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Etching (microfabrication)

Known as: Acid polishing, Etching (disambiguation), Etching (microfab) 
Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important… 
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Related topics

Related topics

32 relations
CMOSCapacitive sensingCapacitively coupled plasmaChemical-mechanical planarization

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2009
Highly Cited
2009
First experimental demonstration of 100 nm inversion-mode InGaAs FinFET through damage-free sidewall etching
The first well-behaved inversion-mode InGaAs FinFET with gate length down to 100 nm with ALD Al2O3 as gate dielectric has been… 
Highly Cited
2006
Highly Cited
2006
Homojunction photodiodes based on Sb-doped p-type ZnO for ultraviolet detection
ZnO-based p-n homojunctions were grown using molecular-beam epitaxy. Sb and Ga were used as dopants to achieve the p-type and n… 
Highly Cited
2006
Highly Cited
2006
Directed Integration of Tetracyanoquinodimethane‐Cu Organic Nanowires into Prefabricated Device Architectures
1D nanostructures (such as nanotubes and nanowires) of semiconductor materials have attracted a lot of interest in recent years… 
Highly Cited
2006
Highly Cited
2006
Integrated CMOS-MEMS with on-chip readout electronics for high-frequency applications
A bridge-shaped first-lateral-mode 60-MHz mechanical resonator, which is monolithically integrated with capacitive CMOS readout… 
Highly Cited
2006
Highly Cited
2006
Self‐Assembly Combined with Photopolymerization for the Fabrication of Fluorescence “Turn‐On” Vesicle Sensors with Reversible “On–Off” Switching Properties
The irradiation of p-type silicon with 2 MeV He was carried out using a single-ended accelerator. The desired pattern was fed… 
Highly Cited
2003
Highly Cited
2003
Single-step fabrication of silicon-cone arrays
A regular lattice of SiO2 microspheres on a quartz support is used as a microlens system for laser-induced single-step… 
Highly Cited
2001
Highly Cited
2001
Totally silicided (CoSi/sub 2/) polysilicon: a novel approach to very low-resistive gate (/spl sim/2/spl Omega///spl square/) without metal CMP nor etching
In this paper we present for the first time mid-gap CoSi/sub 2/ metal gates obtained by total gate silicidation meaning that the… 
Highly Cited
1999
Highly Cited
1999
Low-Loss Passive Optical Waveguides Based on Photosensitive Poly(pentafluorostyrene-co-glycidyl methacrylate)
Low-loss optical waveguides have been fabricated from fluorinated copolymers designed to incorporate photochemical amplification… 
Highly Cited
1999
Highly Cited
1999
Positioning of self-assembled, single-crystal, germanium islands by silicon nanoimprinting
Strain energy from the lattice mismatch of a heteroepitaxial system can create “self-assembled,” single-crystal islands… 
Highly Cited
1987
Highly Cited
1987
Laser-induced chemical etching of silicon in chlorine atmosphere
Chemical etching of single-crystalline (100)Si induced by pulsed laser irradiation at 308, 423, and 583 nm has been investigated… 
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