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Self-discharge
Known as:
Charge retention
, Loss of charge
Self-discharge is a phenomenon in batteries in which internal chemical reactions reduce the stored charge of the battery without any connection…
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Related topics
Related topics
4 relations
Float voltage
State of health
TI MSP430
Trickle charging
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Transactive-Market-Based Operation of Distributed Electrical Energy Storage with Grid Constraints
M. Faqiry
,
Lawryn Edmonds
,
Haifeng Zhang
,
A. Khodaei
,
Hongyu Wu
2017
Corpus ID: 29483458
In a transactive energy market, distributed energy resources (DERs) such as dispatchable distributed generators (DGs), electrical…
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2008
2008
Model based state of charge estimation method for ultra-capacitor
Ren-gui Lu
,
Guoliang Wu
,
Rui Ma
,
Chunbo Zhu
IEEE Vehicle Power and Propulsion Conference
2008
Corpus ID: 38235091
Ultra-capacitor has the features of high power density, quick charge and long life cycle, which receives great attention in the…
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2007
2007
Modeling of retention characteristics for metal and semiconductor nanocrystal memories
W. Guan
,
S. Long
,
+4 authors
R. Jia
2007
Corpus ID: 18314781
2007
2007
P-Type Floating Gate for Retention and P/E Window Improvement of Flash Memory Devices
C. Shen
,
J. Pu
,
Ming-Fu Li
,
B. Cho
IEEE Transactions on Electron Devices
2007
Corpus ID: 2116295
A flash memory with a lightly doped p-type floating gate is proposed, which improves charge retention and programming/erase (P/E…
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2007
2007
Effects of Lateral Charge Spreading on the Reliability of TANOS (TaN/AlO/SiN/Oxide/Si) NAND Flash Memory
Chang-seok Kang
,
Jungdal Choi
,
+7 authors
Kinam Kim
IEEE International Reliability Physics Symposium…
2007
Corpus ID: 7069118
It was found that the charge loss behavior of TANOS (TaN-Al2O3-nitride-oxide-silicon) cells for NAND flash memory application is…
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Highly Cited
2007
Highly Cited
2007
Numerical Simulation of Bottom Oxide Thickness Effect on Charge Retention in SONOS Flash Memory Cells
S. Gu
,
Chih-Wei Hsu
,
Tahui Wang
,
Wenpin Lu
,
Y. Ku
,
Chih-Yuan Lu
IEEE Transactions on Electron Devices
2007
Corpus ID: 24068118
In this paper, bottom-oxide thickness (Tbo) and program/erase stress effects on charge retention in SONOS Flash memory cells with…
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2006
2006
SiO2∕Si3N4∕Al2O3 stacks for scaled-down memory devices: Effects of interfaces and thermal annealing
M. Lisiansky
,
A. Heiman
,
+9 authors
T. Claasen
2006
Corpus ID: 108984934
Effects of interfaces and thermal annealing on the electrical performance of the SiO2∕Si3N4∕Al2O3 (ONA) stacks in nonvolatile…
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Highly Cited
2000
Highly Cited
2000
A solution to the dead-layer problem in ionization and phonon-based dark matter detectors
T. Shutt
,
J. Emes
,
+5 authors
S. White
2000
Corpus ID: 122879765
Highly Cited
1991
Highly Cited
1991
Analog floating-gate synapses for general-purpose VLSI neural computation
B. W. Lee
,
B. Sheu
,
H. Yang
1991
Corpus ID: 60947728
A floating-gate-based synapse structure for neural computing fabricated by a standard double-polysilicon CMOS process is…
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Highly Cited
1954
Highly Cited
1954
C12(x,xn)C11 AND Al27(x, x2pn)Na24 CROSS SECTIONS AT HIGH ENERGIES
W. Birnbaum
,
W. Crandall
,
G. Millburn
,
R. Pyle
1954
Corpus ID: 117182472
The ${\mathrm{C}}^{12}(x, xn){\mathrm{C}}^{11}$ and ${\mathrm{Al}}^{27}(x, x2pn){\mathrm{Na}}^{24}$ cross sections were measured…
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