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Back end of line

Known as: BEOL 
The back end of line (BEOL) is the second portion of IC fabrication where the individual devices (transistors, capacitors, resistors, etc.) get… 
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Papers overview

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Highly Cited
2019
Highly Cited
2019
The manufacturers of high-performance logic have been ardent champions of Moore's Law, which has resulted in exponential increase… 
Highly Cited
2012
Highly Cited
2012
We present a fully-integrated SOI CMOS 22nm technology for a diverse array of high-performance applications including server… 
Highly Cited
2011
Highly Cited
2011
Node-agnostic Cu TSVs integrated with high-K/metal gate and embedded DRAM were used in functional 3D modules. Thermal cycling and… 
Highly Cited
2009
Highly Cited
2009
Direct ionization from low energy protons is shown to cause upsets in a 65-nm bulk CMOS SRAM, consistent with results reported… 
Highly Cited
2006
Highly Cited
2006
DIAGNOSIX is a comprehensive fault diagnosis methodology for characterizing failures in digital ICs. Using limited layout… 
2006
2006
This paper reports the characterization of poly-silicon-germanium disk resonators at frequencies ranging from 35 to 425MHz. The… 
Highly Cited
2006
Highly Cited
2006
System-on-Chip (SOC) and System-on-Package (SOP) technologies each have advantages depending on application needs. As system… 
Highly Cited
2005
Highly Cited
2005
We present solutions to the key process technology challenges of three-dimensional (3D) integrated circuits (ICs) that enable… 
Highly Cited
2005
Highly Cited
2005
A high performance 65 nm SOI CMOS technology is presented. Dual stress liner (DSL), embedded SiGe, and stress memorization…