Skip to search formSkip to main contentSkip to account menu

PROLITH

PROLITH (abbreviated from Positive Resist Optical LITHography) is a computer simulator modeling the optical and chemical aspects of photolithography… 
Wikipedia (opens in a new tab)

Related topics

Related topics

3 relations
Computational lithographyComputer simulation

Broader (1)

Semiconductor device fabrication

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2014
2014
A compact physical CD-SEM simulator for IC photolithography modeling applications
Scanning Electron Microscopy (SEM) is widely used to measure Critical Dimensions (CD) in semiconductor lithography processes. As… 
2013
2013
School of Chemical Technology Degree Programme of Materials Science and Engineering Petri Hirvonen PHASE FIELD CRYSTAL MODELING OF GRAIN BOUNDARIES IN GRAPHENE Master’s thesis for the degree of…
Graphene is a two-dimensional allotrope of carbon that exhibits extraordinary crystalline, mechanical, electrical, thermal and… 
2013
2013
High-order aberration measurement technique based on a quadratic Zernike model with optimized source
Abstract. In this paper, we propose an aberration metrology (AM) of a lithographic projection lens based on aerial images (AI) by… 
2009
2009
Optimization of pupil sampling scheme for aerial-image-based aberration measurement of projection optics in lithographic tools
In this paper, the aberration measurement technique using aerial image sensor (AIS) is further discussed, and an approach to… 
2007
2007
Mechanistic simulation of line-edge roughness
Physically-based photoresist models, such as those in PROLITH, have been very successful in describing photolithography from a… 
2004
2004
Run-to-run critical dimension and sidewall angle lithography control using the PROLITH simulator
We derive and investigate three different run-to-run (R2R) feedback controllers for the purpose of trying to minimize the… 
2003
2003
Overlay metrology simulations: analytical and experimental validations
We have previously reported on an overlay metrology simulation platform, used for modeling both the effects of overlay metrology… 
Review
2001
Review
2001
Mechanistic understanding of line-end shortening
In recent years the line end shortening (LES) phenomena, known also as line end pullback, has emerged as a significant issue in… 
1993
1993
An Adaptive Nonlinear Control Strategy for Photolithography
A closed-loop adaptive control technique for photolithography is proposed and evaluated, In this strategy, development time is… 
1990
1990
A Comparison Of The Optical Projection Lithography Simulators In Sample And Prolith
SAMPLE and PROLITH are two computer programs widely available for simulating the optical projection photolithography process… 
By clicking accept or continuing to use the site, you agree to the terms outlined in our Privacy Policy (opens in a new tab), Terms of Service (opens in a new tab), and Dataset License (opens in a new tab)