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Advanced silicon etching

Known as: ASE, Advanced Silicon Etch 
Advanced silicon etching (ASE) is a deep reactive ion etching (DRIE) technique to rapidly etch deep and high aspect ratio structures in silicon.ASE… 
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Papers overview

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2013
2013
As EUV Lithography is not ready yet for sub-20nm node manufacturing, ArF immersion lithography must extend its capability. Among… 
2012
2012
Expanding the optical lithography to 32-nm node and beyond is impossible using existing single exposure systems. As such, double… 
2012
2012
The local metallization layers of logic products are historically the densest layouts to lithographically pattern and are key… 
2011
2011
resumen Dental ceramic materials are giving aesthetic restorations and biocompatible. Nowdays there are various pre-conditioning… 
1970
1970
Two small holes (0.0292 in.), appropriately drilled near the root of a Charpy V-notch, have been shown to reduce markedly the… 
1966
1966
The dislocation etch for (101-[bar]0] surfaces of zinc reported by Brandt, Adams, and Vreeland have been further explored…