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Overlay Control
Known as:
Overlay
Overlay control is a term used in silicon wafer manufacturing. Silicon wafers are currently manufactured in a sequence of steps, each stage placing a…
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Related topics
Related topics
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Semiconductor device fabrication
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
High-volume manufacturing device overlay process control
Honggoo Lee
,
Sangjun Han
,
+6 authors
J. Robinson
Advanced Lithography
2017
Corpus ID: 126065970
Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years…
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2013
2013
Multi layer overlay measurement recent developments
Nuriel Amir
,
N. Shuall
,
Inna Tarshish-Shapir
,
P. Leray
Advanced Lithography
2013
Corpus ID: 122207228
One of the main challenges related to the growing number of Litho layers and most specifically to Multi Patterning, is the…
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Review
2008
Review
2008
An update on the DPL overlay discontinuity
M. Adel
Lithography Asia
2008
Corpus ID: 109012158
It could be argued that the biggest challenge of the 32 nm half pitch node is the production implementation of double patterning…
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2008
2008
Dynamic Overlay Node Activation Algorithms for Large-Scale Service Deployments
J. Famaey
,
T. Wauters
,
F. Turck
,
B. Dhoedt
,
P. Demeester
IFIP/IEEE International Workshop on Distributed…
2008
Corpus ID: 543241
Due to overprovisioning of infrastructure nodes in overlay networks, many nodes remain idle at times of low network load. Some of…
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2007
2007
Non-linear methods for overlay control
M. Kupers
,
Dongsub Choi
,
B. Habets
,
G. Simons
,
E. Wallerbos
SPIE Advanced Lithography
2007
Corpus ID: 108450466
Overlay requirements for DRAM devices are decreasing faster than anticipated. With current methods overlay becomes ever harder to…
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2007
2007
The challenges of transitioning from linear to high-order overlay control in advanced lithography
M. Adel
,
P. Izikson
,
D. Tien
,
C. K. Huang
,
J. Robinson
,
B. Eichelberger
SPIE/COS Photonics Asia
2007
Corpus ID: 109881181
In the lithography section of the ITRS 2006 update, at the top of the list of difficult challenges appears the text "overlay of…
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2006
2006
Multilayer overlay metrology
C. P. Ausschnitt
,
J. Morningstar
,
+4 authors
N. Smith
SPIE Advanced Lithography
2006
Corpus ID: 110325459
A novel approach to overlay metrology, called Blossom, maximizes the number of layers measurable within a single optical field of…
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2004
2004
Novel at-design-rule via-to-metal overlay metrology for 193-nm lithography
A. Ueno
,
K. Tsujita
,
+4 authors
M. Adel
IEEE transactions on semiconductor manufacturing
2004
Corpus ID: 36785140
The effect of scanner aberrations on pattern placement errors (PPE) in the copper interconnect lithography process is studied…
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2003
2003
Knowledge-based APC methodology for overlay control
D. Laidler
,
P. Leray
,
D. Crow
,
K. Roberts
SPIE Advanced Lithography
2003
Corpus ID: 108530886
With each new technology node, there is as usual a corresponding tightening of the overlay requirements. To achieve these…
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2003
2003
Implementation of Adaptive Control for P2P Overlays
T. Koulouris
,
Robert Henjes
,
K. Tutschku
,
H. D. Meer
International Working Conference on Active…
2003
Corpus ID: 6666625
Peer-to-peer networking enjoys euphoric support and fierce resistance simultaneously, and for the same reasons. It presents a…
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