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GE-600 series
Known as:
600 series
, GE-645
, GE 635
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The GE-600 series was a family of 36-bit mainframe computers originating in the 1960s, built by General Electric (GE). When GE left the mainframe…
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28 relations
36-bit
Accumulator (computing)
BCPL
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Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
Photosensitivity of pulsed laser deposited Ge-Sb-Se thin films
M. Olivier
,
P. Němec
,
G. Boudebs
,
R. Boidin
,
C. Focsa
,
V. Nazabal
2015
Corpus ID: 59495039
Pulsed laser deposition was used to prepare amorphous thin films from (GeSe2)100-x (Sb2Se3)x system, where x is varying from 0 to…
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Highly Cited
2013
Highly Cited
2013
High-Mobility Ge p- and n-MOSFETs With 0.7-nm EOT Using $\hbox{HfO}_{2}/\hbox{Al}_{2}\hbox{O}_{3}/\hbox{GeO}_{x}/\hbox{Ge}$ Gate Stacks Fabricated by Plasma Postoxidation
Rui Zhang
,
Po-Chin Huang
,
Ju-Chin Lin
,
N. Taoka
,
M. Takenaka
,
S. Takagi
IEEE Transactions on Electron Devices
2013
Corpus ID: 41566358
An ultrathin equivalent oxide thickness (EOT) HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>/Ge gate stack has been fabricated by…
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Highly Cited
2010
Highly Cited
2010
Ge MOSFETs performance: Impact of Ge interface passivation
C. Lee
,
T. Nishimura
,
+4 authors
A. Toriumi
International Electron Devices Meeting
2010
Corpus ID: 22412811
We have systematically investigated Ge interface passivation methods, and the highest electron (1920 cm2/Vs) and hole mobility…
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Highly Cited
2008
Highly Cited
2008
Tomographic analysis of dilute impurities in semiconductor nanostructures
D. Perea
,
E. Wijaya
,
J. Lensch-Falk
,
E. Hemesath
,
L. Lauhon
2008
Corpus ID: 56333533
Highly Cited
2007
Highly Cited
2007
P-Channel Germanium FinFET Based on Rapid Melt Growth
Jia Feng
,
R. Woo
,
Shulu Chen
,
Yaocheng Liu
,
P. Griffin
,
J. Plummer
IEEE Electron Device Letters
2007
Corpus ID: 36826452
High-performance P-channel Ge FinFETs have been fabricated based on the rapid-melt-growth method. The fully depleted Ge FinFET…
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Highly Cited
2006
Highly Cited
2006
Ge n-MOSFETs on lightly doped substrates with high-/spl kappa/ dielectric and TaN gate
W. Bai
,
N. Lu
,
A. Ritenour
,
M. Lee
,
D. Antoniadis
,
D. Kwong
IEEE Electron Device Letters
2006
Corpus ID: 38602864
In this letter, we report successful fabrication of germanium n-MOSFETs on lightly doped Ge substrates with a thin HfO/sub 2…
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Highly Cited
2002
Highly Cited
2002
High mobility p-channel germanium MOSFETs with a thin Ge oxynitride gate dielectric
H. Shang
,
H. Okorn-Schmidt
,
+8 authors
W. Haensch
Digest. International Electron Devices Meeting,
2002
Corpus ID: 26971170
We report Ge p-channel MOSFETs with a thin gate stack of Ge oxynitride and LTO on bulk Ge substrate without a Si cap layer…
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Highly Cited
2000
Highly Cited
2000
Germanium Nanowire Growth via Simple Vapor Transport
Yiying Wu
,
P. Yang
2000
Corpus ID: 94950961
Germanium nanowires are synthesized in bulk quantities and high purity using a simple vapor transport process. X-ray diffraction…
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Highly Cited
2000
Highly Cited
2000
Regimented placement of self-assembled Ge dots on selectively grown Si mesas
G. Jin
,
Jianlin Liu
,
Kang L. Wang
2000
Corpus ID: 41174731
The control of positioning of self-assembled dots is critical for the fabrication of regimented arrays in signal processing…
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Highly Cited
1993
Highly Cited
1993
Laser-trimmed four-port bandpass filter fabricated in single-mode photosensitive Ge-doped planar waveguide
R. Kashyap
,
Graeme Maxwell
,
B. Ainslie
IEEE Photonics Technology Letters
1993
Corpus ID: 37484857
A single-mode photosensitive waveguide Mach-Zehnder interferometer fabricated in Ge-doped planar silica is reported. Two…
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