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- Publications
- Influence
Development of ballistics identification?from image comparison to topography measurement in surface metrology
TLDR
Selecting Valid Correlation Areas for Automated Bullet Identification System Based on Striation Detection
- Wei Chu, John Song, T. Vorburger, R. Thompson, R. Silver
- Computer Science, Medicine
- Journal of research of the National Institute of…
- 1 May 2011
TLDR
The National Ballistics Imaging Comparison (NBIC) project.
- J. Song, T. Vorburger, +6 authors M. Ols
- Engineering, Medicine
- Forensic science international
- 10 March 2012
In response to the guidelines issued by the American Society of Crime Laboratory Directors/Laboratory Accreditation Board (ASCLD/LAB-International) to establish traceability and quality assurance in… Expand
Metrology, Inspection, and Process Control for Microlithography XVIII
- R. Silver
- Materials Science, Engineering
- 1 May 2005
- 11
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Electron probe microanalysis of silicon and the role of the macrophage in proximal (capsule) and distant sites in augmentation mammaplasty patients.
- W. Greene, D. S. Raso, L. G. Walsh, R. Harley, R. Silver
- Medicine
- Plastic and reconstructive surgery
- 1 March 1995
Electron probe x-ray microanalysis was used to locate silicon (Si) within macrophages from 12 women who had previously undergone polymer prosthesis augmentation or reconstruction. Silicon was… Expand
Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis.
We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing through-focus… Expand
Developing an uncertainty analysis for optical scatterometry
- T. Germer, H. Patrick, R. Silver, B. Bunday
- Physics, Engineering
- Advanced Lithography
- 13 March 2009
This article describes how an uncertainty analysis may be performed on a scatterometry measurement. A method is outlined for propagating uncertainties through a least-squares regression. The method… Expand
Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach.
- N. F. Zhang, R. Silver, H. Zhou, B. Barnes
- Computer Science, Medicine
- Applied optics
- 1 September 2012
TLDR
Linewidth measurement technique using through-focus optical images.
We present a detailed experimental study of a new through-focus technique to measure critical dimension linewidth with nanometer sensitivity using a bright field optical microscope. This method… Expand
Köhler illumination for high-resolution optical metrology
- Y. Sohn, B. Barnes, L. Howard, R. Silver, R. Attota, M. Stocker
- Physics, Engineering
- SPIE Advanced Lithography
- 10 March 2006
Accurate preparation of illumination is critical for high-resolution optical metrology applications such as linewidth and overlay measurements. To improve the detailed evaluation and alignment of the… Expand
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