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High-κ dielectric
Known as:
High-k dielectric
, High-k
, High-k Metals
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The term high-κ dielectric refers to a material with a high dielectric constant κ (as compared to silicon dioxide). High-κ dielectrics are used in…
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Broader (1)
Electronic engineering
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2010
2010
A Configurable SRAM with Constant-Negative-Level Write Buffer for Low Voltage Operation with 0.149μm2 Cell in 32nm High-k Metal Gate CMOS
Fujimura Yuki
,
Hirabayashi Osamu
,
+8 authors
Yabe Tomoaki
2010
Corpus ID: 116840569
Highly Cited
2008
Highly Cited
2008
High-performance InGaZnO thin-film transistors with high-k amorphous Ba0.5Sr0.5TiO3 gate insulator
Jungbae Kim
,
C. Fuentes-Hernandez
,
B. Kippelen
2008
Corpus ID: 118619386
We report on high-performance n-channel thin-film transistors (TFTs) fabricated using amorphous indium gallium zinc oxide (a-IGZO…
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Review
2006
Review
2006
Advanced high-κ dielectric stacks with polySi and metal gates
P. GusevE.
,
NarayananV.
,
M. FrankM.
2006
Corpus ID: 215856956
The paper reviews our recent progress and current challenges in implementing advanced gate stacks composed of high-κ dielectric…
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2004
2004
Ammonia pretreatment for high-κ dielectric growth on silicon
R. Brewer
,
M.-T. Ho
,
+5 authors
N. Moumen
2004
Corpus ID: 121692248
Thermal nitridation of H∕Si(100) surfaces with NH3 gas has been studied as a pretreatment for atomic layer deposition of Al2O3…
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Highly Cited
2002
Highly Cited
2002
New Mechanism of Body Charging in Partially Depleted SOI-MOSFETs with Ultra-thin Gate Oxides
J. Pretet
,
T. Matsumoto
,
+5 authors
H. Brut
European Solid-State Device Research Conference
2002
Corpus ID: 14413082
The aggressive scaling of the gate oxide leads to direct gate tunneling current, which affects the floatingbody effects in…
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Highly Cited
2001
Highly Cited
2001
Origin of electric field enhancement in field emission from amorphous carbon thin films
J. D. Carey
,
R. D. Forrest
,
S. R. Silva
2001
Corpus ID: 10213870
The observation of electron emission from amorphous carbon thin films at low applied electric fields is explained in terms of an…
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Highly Cited
1997
Highly Cited
1997
Boundary integral methods applied to the analysis of diffractive optical elements
D. Prather
,
M. Mirotznik
,
J. Mait
1997
Corpus ID: 54206019
We apply boundary integrals to the analysis of diffraction from both conductive and dielectric diffractive optical elements…
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Highly Cited
1984
Highly Cited
1984
Nonradiative dielectric waveguide
T. Yoneyama
1984
Corpus ID: 107643399
Highly Cited
1980
Highly Cited
1980
Scattering and guiding of waves by dielectric gratings with arbitrary profiles
K. Chang
,
V. Shah
,
T. Tamir
1980
Corpus ID: 43103977
Based on an exact solution of the pertinent boundary-value problem, a method is presented for finding the electromagnetic fields…
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Highly Cited
1971
Highly Cited
1971
A new low-loss high-k temperature-compensated dielectric for microwave applications
D. Masse
,
R. Pucel
,
D. Readey
,
E. Maguire
,
C. P. Hartwig
1971
Corpus ID: 62746277
A new dielectric material has been developed with a temperature-stable dielectric constant of 38. The low loss exhibited at…
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