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Resolution enhancement technologies
Known as:
Resolution enhancement techniques
Resolution enhancement technologies are methods used to modify photomasks for integrated circuits (ICs) to compensate for limitations in the…
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Related topics
Related topics
6 relations
Computational lithography
Electronic design automation
Integrated circuit layout
Mask data preparation
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Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2012
2012
Video resolution enhancement by using discrete and stationary wavelet transforms with illumination compensation
G. Anbarjafari
,
S. Izadpanahi
,
H. Demirel
Signal, Image and Video Processing
2012
Corpus ID: 20910100
This paper proposes a new video resolution enhancement technique, in which a state-of-the-art illumination compensation procedure…
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2009
2009
Model based mask process correction and verification for advanced process nodes
Timothy Lin
,
Tom Donnelly
,
S. Schulze
Advanced Lithography
2009
Corpus ID: 35831914
The extension of optical lithography at 193nm wavelength to the 32nm node and beyond drives advanced resolution enhancement…
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Review
2009
Review
2009
Integration of one-dimensional nanostructures with microsystems: an overview
B. Erdem Alaca
2009
Corpus ID: 53125397
The current state of solutions provided for the issue of integration between micro- and nanoscales is reviewed for the specific…
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2008
2008
Printer resolution measurement based on slanted edge method
Yousun Bang
,
Sang Ho Kim
,
Don-Chul Choi
Electronic imaging
2008
Corpus ID: 62695992
Printer resolution is an important attribute for determining print quality, and it has been frequently referred to hardware…
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2008
2008
Inverse image problem of designing phase shifting masks in optical lithography
Stanley H. Chan
,
E. Lam
15th IEEE International Conference on Image…
2008
Corpus ID: 559635
The continual shrinkage of minimum feature size in integrated circuit (IC) fabrication incurs more and more serious distortion in…
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2005
2005
Modeling OPC complexity for design for manufacturability
Puneet Gupta
,
A. Kahng
,
S. Muddu
,
S. Nakagawa
,
Chul-Hong Park
SPIE Photomask Technology
2005
Corpus ID: 15487910
Increasing design complexity in sub-90nm designs results in increased mask complexity and cost. Resolution enhancement techniques…
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2001
2001
Adoption of OPC and the impact on design and layout
F. Schellenberg
,
L. Capodieci
,
B. Socha
Proceedings - Design Automation Conference
2001
Corpus ID: 12165492
With the adoption of various combinations of resolution enhancement techniques (RET) for IC lithography, different process…
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2001
2001
Impact of illumination coherence and polarization on the imaging of attenuated phase-shift masks
Z. M. Ma
,
C. Mack
SPIE Advanced Lithography
2001
Corpus ID: 56400547
Attenuated phase shift masks (PSM) have been widely used in photolithography to enhance resolution and process margin. The…
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1996
1996
Characterization and optimization of CD control for 0.25-um CMOS applications
K. Ronse
,
M. Op de Beeck
,
A. Yen
,
Keeho Kim
,
L. Van den hove
Advanced Lithography
1996
Corpus ID: 109976111
Optical lithography, since many years the workhorse in manufacturing of integrated circuits, is being pushed to its limits. The…
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1994
1994
Application of the aerial image measurement system (AIMS)TM to the analysis of binary mask imaging and resolution enhancement techniques
R. Martino
,
R. Ferguson
,
+5 authors
J. Weed
Advanced Lithography
1994
Corpus ID: 128545293
The newly developed Aerial Image Measurement System (AIMSTM*) was used to quantify the lithographic benefits of several…
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