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Overlay Control

Known as: Overlay 
Overlay control is a term used in silicon wafer manufacturing. Silicon wafers are currently manufactured in a sequence of steps, each stage placing a… 
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Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2013
2013
One of the main challenges related to the growing number of Litho layers and most specifically to Multi Patterning, is the… 
2011
2011
At present, the maturity of the peer-to-peer (P2P) research field has pushed through new problems such as those related with… 
2010
2010
Diffraction based overlay (DBO) technologies have been developed to address the tighter overlay control challenges as the… 
Review
2008
Review
2008
  • M. Adel
  • Lithography Asia
  • 2008
  • Corpus ID: 109012158
It could be argued that the biggest challenge of the 32 nm half pitch node is the production implementation of double patterning… 
2008
2008
The extension of optical lithography to 32nm and beyond is dependent on double-patterning (DP) at critical levels. DP integration… 
2007
2007
As Moore's Law drives CD smaller and smaller, overlay budget is shrinking rapidly. Furthermore, the cost of advanced lithography… 
Review
2004
Review
2004
  • C. Mack
  • SPIE Advanced Lithography
  • 2004
  • Corpus ID: 35896906
The end of optical lithography has been so often predicted (incorrectly) that such predictions are now a running joke among… 
2003
2003
With each new technology node, there is as usual a corresponding tightening of the overlay requirements. To achieve these… 
Highly Cited
2002
Highly Cited
2002
Abstract In the manufacture of semiconductor products, overlay is one of the most critical design specifications. Overlay is the…