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Atomic layer etching

Atomic layer etching is an emerging technique in semiconductor manufacture, in which a sequence alternating between self-limiting chemical… 
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Related topics

Related topics

4 relations
Atomic layer depositionHigh-κ dielectricSemiconductor device fabrication

Broader (1)

Etching (microfabrication)

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2019
2019
Atomic Layer Etching (ALE) of WSe2 Yielding High Mobility p-FETs
The layer-dependent electronic band structure of transition metal dichalcogenides (TMDCs) enable a plethora of novel electronic… 
2018
2018
Model for atomic layer etching describes reaction mechanism for controlled silicon dioxide removal
A first principles model of atomic layer etching describes the mass and energy transport through the polymer passivation layer… 
2016
2016
Evaluation of atomic layer etching possibility at Lund Nano Lab
In modern electronics, device downscaling demands atomic precision control and Atomic Layer Etching (ALE) can provide this prime… 
2016
2016
High Precision Plasma Etch for Pattern Transfer: Towards Fluorocarbon Based Atomic Layer Etching
Title of Thesis: HIGH PRECISION PLASMA ETCH FOR PATTERN TRANSFER: TOWARDS FLUOROCARBON BASED ATOMIC LAYER ETCHING Dominik Metzler… 
2015
2015
Novel methods atomic layer etching (ale) that uses sequential self-limiting heat reaction
The present invention includes a method of promoting atomic layer etching of the surface (ALE). In some embodiments, the method… 
2013
2013
Damaged silicon contact layer removal using atomic layer etching for deep-nanoscale semiconductor devices
Silicon atomic layer etching (ALET) using Cl2 is applied to remove the damaged layer on a 30 nm contact silicon surface formed by… 
2012
2012
Atomic layer etching using metastables formed from an inert gas
Substrate processing systems and methods for etching an atomic layer are disclosed. The methods and systems are configured to… 
2012
2012
Atomic layer etching method of graphene
PURPOSE: An atomic layer etching method is provided to control graphene etching with an atom as a unit, to selectively control… 
2010
2010
Atomic layer etching using a pulsed plasma
A system and method for fast atomic layer etching (ALET), has a pulsed plasma source, a reaction chamber. Plasma source includes… 
2010
2010
Atomic layer by pulsed plasma etching
The present invention provides a fast atom layer etching (an ALET) system and method, the system includes a pulsed plasma source…