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Remote plasma

A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a… 
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Related topics

Related topics

5 relations
Chemical vapor depositionPhysical vapor depositionPlasma cleaningPlasma-activated bonding

Broader (1)

Semiconductor device fabrication

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
Ultrasonic Coating and Holographic Exposure Technology. Phase 1
Abstract : This report describes research efforts by Revision Military Technologies, LLC. in the development of an ultrasonic… 
Review
2015
Review
2015
JSS FOCUS ISSUE ON ADVANCED INTERCONNECTS :M ATERIALS ,P ROCESSING, AND RELIABILITY Mechanical Stability of Porous Low-k Dielectrics
This paper reviews the mechanical and fracture properties of porous ultralow-k dielectrics with the focus on chip package… 
2014
2014
Spatial distribution of the electrical potential and ion concentration in the downstream area of atmospheric pressure remote plasma
This paper presents the results from an experimental study of the ion flux characteristics behind the remote plasma zone in a… 
2010
2010
Formation mechanism of metal nanodots induced by remote plasma exposure
We have demonstrated formation of Pt nanodots by remote H 2 , He or Ar plasma treatments of ultrathin Pt films deposited on SiO 2… 
2006
2006
Apparatus for generating remote plasma
An apparatus for generating remote plasma is provided to improve the quality of a thin film by controlling cations generated when… 
2006
2006
Measurement of electron temperatures of Argon Plasmas in a High-Density Inductively-Coupled Remote Plasma System by Langmuir Probe and Optical-Emission Spectroscopy
We measured electron density and electron energy distribution function (EEDF) in our reactor by a Langmuir probe. The EEDF of Ar… 
1999
1999
Investigations of Remote Plasma Irregularites by Radio Sounding: Applications of the Radio Plasma Imager on IMAGE
The Radio Plasma Imager (RPI) on the Imager for Magnetopause-to-Aurora Global Exploration (IMAGE) mission operates like a radar… 
1993
1993
Monte Carlo hydrodynamic simulation of neutral radical transport in low pressure remote plasma activated chemical vapor deposition
In electron cyclotron resonance plasma sources for semiconductor processing (1–10 s mTorr), the mean free paths of neutral… 
1992
1992
Factors affecting the Cl atom density in a chlorine discharge
A mathematical model was developed for the bulk plasma of an electrodeless chlorine discharge sustained in a tubular reactor. The… 
Highly Cited
1991
Highly Cited
1991
Oxide thickness effect and surface roughening in the desorption of the oxide from GaAs
The temperature for thermal desorption of the gallium oxide from GaAs is shown to increase linearly with oxide thickness. In… 
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