Overlay Control

Overlay control is a term used in silicon wafer manufacturing. Silicon wafers are currently manufactured in a sequence of steps, each stage placing a… (More)
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Topic mentions per year

1999-2016
0519992016

Papers overview

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2015
2015
In advanced lithography, controlling the overlay budget is one of the most critical requirements. For device nodes at 10nm and… (More)
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2014
2014
As semiconductor manufacturing reaching nanotechnology, to obtain high resolution and alignment accuracy via minimizing overlay… (More)
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2014
2014
Self-aligned double patterning (SADP) is one of the most promising techniques for sub-20nm technology. Spacer-is-dielectric SADP… (More)
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2011
2011
We propose shift-trim double-patterning lithography (ST-DPL), a cost-effective double-patterning technique for achieving pitch… (More)
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2010
2010
In double patterning lithography (DPL), overlay errors between two patterning steps of the same layer translate into CD… (More)
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2009
2009
In double patterning lithography (DPL), overlay error between two patterning steps at the same layer translates into CD… (More)
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2009
2009
To bridge the gap between the current practice of setting up expensive, dedicated, lightpath connections (i.e., static topologies… (More)
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2009
2009
We propose a novel wavelength-division-multiplexed passive optical network which supports simultaneous delivery of 10-Gb/s point… (More)
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2005
2005
This paper presents a new run-to-run control scheme to reduce overlay misalignment errors in steppers and demonstrates the… (More)
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2002
2002
Advanced Micro Devices Exxon-Mobil Department of Chemical Engineering Austin, TX 78741 Baton Rouge, LA 70806 University of Texas… (More)
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