Skip to search formSkip to main contentSkip to account menu

Atomic layer epitaxy

Known as: ALCVD 
Atomic layer epitaxy (ALE) or Atomic Layer Chemical Vapor Deposition (ALCVD), now more generally called Atomic Layer Deposition (ALD), is a… 
Wikipedia (opens in a new tab)

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2002
2002
Photoluminescent (PL) ZnS:Cu thin films were prepared by atomic‐layer chemical vapor deposition (ALCVD) and by thermal… 
1999
1999
We report a method to smooth the rough surface of GaAs microstructures. This method is based on the nucleation process for atomic… 
1997
1997
Abstract : Thin-layer electrochemical studies of the underpotential deposition (UPD) of Zn, Te, Se, and S on polycrystalline Au… 
1994
1994
A study of the aging behavior of atomic layer epitaxy (ALE) ZnS:Mn alternating‐current thin‐film electroluminescent (ACTFEL… 
1992
1992
  • R. Skogman
  • 1992
  • Corpus ID: 111050721
A MOCVD based atomic layer epitaxy process is being developed as a potential solution to the problems of film thickness and… 
1990
1990
ZnS was grown on GaAs (001) substrates by a metalorganic molecular beam epitaxy (MOMBE) technique, using sequential dimethylzinc… 
1987
1987
We report the first observation of stimulated emission (16 K and 77 K) in any material grown by atomic layer epitaxy (ALE). The…