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Strained silicon directly on insulator

Known as: SSDOI 
Strained silicon directly on insulator (SSDOI) is a procedure developed by IBM which removes the silicon germanium layer in the strained silicon… 
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Papers overview

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2017
2017
A difunctional monomer containing a strained olefin ring and an unstrained olefin, ether group or other group polymerizable with… 
2016
2016
My half-century journey started from synthetic organic chemistry. During the first stage of my journey, my interest in… 
2014
2014
Strain engineering technology is now routinely integrated in the wafer fabrication process to increase the carrier mobility and… 
2014
2014
Self-supporting In<inf>0.2</inf>Ga<inf>0.8</inf>As (15 nm)/GaAs (35 nm) microtubes array was fabricated on GaAs (100) through… 
2014
2014
The electron effective mobility in ultrathin-body (UTB) n-MOSFETs fabricated on Ge-free 30% strained-Si directly on insulator… 
2010
2010
Alloys of germanium (Ge) and tin (Sn) get much research attention because of possible direct band gap semiconductors. In this… 
2006
2006
The combination of channel mobility enhancement techniques such as strain engineering, with non-classical MOS device… 
2005
2005
Thin-body MOSFET geometries such as fully-depleted SO1 and double-gate devices are attractive because they can offer superior… 
1999
1999
Abstract : It has been shown that the growth interruption peffomed for calibration of VI-II flux ratio leads to the additional…