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RCA clean

Known as: RCA (disambiguation) 
The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion… 
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Related topics

Related topics

8 relations
Chemical vapor depositionChemical-mechanical planarizationMicrofabricationSemiconductor

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2016
2016
The growth and characterization of Group IV alloys for near to mid-infrared detectors
2015
2015
In Situ TEM Creation of Nanowire Devices
.......................................................................................................................................................................... v Resumé .......................................................................................................................................................................... vi Conferences ................................................................................................................................................................ vii Publications ...................................................................................................................................................... vii Other contributions ............................................................................................................................................ vii Acknowledgement .................................................................................................................................................. vii 
2011
2011
Electro-optic adaptive microlens
Approval: Committee Chair: Thomas W. Smith Program Director: Bruce W. Smith Dean, KGCOE: Harvey J. Palmer 
2011
2011
Modified RCA clean transfer of graphene and all-carbon electronic devices fabrication
Graphene is regarded as a promising material that could be the basis for future generations of low-power, faster, and smaller… 
2008
2008
An Experimental Technique for the Study of the Mechanical Behavior of Thin Film Materials at Micro- and Nano-Scale
...................................................................................................................... iii… 
2005
2005
CROSS-VALIDATION OF COMPETITIVE ASSOCIATIVE NETS FOR STABLE TEMPERATURE CONTROL OF RCA CLEANING SOLUTIONS
For cleaning silicon wafers via the RCA clean, temperature control is important for stable cleaning performance, but difficult… 
2003
2003
Wafer Cleaning: Wet Methods Still Lead the Pack
As feature sizes continue their frantic descent into the sub-0.6 pm region, wafer cleaning is on its way toward becoming a true… 
1994
1994
Surface cleaning effects on reliability for devices with ultrathin oxides or oxynitrides
A new wafer cleaning procedure has been developed for ultra-thin thermal oxidation process (<EQ 50 angstrom). This involves a… 
1994
1994
Effects of surface preparation on the electrical and reliability properties of ultrathin thermal oxide
A new wafer cleaning procedure has been developed for ultrathin thermal oxidation process (/spl les/50 /spl Aring/). It consists… 
Highly Cited
1984
Highly Cited
1984
Comparison of experimental and theoretical results on polysilicon emitter bipolar transistors
Two types of polysilicon emitter transistors have been fabricated using identical processing except for the surface treatment… 
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