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Advanced silicon etching

Known as: ASE, Advanced Silicon Etch 
Advanced silicon etching (ASE) is a deep reactive ion etching (DRIE) technique to rapidly etch deep and high aspect ratio structures in silicon.ASE… 
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Related topics

Related topics

3 relations

Broader (2)

Etching (microfabrication)Semiconductor device fabrication
Microelectromechanical systems

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2016
2016
Etch challenges and evolutions for atomic-order control
We introduce a state-of-the-art self-aligned contact (SAC) process and patterning process developed by new patterning technology… 
2015
2015
System-Level Variation Analysis for Interconnection Networks at Sub-10-nm Technology Nodes Using Multiple Patterning Techniques
This paper analyzes the impact of the interconnect variation at the system level in terms of clock frequency based on a fast and… 
Highly Cited
2011
Highly Cited
2011
Flexible 2D layout decomposition framework for spacer-type double pattering lithography
A spacer-type self-aligned double pattering (SADP) is a pitch-splitting sidewall image method that is a major option for sub-30nm… 
2009
2009
Double patterning lithography: double the trouble or double the fun?
Delays in readiness of next generation lithography (NGL) suggest the use of existing methods to enable the production of key… 
Highly Cited
2007
Highly Cited
2007
A Comparison of Nanometer-Scale Growth and Dissolution Features on Natural and Synthetic Dolomite Crystals: Implications for the Origin of Dolomite
Abstract This paper describes experiments in which mechanisms of crystal growth are inferred from the surface nanotopography of… 
2006
2006
A Novel Self-Aligned Etch-Stopper Structure With Lower Photo Leakage for AMLCD and Sensor Applications
In this letter, the authors introduce a novel self-aligned etch-stopper sidewall-contact hydrogenated amorphous silicon (a-Si : H… 
Highly Cited
2003
Highly Cited
2003
Sidewall roughness control in advanced silicon etch process
In ICP-RIE process, there have been many investigations on etching rate. However, only few published reports mentioned the… 
1998
1998
Advanced silicon trench etching in MEMS applications
A high performance silicon dry etch process (STS Advanced Silicon Etch ASE) which in many cases is a beneficial replacement for… 
1994
1994
Developing consistency in enamel etching by CO2 laser
This research was designed to ascertain which CO2 laser exposure parameters result in consistent etching of enamel. Fourteen non… 
1989
1989
Effect of Transport and Reaction on the Shape Evolution of Cavities during Wet Chemical Etching
The effect of fluid flow, transport, and reaction on the shape evolution of two‐dimensional cavities during wet chemical etching… 
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