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EEPROM
Known as:
EEPROM memory chip
, Electrically alterable read-only memory
, E²PROM
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EEPROM (also written E2PROM and pronounced "e-e-prom", "double-e-prom" or "e-squared-prom") stands for electrically erasable programmable read-only…
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49 relations
AVR Butterfly
Advanced Communications Riser
Answer to reset
Ant Attack
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Broader (1)
Non-volatile memory
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2003
2003
A complete model of E2PROM memory cells for circuit simulations
P. Pavan
,
L. Larcher
,
M. Cuozzo
,
P. Zuliani
,
A. Conte
IEEE Trans. Comput. Aided Des. Integr. Circuits…
2003
Corpus ID: 8711709
E/sup 2/PROM memory devices are widely used in embedded applications. For an efficient design flow, a correct modeling of these…
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1998
1998
Faster learning of control parameters through sharing experiences of autonomous mobile robots
I. Kelly
,
D. Keating
International Journal of Systems Science
1998
Corpus ID: 1088130
This paper describes a learning algorithm for small autonomous mobile robots based on sets of fuzzy automata. The task of the…
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1993
1993
Sweep Strategies for a Sensory-driven, Behavior-based Vacuum Cleaning Agent
K. Doty
,
R. Harrison
1993
Corpus ID: 5524323
In the Machine Intelligence Laboratory, University of Florida, we have built a small autonomous robot and programmed it to…
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Highly Cited
1991
Highly Cited
1991
Novel N/sub 2/O-oxynitridation technology for forming highly reliable EEPROM tunnel oxide films
H. Fukuda
,
M. Yasuda
,
T. Iwabuchi
,
S. Ohno
IEEE Electron Device Letters
1991
Corpus ID: 33807719
Ultrathin ( approximately=6 nm) oxynitrided SiO/sub 2/ (SiO/sub x/N/sub y/) films have been formed on Si
1991
1991
Measurement of Ultrathin (<100 Å) Oxide Films by Multiple‐Angle Incident Ellipsometry
T. Chao
,
Chung-Len Lee
,
T. Lei
1991
Corpus ID: 93957758
The application of the multiple-angle incident ellipsometry to measure the ultrathin (< 100 A) oxide has been studied in this…
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1987
1987
Reliability Comparison of Flotox and Textured-Polysilicon E2PROMs
N. Mielke
,
A. Fazio
,
H. Liou
IEEE International Reliability Physics Symposium
1987
Corpus ID: 23971665
The leading E2PROM technologies are FLOTOX and textured polysilicon. Both store data as charge on a floating gate, and both use…
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Review
1986
Review
1986
Comparison and trends in today's dominant E2technologies
S. Lai
,
V. Dham
,
D. Guterman
International Electron Devices Meeting
1986
Corpus ID: 22882480
This paper reviews the three dominant E2technologies today, namely the two floating gate approaches of thin tunnel oxide and…
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1985
1985
Studies of thin poly Si oxides for E and E2PROM
T. Ono
,
T. Mori
,
T. Ajioka
,
T. Takayashiki
International Electron Devices Meeting
1985
Corpus ID: 33100661
Electrical conductivity of thin poly Si oxides, 400-600A thick, has been investigated. Using an annealing prior to the oxidation…
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Highly Cited
1983
Highly Cited
1983
A low-voltage alterable EEPROM with metal—oxide-nitride—oxide—semiconductor (MONOS) structures
E. Suzuki
,
H. Hiraishi
,
K. Ishii
,
Y. Hayashi
IEEE Transactions on Electron Devices
1983
Corpus ID: 31589165
Theoretical and experimental investigations to obtain lower voltage electrically erasable and programmable ROM's (EEPROM's) than…
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1981
1981
Reliability Aspects of a Floating Gate E2 PROM
B. Euzent
,
N. Boruta
,
Jimmy Lee
,
C. Jenq
IEEE International Reliability Physics Symposium
1981
Corpus ID: 41116025
This paper has discussed a number of E2PROM failure mechanisms for both erase/write cycling and data retention. It has been shown…
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