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Computational lithography

Known as: Computational scaling 
Computational lithography (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the… 
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Related topics

Related topics

7 relations
CMOSIntegrated circuitJones calculusNumerical aperture

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
In this paper, we present an optimization methodology for the template designs of sub-resolution contacts using directed self… 
2012
2012
Great impact of RFC technology on fast recovery diode towards 600 V for low loss and high dynamic ruggedness
In the fast recovery operation of Free-wheeling Diode (FWD), to reduce voltage surge “snap-off”, we propose the Relaxed Field of… 
2011
2011
Demonstration of defect free EUV mask for 22nm NAND flash contact layer using electron beam inspection system
Fabrication of defect free EUV masks including their inspection is the most critical challenge for implementing EUV lithography… 
Highly Cited
2010
Highly Cited
2010
Block copolymer multiple patterning integrated with conventional ArF lithography
We present block copolymer multiple patterning as an efficient and truly scalable nanolithography for sub-20 nm scale patterning… 
2010
2010
Advances in roll-to-roll imprint lithography for display applications
A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll… 
2008
2008
Soft Photocurable Nanoimprint Lithography for Compound Semiconductor Nanostructures
Soft photocurable nanoimprint lithography is used to transfer nanoscale features to GaAs substrates. Only ambient conditions… 
2002
2002
Fabrication of nanocontacts for molecular devices using nanoimprint lithography
We present a simple process to fabricate gold nanocontacts with a gap as small as sub-10 nm. This method uses a two-step process… 
Highly Cited
2000
Highly Cited
2000
Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm… 
2000
2000
Molecular alignment in submicron patterned polymer matrix using nanoimprint lithography
We report a promising approach to align molecules in a polymer film patterned by nanoimprint lithography. We found that molecules… 
1983
1983
High-voltage regulation and process considerations for high-density 5 V-only E/sup 2/PROM's
A high density 5-V-only HMOS 1 FLOTOX E/SUP 2/PROM technology has been developed using stepper lithography and dry etching… 
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