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Tungsten disilicide

Known as: Tungsten silicide, Tungsten(IV) silicide, WSi2 
Tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is an electrically conductive ceramic material.
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2015
2015
The W/Si(001) Schottky barrier height is mapped to nanoscale dimensions using ballistic electron emission microscopy (BEEM) over… Expand
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Highly Cited
2013
Highly Cited
2013
Researchers develop a fiber-coupled single-photon-detection system using amorphous tungsten silicide superconducting nanowire… Expand
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2012
2012
We observed that in chemical vapor deposition (CVD) tungsten silicide (WSix) poly gate scheme, the gate oxide thickness decreases… Expand
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2005
2005
The work function of fully nickel-silicided polysilicon was investigated. The midgap work function (4.7 eV) was obtained for… Expand
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Highly Cited
1986
Highly Cited
1986
The effects of mechanical stress on radiation damage in polycide-gate MOS capacitors have been investigated as a function of gate… Expand
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Highly Cited
1985
Highly Cited
1985
The propagation delay of interconnection lines is a major factor in determining the performance Of VLSI circuits because the RC… Expand
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1985
1985
The Raman spectrum of tungsten silicide has been observed and is reported for the first time. It was obtained on the MOLE■ Raman… Expand
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1983
1983
This paper will report on a GaAs 1K static RAM using tungsten silicide gate self-aligned technology and ion implantation. Address… Expand
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Highly Cited
1983
Highly Cited
1983
Low-pressure chemical vapor deposition of tungsten silicide has been done and the properties of the deposited films have been… Expand
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Highly Cited
1982
Highly Cited
1982
Effect of scaling of dimensions, i.e., increase in chip size and decrease in minimum feature size, on the RC time delay… Expand
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