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Atomic layer epitaxy

Known as: ALCVD 
Atomic layer epitaxy (ALE) or Atomic Layer Chemical Vapor Deposition (ALCVD), now more generally called Atomic Layer Deposition (ALD), is a… 
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Papers overview

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2005
2005
We discuss properties of thin films of ZnO and ZnMnO grown with atomic layer epitaxy using new, organic zinc and manganese… 
2003
2003
Many of the physical properties between strained epilayers and relaxed epilayers can be different. A critical layer thickness… 
1999
1999
We report a method to smooth the rough surface of GaAs microstructures. This method is based on the nucleation process for atomic… 
1997
1997
Abstract : Thin-layer electrochemical studies of the underpotential deposition (UPD) of Zn, Te, Se, and S on polycrystalline Au… 
1996
1996
Growth and Characterization of Thin Film Electroluminescent Devices Fabricated Using Atomic Layer Epitaxy 
1994
1994
A study of the aging behavior of atomic layer epitaxy (ALE) ZnS:Mn alternating‐current thin‐film electroluminescent (ACTFEL… 
1993
1993
Abstract : This document summarizes the work performed under the Phase I project aimed at developing the wide bandgap nitrides… 
1993
1993
Electrical and optical measurements of ZnS:Mn alternating‐current thin‐film electroluminescent (ACTFEL) devices grown by atomic… 
1989
1989
Recent advances in thin-film crystal-g:rowth techniques such as molecular-beam epitaxy (MBE) have enabled the fabrication of…