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Computational lithography
Known as:
Computational scaling
Computational lithography (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the…
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Related topics
Related topics
7 relations
CMOS
Integrated circuit
Jones calculus
Numerical aperture
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Three-dimensional nanoimprint lithography using two-photon lithography master samples
R. Saive
,
Colton R. Bukowsky
,
H. Atwater
2017
Corpus ID: 119098865
We demonstrate three-dimensional (3-D) nanoimprint lithography using master samples initially structured by two-photon…
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2012
2012
Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography
L. Wan
,
R. Ruiz
,
+7 authors
T. Albrecht
2012
Corpus ID: 123722394
Abstract. A block copolymer-directed self-assembly was combined with nanoimprint lithography to generate templates with…
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2011
2011
Demonstration of defect free EUV mask for 22nm NAND flash contact layer using electron beam inspection system
T. Shimomura
,
S. Kawashima
,
+10 authors
J. Jau
Advanced Lithography
2011
Corpus ID: 119730657
Fabrication of defect free EUV masks including their inspection is the most critical challenge for implementing EUV lithography…
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2010
2010
Advances in roll-to-roll imprint lithography for display applications
A. Jeans
,
M. Almanza‐Workman
,
+19 authors
D. Stieler
Advanced Lithography
2010
Corpus ID: 108823428
A solution to the problems of roll-to-roll lithography on flexible substrates is presented. We have developed a roll-toroll…
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2008
2008
Soft Photocurable Nanoimprint Lithography for Compound Semiconductor Nanostructures
K. Meneou
,
K. Cheng
2008
Corpus ID: 94144318
Soft photocurable nanoimprint lithography is used to transfer nanoscale features to GaAs substrates. Only ambient conditions…
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2006
2006
First results for hyper NA scanner emulation from AIMS 45-193i
A. Zibold
,
U. Strößner
,
+4 authors
A. Williams
Photomask Japan
2006
Corpus ID: 64354753
Immersion lithography offers the semiconductor industry the opportunity to extend current ArF processes before switching to…
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Highly Cited
2000
Highly Cited
2000
Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
Mingtao Li
,
J. Wang
,
L. Zhuang
,
S. Chou
2000
Corpus ID: 122623227
We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm…
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2000
2000
Molecular alignment in submicron patterned polymer matrix using nanoimprint lithography
J. Wang
,
Xiaoyun Sun
,
Lei Chen
,
Zhuang Lei
,
S. Chou
2000
Corpus ID: 6067814
We report a promising approach to align molecules in a polymer film patterned by nanoimprint lithography. We found that molecules…
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2000
2000
Feasibility study of an embedded transparent phase-shifting mask in ArF lithography
T. Matsuo
,
T. Ogawa
,
H. Morimoto
Advanced Lithography
2000
Corpus ID: 111233281
We have proposed the combination of the new transparent phase-shifting mask with the off-axis illumination, and have carried out…
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1983
1983
High-voltage regulation and process considerations for high-density 5 V-only E/sup 2/PROM's
D. Oto
,
V. Dham
,
+6 authors
S. Nieh
IEEE Journal of Solid-State Circuits
1983
Corpus ID: 21154611
A high density 5-V-only HMOS 1 FLOTOX E/SUP 2/PROM technology has been developed using stepper lithography and dry etching…
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