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Advanced silicon etching
Known as:
ASE
, Advanced Silicon Etch
Advanced silicon etching (ASE) is a deep reactive ion etching (DRIE) technique to rapidly etch deep and high aspect ratio structures in silicon.ASE…
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Related topics
Related topics
3 relations
Broader (2)
Etching (microfabrication)
Semiconductor device fabrication
Microelectromechanical systems
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Effects of Alkaline Pre-Etching to Metal Hydride Alloys
T. Meng
,
K. Young
,
Chaolan Hu
,
B. Reichman
2017
Corpus ID: 4993123
The responses of one AB5, two AB2, four A2B7, and one C14-related body-centered-cubic (BCC) metal hydrides to an alkaline-etch…
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2015
2015
System-Level Variation Analysis for Interconnection Networks at Sub-10-nm Technology Nodes Using Multiple Patterning Techniques
C. Pan
,
R. Baert
,
I. Ciofi
,
Z. Tokei
,
A. Naeemi
IEEE Transactions on Electron Devices
2015
Corpus ID: 21993808
This paper analyzes the impact of the interconnect variation at the system level in terms of clock frequency based on a fast and…
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2014
2014
Impact of reticle writing errors on the on-product overlay performance
Richard J. F. van Haren
,
H. E. Cekli
,
+6 authors
F. Sundermann
Photomask Technology
2014
Corpus ID: 110329881
The on-product overlay specification and Advanced Process Control (APC) are getting extremely challenging particularly after the…
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2011
2011
Double patterning from design enablement to verification
David Abercrombie
,
P. Lacour
,
+6 authors
Pradiptya Ghosh
Photomask Technology
2011
Corpus ID: 108901494
Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers…
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2010
2010
Litho-process-litho for 2D 32nm hp Logic and DRAM double patterning
P. Wong
,
V. Wiaux
,
S. Verhaegen
,
N. Vandenbroeck
Advanced Lithography
2010
Corpus ID: 122089146
Over the last couple of years a lot of attention has gone to the development of new Litho-Process-Litho-Etch (LPLE) double…
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2010
2010
A Ring-Shaped Photodiode Designed for Use in a Reflectance Pulse Oximetry Sensor in Wireless Health Monitoring Applications
S. Duun
,
R. G. Haahr
,
K. Birkelund
,
E. Thomsen
IEEE Sensors Journal
2010
Corpus ID: 39988629
We report a photodiode for use in a reflectance pulse oximeter for use in autonomous and low-power homecare applications. The…
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2006
2006
A Novel Self-Aligned Etch-Stopper Structure With Lower Photo Leakage for AMLCD and Sensor Applications
C. Liang
,
F. Gan
,
Po-Tsun Liu
,
F. Yeh
,
S.H.-L. Chen
,
T. Chang
IEEE Electron Device Letters
2006
Corpus ID: 32088788
In this letter, the authors introduce a novel self-aligned etch-stopper sidewall-contact hydrogenated amorphous silicon (a-Si : H…
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2004
2004
Advanced silicon etching techniques based on deep reactive ion etching (DRIE) for silicon harms and 3D micro- and nano-structures
F. Marty
,
L. Rousseau
,
+4 authors
T. Bouroutina
2004
Corpus ID: 138204695
Different processes involving an Inductively Coupled Plasma reactor are presented either for Deep Reactive Ion Etching or for…
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1994
1994
Developing consistency in enamel etching by CO2 laser
Cesar D. Gonzalez
,
K. Zakariasen
Photonics West - Lasers and Applications in…
1994
Corpus ID: 67779081
This research was designed to ascertain which CO2 laser exposure parameters result in consistent etching of enamel. Fourteen non…
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1988
1988
A Mathematical Model for a Parallel Plate Plasma Etching Reactor
D. J. Economou
,
R. Alkire
1988
Corpus ID: 98332312
A mathematical model was formulated for predicting species concentration profiles and etch rate distribution in a parallel plate…
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