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Development of ballistics identification?from image comparison to topography measurement in surface metrology
A Two-dimensional and Three-dimensional Topography Measurement and Correlation System was developed at the National Institute of Standards and Technology for certification of Standard Reference Material 2460/2461 bullets and cartridge cases. Expand
Selecting Valid Correlation Areas for Automated Bullet Identification System Based on Striation Detection
- Wei Chu, John Song, T. Vorburger, R. Thompson, R. Silver
- Computer Science, Medicine
- Journal of research of the National Institute of…
- 1 May 2011
In this paper, an edge detection algorithm and selection process are used together to locate the edge points of all tool-mark features and filter out those not corresponding to striation marks. Expand
The National Ballistics Imaging Comparison (NBIC) project.
- J. Song, T. Vorburger, +6 authors M. Ols
- Engineering, Medicine
- Forensic science international
- 10 March 2012
In response to the guidelines issued by the American Society of Crime Laboratory Directors/Laboratory Accreditation Board (ASCLD/LAB-International) to establish traceability and quality assurance in… Expand
Metrology, Inspection, and Process Control for Microlithography XVIII
- R. Silver
- Materials Science, Engineering
- 1 May 2005
Electron probe microanalysis of silicon and the role of the macrophage in proximal (capsule) and distant sites in augmentation mammaplasty patients.
- W. Greene, D. S. Raso, L. G. Walsh, R. Harley, R. Silver
- Plastic and reconstructive surgery
- 1 March 1995
Electron probe x-ray microanalysis was used to locate silicon (Si) within macrophages from 12 women who had previously undergone polymer prosthesis augmentation or reconstruction. Silicon was… Expand
Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis.
We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional bright-field optical microscope, by analyzing through-focus… Expand
Developing an uncertainty analysis for optical scatterometry
This article describes how an uncertainty analysis may be performed on a scatterometry measurement. A method is outlined for propagating uncertainties through a least-squares regression. The method… Expand
Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach.
In this paper, a Bayesian statistical approach is proposed to allow the combination of different measurement techniques that are based on different physical measurements to reduce the uncertainties of the parameter estimators. Expand
Linewidth measurement technique using through-focus optical images.
We present a detailed experimental study of a new through-focus technique to measure critical dimension linewidth with nanometer sensitivity using a bright field optical microscope. This method… Expand
Köhler illumination for high-resolution optical metrology
- Y. Sohn, B. Barnes, L. Howard, R. Silver, R. Attota, M. Stocker
- Physics, Engineering
- SPIE Advanced Lithography
- 10 March 2006
Accurate preparation of illumination is critical for high-resolution optical metrology applications such as linewidth and overlay measurements. To improve the detailed evaluation and alignment of the… Expand