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Hydride vapour phase epitaxy

Known as: HVPE, Hybrid vapour phase epitaxy, Hydride vapor phase epitaxy 
Hydride vapour phase epitaxy (HVPE) is an epitaxial growth technique often employed to produce semiconductors such as GaN, GaAs, InP and their… 
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Papers overview

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2012
2012
This paper reports on a study to develop power supplies for small mobile robots performing long duration missions. It… 
2009
2009
This work proposes a method for fabricating 2 in. freestanding GaN substrates of high crystallographic quality and low residual… 
2006
2006
Growth of GaN under pressure from solution in gallium results in almost dislocation free plate-like crystals but with size… 
Highly Cited
2005
Highly Cited
2005
This work discusses photonic integration efforts toward developing an InP-based monolithically integrated photonic chip for… 
Highly Cited
2003
Highly Cited
2003
A prism coupling method was used to measure the ordinary (no) and extraordinary (ne) refractive indices of AlxGa1−xN films, grown… 
Review
2002
Review
2002
A review of surface structures of bare and adsorbate-covered GaN (0001) and (0001 ) surfaces is presented, including results for… 
Highly Cited
2000
Highly Cited
2000
We report on the growth and transport properties of high-mobility two-dimensional electron gases (2DEGs) confined at the AlGaN… 
Highly Cited
1999
Highly Cited
1999
We fabricated high standoff voltage (450 V) Schottky rectifiers on hydride vapor phase epitaxy grown GaN on sapphire substrate… 
1998
1998
Metallic uranium alloys are candidate materials for use as the fuel phase in very-high-density LEU dispersion fuels. These… 
Highly Cited
1989
Highly Cited
1989
To investigate the effect of growth area on interface dislocation density in strained‐layer epitaxy, we have fabricated 2‐μm‐high…