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Advanced silicon etching

Known as: ASE, Advanced Silicon Etch 
Advanced silicon etching (ASE) is a deep reactive ion etching (DRIE) technique to rapidly etch deep and high aspect ratio structures in silicon.ASE… 
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Related topics

Related topics

3 relations

Broader (2)

Etching (microfabrication)Semiconductor device fabrication
Microelectromechanical systems

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Effects of Alkaline Pre-Etching to Metal Hydride Alloys
The responses of one AB5, two AB2, four A2B7, and one C14-related body-centered-cubic (BCC) metal hydrides to an alkaline-etch… 
2015
2015
System-Level Variation Analysis for Interconnection Networks at Sub-10-nm Technology Nodes Using Multiple Patterning Techniques
This paper analyzes the impact of the interconnect variation at the system level in terms of clock frequency based on a fast and… 
2014
2014
Impact of reticle writing errors on the on-product overlay performance
The on-product overlay specification and Advanced Process Control (APC) are getting extremely challenging particularly after the… 
2011
2011
Double patterning from design enablement to verification
Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers… 
2010
2010
Litho-process-litho for 2D 32nm hp Logic and DRAM double patterning
Over the last couple of years a lot of attention has gone to the development of new Litho-Process-Litho-Etch (LPLE) double… 
2010
2010
A Ring-Shaped Photodiode Designed for Use in a Reflectance Pulse Oximetry Sensor in Wireless Health Monitoring Applications
We report a photodiode for use in a reflectance pulse oximeter for use in autonomous and low-power homecare applications. The… 
2006
2006
A Novel Self-Aligned Etch-Stopper Structure With Lower Photo Leakage for AMLCD and Sensor Applications
In this letter, the authors introduce a novel self-aligned etch-stopper sidewall-contact hydrogenated amorphous silicon (a-Si : H… 
2004
2004
Advanced silicon etching techniques based on deep reactive ion etching (DRIE) for silicon harms and 3D micro- and nano-structures
Different processes involving an Inductively Coupled Plasma reactor are presented either for Deep Reactive Ion Etching or for… 
1994
1994
Developing consistency in enamel etching by CO2 laser
This research was designed to ascertain which CO2 laser exposure parameters result in consistent etching of enamel. Fourteen non… 
1988
1988
A Mathematical Model for a Parallel Plate Plasma Etching Reactor
A mathematical model was formulated for predicting species concentration profiles and etch rate distribution in a parallel plate… 
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