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Ultrapure water
Ultrapure water (also UPW or high-purity water) is water that has been purified to uncommonly stringent specifications. Ultrapure water is a commonly…
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Cleanroom
Klaiber's law
Semiconductor industry
Wafer (electronics)
Broader (1)
Semiconductor device fabrication
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Toxicologic evaluation of chronic feeding of glyphosate-resistant transgenic soybean GTS40-3-2 meal to rats
Jianqin Yuan
,
Zhongwei Tang
,
Jianghe Zhao
,
Zongyong Shi
,
Jundong Wang
2017
Corpus ID: 58887427
To assess the safety of glyphosate-resistant transgenic soybean, the transgenic soybean GTS40-3-2 meal and its non-transgenic…
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2016
2016
Facile synthesis of cubical Co3O4 supported Au nanocomposites with high activity for the reduction of 4-nitrophenol to 4-aminophenol
Yuwen Yang
,
Yongyun Mao
,
+4 authors
Hongwei Yang
2016
Corpus ID: 73711402
Cubic Co3O4 supported Au nanocomposites have been synthesized via a facile impregnation method. The Au/Co3O4 exhibited excellent…
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2012
2012
Functionalization of silver nanowire surfaces with copper oxide for surface-enhanced Raman spectroscopic bio-sensing
Peng Peng
,
H. Huang
,
A. Hu
,
A. Gerlich
,
Y. Zhou
2012
Corpus ID: 97432263
A facile method to fabricate copper oxide functionalized silver nanowires with high sensitivity to biomolecules is reported for…
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2011
2011
HIE-ISOLDE SRF DEVELOPMENT ACTIVITIES AT CERN
M.Therasse
,
O. Brunner
,
S. Calatroni
,
J.K.Chambrillon
,
B. Delaup
,
M.Pasini
2011
Corpus ID: 67754979
The HIE-ISOLDE project has initiated a new development phase in the SRF domain at CERN. In particular, the HIE-ISOLDE project…
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2010
2010
Supercritical Fluid—Solid Growth of Single-Crystalline Silicon Nanowires: An Example of Metal-Free Growth in an Organic Solvent
Fang-Wei Yuan
,
Hsing‐Yu Tuan
2010
Corpus ID: 100985777
We report the synthesis of single-crystalline silicon nanowires on a SiOx film-covered Si substrate in supercritical benzene…
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2010
2010
Passive Wireless Monitoring of Wafer Cleanliness During Rinsing of Semiconductor Wafers
Xu Zhang
,
Jun Yan
,
B. Vermeire
,
F. Shadman
,
J. Chae
IEEE Sensors Journal
2010
Corpus ID: 15970199
Semiconductor facilities consume large amounts of water, most of which is used for rinsing of wafers during cleaning steps. To…
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2008
2008
A Comparative Study of Metal Readsorption in the Application of a Three-Stage Sequential Extraction Scheme and Two Accelerated Versions (Ultrasonic and Single Extractions)
G. Pérez
,
M. Valiente
,
C. Bendicho
2008
Corpus ID: 980591
Accelerated methods for partitioning of Cd, Cr, Cu, Ni, Pb and Zn, such as the use of single and ultrasonic ex- tractions are…
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2005
2005
Solubility selective membrane materials for carbon dioxide removal from mixtures with light gases
Haiqing Lin
2005
Corpus ID: 136708715
2004
2004
Ultrapure Water Production by Continuous Electrodeionization Method: Technology and Economy
V. Fedorenko
Pharmaceutical Chemistry Journal
2004
Corpus ID: 39318004
Electrodeionization (EDI) and mixed bed deionization (MBDI) processes usually occupy the same position in the technological…
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2003
2003
Stringing up the Pearls: Self-Assembly, Optical and Electronic Properties of CdSe− and Au−LiMo3Se3 Nanoparticle−Nanowire Composites
Frank E. Osterloh
,
Jason S. Martino
,
H. Hiramatsu
,
D. Hewitt
2003
Corpus ID: 96203364
Chevrel-type LiMo3Se3 nanowires dissolved in dimethyl sulfoxide were decorated with 13 nm citrate ligated Au particles (water…
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