Doping (semiconductor)

Known as: Doping, Chemical doping, Semiconductor doping 
In semiconductor production, doping intentionally introduces impurities into an extremely pure intrinsic semiconductor for the purpose of modulating… (More)
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Topic mentions per year

Topic mentions per year

1956-2017
01000200019562016

Papers overview

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Highly Cited
2013
Highly Cited
2013
The field of optics has a drastic impact in the field of electronics and communication. With the rising need for higher data… (More)
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Highly Cited
2013
Highly Cited
2013
Using calibrated simulations, we report a detailed study of the doping-less tunnel field effect transistor (TFET) on a thin… (More)
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Highly Cited
2013
Highly Cited
2013
A simple technique is explored to determine the temporal photo-response, s, of individual semiconducting SiC and Si nanowires… (More)
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Highly Cited
2011
Highly Cited
2011
This paper describes the parametrization of a new coarse grained (CG) model for lipid and surfactant systems. Reduction of the… (More)
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Highly Cited
2009
Highly Cited
2009
Amorphous oxide semiconductors (AOSs) are expected as new channel materials in thin-film transistors (TFTs) for large-area and/or… (More)
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Highly Cited
2009
Highly Cited
2009
Owing to the size mismatch between light and nanoscale objects such as single molecules, it is important to be able to control… (More)
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Highly Cited
2006
Highly Cited
2006
This paper has described the performance of CMOS and categorises the variability. The inability to scale the tolerance of… (More)
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2005
2005
Doping—the intentional introduction of impurities into a material—is fundamental to controlling the properties of bulk… (More)
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Highly Cited
2002
Highly Cited
2002
This work measures the thermal conductivities along free-standing silicon layers doped with boron and phosphorus at… (More)
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Highly Cited
2000
Highly Cited
2000
MOSFETs with gate length down to 17 nm are reported. To suppress the short channel effect, a novel self-aligned double-gate… (More)
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