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Overlay Control

Known as: Overlay 
Overlay control is a term used in silicon wafer manufacturing. Silicon wafers are currently manufactured in a sequence of steps, each stage placing a… Expand
Wikipedia

Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2014
2014
As semiconductor manufacturing reaching nanotechnology, to obtain high resolution and alignment accuracy via minimizing overlay… Expand
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2013
2013
One of the main challenges related to the growing number of Litho layers and most specifically to Multi Patterning, is the… Expand
Highly Cited
2011
Highly Cited
2011
In semiconductor manufacturing processes, run-to-run (R2R) control is used to improve productivity by adjusting process inputs… Expand
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2011
2011
At present, the maturity of the peer-to-peer (P2P) research field has pushed through new problems such as those related with… Expand
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2008
2008
The extension of optical lithography to 32nm and beyond is dependent on double-patterning (DP) at critical levels. DP integration… Expand
Review
2008
Review
2008
  • M. Adel
  • Lithography Asia
  • 2008
  • Corpus ID: 109012158
It could be argued that the biggest challenge of the 32 nm half pitch node is the production implementation of double patterning… Expand
2007
2007
As Moore's Law drives CD smaller and smaller, overlay budget is shrinking rapidly. Furthermore, the cost of advanced lithography… Expand
2007
2007
Overlay requirements for DRAM devices are decreasing faster than anticipated. With current methods overlay becomes ever harder to… Expand
2003
2003
With each new technology node, there is as usual a corresponding tightening of the overlay requirements. To achieve these… Expand
2002
2002
Abstract In the manufacture of semiconductor products, overlay is one of the most critical design specifications. Overlay is the… Expand
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