Skip to search formSkip to main content
You are currently offline. Some features of the site may not work correctly.

Atomic layer epitaxy

Known as: ALCVD 
Atomic layer epitaxy (ALE) or Atomic Layer Chemical Vapor Deposition (ALCVD), now more generally called Atomic Layer Deposition (ALD), is a… Expand
Wikipedia

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2013
2013
Enhancements in AlGaN/GaN high-electron-mobility transistor (HEMT) performance have been realized through ultrathin (4 nm) AlN… Expand
  • figure 1
  • table I
  • figure 2
  • figure 3
Is this relevant?
2011
2011
Abstract The potential for enhancement of Si-based devices by growth of SiC films on large-diameter Si wafers is hampered by the… Expand
  • figure 6
Is this relevant?
2007
2007
We present a method that uses patterned self-assembled monolayers (SAMs) of alkanethiolates on silver as templates to fabricate… Expand
  • figure 1
  • figure 3
  • figure 2
  • figure 4
Is this relevant?
2006
2006
Abstract This paper describes the first instance of HgTe growth by electrochemical atomic layer epitaxy (EC-ALE). EC-ALE is the… Expand
  • figure 1
  • figure 2
  • figure 3
  • figure 4
  • figure 5
Is this relevant?
2006
2006
Studies of the optimization of HgSe thin film deposition using electrochemical atomic layer epitaxy (EC-ALE) are reported. Cyclic… Expand
  • figure 1
  • figure 3
  • figure 5
  • figure 8
  • figure 7
Is this relevant?
2005
2005
The growth of HgSe using electrochemical atomic-layer epitaxy (EC-ALE) is reported. EC-ALE is the electrochemical analog of ALE… Expand
  • figure 1
  • figure 2
  • table I
  • figure 4
  • figure 5
Is this relevant?
2001
2001
Abstract The crystallisation behaviour of ZrO 2 thin films on Si(0 0 1) wafers, deposited either by ALCVD or by evaporation, was… Expand
Is this relevant?
2001
2001
We report on a pulsed atomic layer epitaxy (PALE) technique for quaternary AlInGaN growth. PALE allows for the deposition of high… Expand
  • figure 1
  • figure 3
  • figure 2
  • figure 4
Is this relevant?
Highly Cited
1997
Highly Cited
1997
Ta2O5 thin films have been deposited in atomic layer epitaxy process from Ta(OC2H5)5 and H2O. A quartz crystalline mass-sensor… Expand
  • figure 2
Is this relevant?
Highly Cited
1995
Highly Cited
1995
TiN thin films were grown on soda lime glass substrates by atomic layer epitaxy. Two different chemical schemes were studied: a… Expand
  • figure 1
  • figure 3
  • figure 4
  • figure 5
  • figure 6
Is this relevant?