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Overlay Control

Known as: Overlay 
Overlay control is a term used in silicon wafer manufacturing. Silicon wafers are currently manufactured in a sequence of steps, each stage placing a… Expand
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Papers overview

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2013
2013
One of the main challenges related to the growing number of Litho layers and most specifically to Multi Patterning, is the… Expand
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Review
2008
Review
2008
  • Mike Adel
  • Lithography Asia
  • 2008
  • Corpus ID: 109012158
It could be argued that the biggest challenge of the 32 nm half pitch node is the production implementation of double patterning… Expand
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2007
2007
As Moore's Law drives CD smaller and smaller, overlay budget is shrinking rapidly. Furthermore, the cost of advanced lithography… Expand
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2007
2007
Overlay requirements for DRAM devices are decreasing faster than anticipated. With current methods overlay becomes ever harder to… Expand
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2007
2007
In the lithography section of the ITRS 2006 update, at the top of the list of difficult challenges appears the text "overlay of… Expand
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2007
2007
As a consequence of the shrinking sizes of the integrated circuit structures, the overlay budget shrinks as well. Overlay is… Expand
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2006
2006
A novel approach to overlay metrology, called Blossom, maximizes the number of layers measurable within a single optical field of… Expand
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2003
2003
With each new technology node, there is as usual a corresponding tightening of the overlay requirements. To achieve these… Expand
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2003
2003
Peer-to-peer networking enjoys euphoric support and fierce resistance simultaneously, and for the same reasons. It presents a… Expand
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2002
2002
Abstract In the manufacture of semiconductor products, overlay is one of the most critical design specifications. Overlay is the… Expand
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