Skip to search formSkip to main contentSkip to account menu

Advanced silicon etching

Known as: ASE, Advanced Silicon Etch 
Advanced silicon etching (ASE) is a deep reactive ion etching (DRIE) technique to rapidly etch deep and high aspect ratio structures in silicon.ASE… 
Wikipedia (opens in a new tab)

Related topics

Related topics

3 relations

Broader (2)

Etching (microfabrication)Semiconductor device fabrication
Microelectromechanical systems

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Effects of Alkaline Pre-Etching to Metal Hydride Alloys
The responses of one AB5, two AB2, four A2B7, and one C14-related body-centered-cubic (BCC) metal hydrides to an alkaline-etch… 
2013
2013
Model-based stitching and inter-mask bridge prevention for double patterning lithography
As EUV Lithography is not ready yet for sub-20nm node manufacturing, ArF immersion lithography must extend its capability. Among… 
2012
2012
EDA Solutions for Double Patterning Lithography
Expanding the optical lithography to 32-nm node and beyond is impossible using existing single exposure systems. As such, double… 
2011
2011
Efecto de la aplicación de diferentes ácidos fluorhídricos en la resistencia adhesiva sobre una cerámica feldespática
resumen Dental ceramic materials are giving aesthetic restorations and biocompatible. Nowdays there are various pre-conditioning… 
2011
2011
Effect of different hydrofluoric acid in the bond strength of a feldspathic ceramic
resumen Dental ceramic materials are giving aesthetic restorations and biocompatible. Nowdays there are various pre-conditioning… 
2008
2008
Scanning force microscope induced growth and dissolution on single crystal gypsum ( CaHSO 4 . 2 H 2 O
2004
2004
Advanced silicon etching techniques based on deep reactive ion etching (DRIE) for silicon harms and 3D micro- and nano-structures
Different processes involving an Inductively Coupled Plasma reactor are presented either for Deep Reactive Ion Etching or for… 
1966
1966
Orientation Dependence of a Dislocation Etch for Zinc
The dislocation etch for (101-[bar]0] surfaces of zinc reported by Brandt, Adams, and Vreeland have been further explored… 
1964
1964
An evaluation of etchants and techniques used to produce dislocation etch pits on sodium chloride
1964
1964
THE OCTAHEDRAL ETCH PITS IN NICKEL-IRON ALLOYS
By clicking accept or continuing to use the site, you agree to the terms outlined in our Privacy Policy (opens in a new tab), Terms of Service (opens in a new tab), and Dataset License (opens in a new tab)