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Resolution enhancement technologies

Known as: Resolution enhancement techniques 
Resolution enhancement technologies are methods used to modify photomasks for integrated circuits (ICs) to compensate for limitations in the… 
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Related topics

Related topics

6 relations
Computational lithographyElectronic design automationIntegrated circuit layoutMask data preparation

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2012
2012
Video resolution enhancement by using discrete and stationary wavelet transforms with illumination compensation
This paper proposes a new video resolution enhancement technique, in which a state-of-the-art illumination compensation procedure… 
2009
2009
Model based mask process correction and verification for advanced process nodes
The extension of optical lithography at 193nm wavelength to the 32nm node and beyond drives advanced resolution enhancement… 
Review
2009
Review
2009
Integration of one-dimensional nanostructures with microsystems: an overview
The current state of solutions provided for the issue of integration between micro- and nanoscales is reviewed for the specific… 
2008
2008
Printer resolution measurement based on slanted edge method
Printer resolution is an important attribute for determining print quality, and it has been frequently referred to hardware… 
2008
2008
Inverse image problem of designing phase shifting masks in optical lithography
The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in… 
2005
2005
Modeling OPC complexity for design for manufacturability
Increasing design complexity in sub-90nm designs results in increased mask complexity and cost. Resolution enhancement techniques… 
2001
2001
Adoption of OPC and the impact on design and layout
With the adoption of various combinations of resolution enhancement techniques (RET) for IC lithography, different process… 
2001
2001
Impact of illumination coherence and polarization on the imaging of attenuated phase-shift masks
Attenuated phase shift masks (PSM) have been widely used in photolithography to enhance resolution and process margin. The… 
1996
1996
Characterization and optimization of CD control for 0.25-um CMOS applications
Optical lithography, since many years the workhorse in manufacturing of integrated circuits, is being pushed to its limits. The… 
1994
1994
Application of the aerial image measurement system (AIMS)TM to the analysis of binary mask imaging and resolution enhancement techniques
The newly developed Aerial Image Measurement System (AIMSTM*) was used to quantify the lithographic benefits of several… 
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