Skip to search formSkip to main contentSkip to account menu

Atomic layer deposition

Known as: ALD 
Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of a gas phase chemical process. ALD is… 
Wikipedia (opens in a new tab)

Related topics

Related topics

21 relations
Atomic layer epitaxyAtomic layer etchingChemical vapor depositionCombustion chemical vapor deposition

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2015
Highly Cited
2015
Improvement of the humidity stability of organic–inorganic perovskite solar cells using ultrathin Al2O3 layers prepared by atomic layer deposition
For the successful commercialization of organic–inorganic halide perovskite solar cells, it is necessary to ensure their… 
Highly Cited
2010
Highly Cited
2010
Structural, electrical, and optical properties of atomic layer deposition Al-doped ZnO films
Al-doped ZnO (AZO) films of ∼100 nm thickness with various Al doping were prepared at 150 °C by atomic layer deposition on quartz… 
Highly Cited
2010
Highly Cited
2010
Enhanced Stability of LiCoO2 Cathodes in Lithium-ion Batteries Using Surface Modification by Atomic Layer Deposition
Ultrathin atomic layer deposition (ALD) coatings were found to enhance the performance of lithium-ion batteries (LIBs). Previous… 
Review
2009
Review
2009
In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
In this paper recent work on the application of in situ spectroscopic ellipsometry (SE) during thin film synthesis by atomic… 
Highly Cited
2008
Highly Cited
2008
GaAs interfacial self-cleaning by atomic layer deposition
The reduction and removal of surface oxides from GaAs substrates by atomic layer deposition (ALD) of Al2O3 and HfO2 are studied… 
Highly Cited
2008
Highly Cited
2008
Atomic layer deposition of tin oxide films using tetrakis(dimethylamino) tin
The authors present a new method for preparing thin films of SnO2 by atomic layer deposition (ALD) using alternating exposures to… 
Highly Cited
2007
Highly Cited
2007
Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition
Sorption and diffusion of precursors through polymer layers were considered as limitations to the successful implementation of a… 
Highly Cited
2006
Highly Cited
2006
Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
Thin Al2O3 films of different thicknesses (10–40nm) were deposited by plasma-assisted atomic layer deposition on substrates of… 
Review
2003
Review
2003
Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing
Atomic layer deposition (ALD) has been studied for several decades now, but the interest in ALD of metal and nitride thin films… 
Highly Cited
2002
Highly Cited
2002
Atomic layer deposition (ALD): from precursors to thin film structures
By clicking accept or continuing to use the site, you agree to the terms outlined in our Privacy Policy (opens in a new tab), Terms of Service (opens in a new tab), and Dataset License (opens in a new tab)