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Spectral flatness

Known as: Wiener entropy 
Spectral flatness or tonality coefficient, also known as Wiener entropy, is a measure used in digital signal processing to characterize an audio… 
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Related topics

Related topics

7 relations
Acoustic fingerprintDecibelMPEG-7Pitch (music)

Broader (1)

Digital signal processing

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Memo No . 067 June 27 , 2017 Theory of Deep Learning III : Generalization Properties of SGD
In Theory III we characterize with a mix of theory and experiments the consistency and generalization properties of deep… 
2015
2015
A 0.7-MHz–10-MHz ${\rm CT}+{\rm DT}$ Hybrid Baseband Chain With Improved Passband Flatness for LTE Application
A hybrid baseband chain for Long-Term Evolution (LTE) was implemented in a TSMC 65-nm CMOS process. It has an active area of 0.75… 
2013
2013
Vibrations in Steel Strips: Effects on Flatness Measurement and Filtering
Vibrations are periodic or random motion from an equilibrium position. In the steel industry, vibrations are an undesirable… 
2010
2010
Steganalysis of Compressed Speech Based on Histogram Features
A steganalysis method for analysis-by-synthesis compressed speech based on the histogram features of the pulse position parameter… 
2008
2008
Alias-Free Subband Adaptive Filtering With Critical Sampling
To overcome the limitations of a conventional fullband adaptive filtering, various subband adaptive filtering (SAF) structures… 
2006
2006
EUV mask and chuck analysis: simulation and experimentation
Extreme ultraviolet (EUV) masks and mask chucks require extreme flatness in order to meet the performance and timing specified by… 
2006
2006
Interferometric measurement of workpiece flatness in ultra‐precision flycutting
Purpose – The purpose of this paper is to show how an ultra‐precision manufacturing process (flycutting) can be improved through… 
2005
2005
The effect of mask substrate and mask process steps on patterned photomask flatness
Photomask substrate, blank, and finished mask flatness are becoming more serious concerns for photomask fabrication. Most… 
2002
2002
Large aperture, high-efficiency multilayer dielectric reflection gratings
We have designed and fabricated a 355 /spl times/ 150 mm multilayer dielectric diffraction grating, 1800 l/mm for 1030 nm light… 
Review
2002
Review
2002
High Precision Photomask Polishing with Magneto-Rheological Finishing ( MRF )
The December 2001 edition of the International Technology Roadmap for Semiconductors (ITRS) makes it abundantly clear that… 
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