • figure 4
Is this relevant?