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RCA clean

Known as: RCA (disambiguation) 
The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion… 
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Chemical vapor depositionChemical-mechanical planarizationMicrofabricationSemiconductor

Papers overview

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2016
2016
The growth and characterization of Group IV alloys for near to mid-infrared detectors
2015
2015
In Situ TEM Creation of Nanowire Devices
.......................................................................................................................................................................... v Resumé .......................................................................................................................................................................... vi Conferences ................................................................................................................................................................ vii Publications ...................................................................................................................................................... vii Other contributions ............................................................................................................................................ vii Acknowledgement .................................................................................................................................................. vii 
2014
2014
Surface Cleaning of (100) n-Ge by H 2 O 2 Aqueous Solution
[Introduction] Surface cleaning of any semiconductors to remove contaminants is of fundamental importance for improving device… 
2011
2011
Electro-optic adaptive microlens
Approval: Committee Chair: Thomas W. Smith Program Director: Bruce W. Smith Dean, KGCOE: Harvey J. Palmer 
2008
2008
An Experimental Technique for the Study of the Mechanical Behavior of Thin Film Materials at Micro- and Nano-Scale
...................................................................................................................... iii… 
2007
2007
Impact of RCA clean on hafnium dielectrics
2003
2003
Wafer Cleaning: Wet Methods Still Lead the Pack
As feature sizes continue their frantic descent into the sub-0.6 pm region, wafer cleaning is on its way toward becoming a true… 
2003
2003
High‐k dielectric stack‐ellipsometry and electron diffraction measurements of interfacial oxides
With the silicon interface becoming increasingly scrutinized in high dielectric constant materials for SiO2 replacement, fine… 
2000
2000
Microphotonics { Materials , Physics , and Applications Chairs
Withdrawn. PHOTONIC CRYSTALS IN A MAGNETIC FIELD. Qiao Feng, Chun Zhang, Jun Wan and Jian Zi, Surface Physics Laboratory, Fudan… 
1996
1996
Effects of Variations in RCA Clean on Breakdown Characteristics of Thin Gate Oxides