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Advanced silicon etching

Known as: ASE, Advanced Silicon Etch 
Advanced silicon etching (ASE) is a deep reactive ion etching (DRIE) technique to rapidly etch deep and high aspect ratio structures in silicon.ASE… 
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Papers overview

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2017
2017
The responses of one AB5, two AB2, four A2B7, and one C14-related body-centered-cubic (BCC) metal hydrides to an alkaline-etch… 
2015
2015
This paper analyzes the impact of the interconnect variation at the system level in terms of clock frequency based on a fast and… 
2014
2014
The on-product overlay specification and Advanced Process Control (APC) are getting extremely challenging particularly after the… 
2011
2011
Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers… 
2010
2010
Over the last couple of years a lot of attention has gone to the development of new Litho-Process-Litho-Etch (LPLE) double… 
2010
2010
We report a photodiode for use in a reflectance pulse oximeter for use in autonomous and low-power homecare applications. The… 
2006
2006
In this letter, the authors introduce a novel self-aligned etch-stopper sidewall-contact hydrogenated amorphous silicon (a-Si : H… 
2004
2004
Different processes involving an Inductively Coupled Plasma reactor are presented either for Deep Reactive Ion Etching or for… 
1994
1994
This research was designed to ascertain which CO2 laser exposure parameters result in consistent etching of enamel. Fourteen non… 
1988
1988
A mathematical model was formulated for predicting species concentration profiles and etch rate distribution in a parallel plate…