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Hydride vapour phase epitaxy

Known as: HVPE, Hybrid vapour phase epitaxy, Hydride vapor phase epitaxy 
Hydride vapour phase epitaxy (HVPE) is an epitaxial growth technique often employed to produce semiconductors such as GaN, GaAs, InP and their… 
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Papers overview

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2009
2009
This work proposes a method for fabricating 2 in. freestanding GaN substrates of high crystallographic quality and low residual… 
2006
2006
Growth of GaN under pressure from solution in gallium results in almost dislocation free plate-like crystals but with size… 
2006
2006
A heteroepitaxial PbZr1−xTixO3 (PZT) thin film was fabricated by means of hydrothermal epitaxy at 210 °C below Curie temperature… 
2004
2004
Orthorhombic KNbO3 thin films were deposited on SrTiO3 (100) and LiTaO3 (001) substrates by low-temperature hydrothermal epitaxy… 
2003
2003
Hydride vapor phase epitaxy (HVPE) was used to grow nominally undoped 30–160 μm thick GaN layers on both the Ga and N polar sides… 
2002
2002
Concentrations of deep hole traps were measured in a set of hydride vapor phase epitaxy grown samples with thicknesses varying… 
2002
2002
Metal-organic vapor phase epitaxy (MOVPE) and molecular beam epitaxy (MBE) are the principal techniques for the growth and n-type… 
1998
1998
Since we have found that an entire substrate can be chemically removed in less than 5 min and since GaN is impervious to chemical… 
1996
1996
We have achieved spatially resolved photoluminescence from GaN films using a near‐field scanning optical microscope (NSOM). GaN…