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Pulsed laser deposition

Known as: PLD 
Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber… 
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Papers overview

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Highly Cited
2015
Highly Cited
2015
Monoclinic gallium oxide thin films were grown on (0001) sapphire at various substrate temperatures ranging from 400 to 1000 °C… 
Review
2008
Review
2008
This paper reviews our recent studies of the fundamentals of growth morphology evolution in Pulsed Laser Deposition in two… 
Highly Cited
2005
Highly Cited
2005
Thin films of poly (lactide-co-glycolide) (PLGA), a biodegradable polymer, were deposited on Si wafers by both conventional… 
Highly Cited
2003
Highly Cited
2003
Partial table of contents: History and Fundamentals of Pulsed Laser Deposition (J. Cheung). Diagnostics and Characteristics of… 
Highly Cited
2000
Highly Cited
2000
  • L. Mei
  • 2000
  • Corpus ID: 138193579
The pulsed laser deposition is a new technique for the growth of thin films,which has been attended generally by people recently… 
Highly Cited
1999
Highly Cited
1999
ZnO thin films were epitaxially grown on c-sapphire substrates by pulsed laser deposition at substrate temperatures of 500–800 °C… 
Highly Cited
1998
Highly Cited
1998
A new formalism for analyzing the magnetohydrodynamic stability of a limiter tokamak edge plasma is developed. Two radially… 
Highly Cited
1994
Highly Cited
1994
This paper show that under optimized deposition condition, films can be grown having a full width at half maximum (FWHM) value of…