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Atomic layer etching

Atomic layer etching is an emerging technique in semiconductor manufacture, in which a sequence alternating between self-limiting chemical… Expand
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Related topics

Related topics

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Atomic layer depositionHigh-κ dielectricSemiconductor device fabrication

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Etching (microfabrication)

Papers overview

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2017
2017
Atomic layer etching of InGaAs by controlled ion beam
Atomic layer etching (ALE) could be an important next-generation etching technique, applicable to various semiconductor materials… Expand
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2017
2017
Thermal Atomic Layer Etching of ZnO by a “Conversion-Etch” Mechanism Using Sequential Exposures of Hydrogen Fluoride and Trimethylaluminum
The atomic layer etching (ALE) of ZnO thin films was demonstrated using sequential, self-limiting thermal reactions with hydrogen… Expand
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2017
2017
Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions
Current (and future) microelectronics fabrication requirements place unprecedented demands on the fidelity of plasma etching. As… Expand
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2015
2015
Cyclic Etch/Passivation-Deposition as an All-Spatial Concept toward High-Rate Room Temperature Atomic Layer Etching
Conventional (3D) etching in silicon is often based on the ‘Bosch’ plasma etch with alternating half-cycles of a directional… Expand
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2015
2015
Atomic Layer Etching of HfO2 Using Sequential, Self-Limiting Thermal Reactions with Sn(acac)2 and HF
The atomic layer etching (ALEt) of HfO2 was performed using sequential, self-limiting thermal reactions with tin(II… Expand
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2013
2013
Atomic layer etching of Al2O3 using BCl3/Ar for the interface passivation layer of III-V MOS devices
BeO was investigated as the interface passivation layer (IPL) between a high-k dielectric and a III-V compound semiconductor… Expand
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2012
2012
Atomic layer etching of graphene for full graphene device fabrication
Abstract The possibility of fabricating a full graphene device was investigated by utilizing atomic layer etching (ALET… Expand
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2011
2011
Layer by Layer Etching of the Highly Oriented Pyrolythic Graphite by Using Atomic Layer Etching
The layers of exfoliation graphene obtained by scotch taping of highly oriented pyrolythic graphite could be controlled precisely… Expand
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1996
1996
Realization of atomic layer etching of silicon
An experimental system and methodology were developed to realize dry etching of single crystal silicon with monolayer accuracy… Expand
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1995
1995
Molecular dynamics simulation of atomic layer etching of silicon
A molecular dynamics study of 50 eV Ar+ ion bombardment of a Si(100) crystal with a monolayer of adsorbed chlorine was conducted… Expand
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