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Fluorosilicate glass
Fluorosilicate glass (FSG) is a low-k dielectric used in between copper metal layers during silicon integrated circuit fabrication process. It has a…
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Related topics
5 relations
CMOS
Copper interconnect
Integrated circuit
Semiconductor device fabrication
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2018
2018
Nd/La, Er/Lu and Er/Yb/Lu-codoped transparent lead fluoroborate and fluorosilicate glass-ceramics
O. Petrova
,
A. Sologub
,
M. Zykova
,
A. Khomyakov
International Conference Laser Optics
2018
Corpus ID: 52016156
Lead fluoroborate and fluorosilicate glasses codoped with Nd<sup>3+</sup>/La<sup>3+</sup>, Er<sup>3+</sup>/Lu<sup>3+</sup> and Er…
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2013
2013
Spectrum upconversion and downconversion in (Tm3+,Yb3+) and (Tb3+,Yb3+) co-doped fluorosilicate glass
Z. Pan
,
R. Akrobetu
,
S. Morgan
Optics & Photonics - Solar Energy + Applications
2013
Corpus ID: 137428604
We investigated the upconversion and downconversion luminescence in (Tb3+, Yb3+) and (Tb3+, Yb3+) co-doped lithiumlanthanum…
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2008
2008
Investigation on up-conversion luminescence of Tm 3+ and Yb 3+ codoped oxy-fluorosilicate glass ceramics
Gan Zong-Song
,
Yu Hua
,
Li Yan-ming
,
Wang Ya-nan
,
Chen Hui
,
Zhao Li-juan
2008
Corpus ID: 100700480
Two series of Tm 3+ and Yb 3+ codoped oxy-fluorosilicate glass ceramics with the composition of 30SiO 2 -(20- x - y )Al 2 O 3…
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2008
2008
Characteristics of Oxide Layers Formed on Al2021 Alloys by Plasma Electrolytic Oxidation in Aluminate Fluorosilicate Electrolyte
Kai Wang
,
B. Koo
,
C. Lee
,
Young Joo Kim
,
Sunghun Lee
,
E. Byon
2008
Corpus ID: 59495919
Oxide layers were prepared on Al2021 alloys substrate under a hybrid voltage of AC 200 V (60 ㎐) combined with DC 260 V value at…
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2004
2004
Integration of a stack of two fluorine doped silicon oxide film with ULSI interconnect metallization
Yi-Lung Cheng
,
Ying-Lang Wang
,
+6 authors
M. Feng
2004
Corpus ID: 73648220
2004
2004
Quecksilberchalkogen-Fluorosilicate
H. Puff
,
G. Lorbacher
,
D. Heine
Die Naturwissenschaften
2004
Corpus ID: 263985789
2003
2003
Organofluorosilicate Glass Interlayer Dielectric Material and Integration Study
M. O'neill
,
Y. Cheng
,
+9 authors
M. D. Bitner
2003
Corpus ID: 115146010
Organofluorosilicate glass (OFSG) films of the composition Si:O:C:H:F were deposited via plasma enhanced chemical vapor…
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2000
2000
Study the impact of liner thickness on the 0.18 μm devices using low dielectric constant hydrogen silsesquioxane as the interlayer dielectric
J. Lan
,
Ying-Lang Wang
,
+5 authors
M. Feng
2000
Corpus ID: 59430582
2000
2000
Comprehensive Investigation on Fluorosilicate Glass Prepared by Temperature‐Difference‐Based Liquid‐Phase Deposition
C. Yeh
,
Yueh-Chuan Lee
,
Kwo-Hau Wu
,
Yuh-Ching Su
,
Su-Chen Lee
2000
Corpus ID: 34880607
This study investigates the properties of fluorosilicate glass film prepared by temperature-difference-based liquid-phase…
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1980
1980
Vapor Phase Growth of β-SiC Whiskers with Fluorosilicate Melt
H. Saito
,
I. Yamai
1980
Corpus ID: 139583881
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