Tungsten disilicide

Known as: Tungsten silicide, Tungsten(IV) silicide, WSi2

Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is an electrically conductive ceramic material.

Papers overview

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2015

The W/Si(001) Schottky barrier height is mapped to nanoscale dimensions using ballistic electron emission microscopy (BEEM) over…

2007

In order to clarify the relationship between evaporation of WO 3 and formation of a SiO 2 scale in WSi 2 , high temperature…

2006

A Multilayer Laue Lens (MLL) is a new type of linear zone plate, made by sectioning a planar depth-graded multilayer and used in…

2005

A technology is described for fabricating SiGe heterojunction bipolar transistors (HBTs) on wafer-bonded silicon-on-insulator…

1990

Experimental results are presented for a WSi2/TiN compound-gate MOSFET with a near-midgap work function ranging from 4.63 to 4.75…

1987

Raman scattering as a technique for studying the formation of tungsten silicide is discussed. The tungsten silicide films were…

1985

The Raman spectrum of tungsten silicide has been observed and is reported for the first time. It was obtained on the MOLE■ Raman…

1984

Polycides, composite wiring/electrode films formed by depositing a refractory metal silicide such as WSi2, MoSi2, or TaSi2atop a…

1984

This paper describes a new technique for the fabrication of high-transconductance GaAs MESFET's. Tungsten-silicide gate, self…

1983

This paper will report on a GaAs 1K static RAM using tungsten silicide gate self-aligned technology and ion implantation. Address…