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RCA clean

Known as: RCA (disambiguation) 
The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion… 
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Related topics

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Chemical vapor depositionChemical-mechanical planarizationMicrofabricationSemiconductor

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2018
2018
Effective Use of UV‐Ozone Oxide in Silicon Solar Cell Applications
It is long recognized that high‐quality surface cleaning is critical for an increased performance of solar cells and… 
2016
2016
The Current Status and the Future Prospects of Surface Passivation in 4H-SiC Transistors
The degraded performance of 4H-SiC transistors due to a high density of the SiC/SiO2 interface states (DIT ) (~1012-1013 eV-1cm-2… 
2016
2016
The growth and characterization of Group IV alloys for near to mid-infrared detectors
2015
2015
In Situ TEM Creation of Nanowire Devices
.......................................................................................................................................................................... v Resumé .......................................................................................................................................................................... vi Conferences ................................................................................................................................................................ vii Publications ...................................................................................................................................................... vii Other contributions ............................................................................................................................................ vii Acknowledgement .................................................................................................................................................. vii 
2011
2011
Electro-optic adaptive microlens
Approval: Committee Chair: Thomas W. Smith Program Director: Bruce W. Smith Dean, KGCOE: Harvey J. Palmer 
2011
2011
Modified RCA clean transfer of graphene and all-carbon electronic devices fabrication
Graphene is regarded as a promising material that could be the basis for future generations of low-power, faster, and smaller… 
2008
2008
An Experimental Technique for the Study of the Mechanical Behavior of Thin Film Materials at Micro- and Nano-Scale
...................................................................................................................... iii… 
2006
2006
Ensemble of Competitive Associative Nets for Stable Learning Performance in Temperature Control of RCA Cleaning Solutions
For cleaning silicon wafers via the RCA clean, temperature control is important in order to obtain a stable performance, but it… 
2005
2005
CROSS-VALIDATION OF COMPETITIVE ASSOCIATIVE NETS FOR STABLE TEMPERATURE CONTROL OF RCA CLEANING SOLUTIONS
For cleaning silicon wafers via the RCA clean, temperature control is important for stable cleaning performance, but difficult… 
2003
2003
Wafer Cleaning: Wet Methods Still Lead the Pack
As feature sizes continue their frantic descent into the sub-0.6 pm region, wafer cleaning is on its way toward becoming a true… 
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