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Overlay Control

Known as: Overlay 
Overlay control is a term used in silicon wafer manufacturing. Silicon wafers are currently manufactured in a sequence of steps, each stage placing a… 
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Papers overview

Semantic Scholar uses AI to extract papers important to this topic.
2017
2017
Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years… 
2013
2013
One of the main challenges related to the growing number of Litho layers and most specifically to Multi Patterning, is the… 
Review
2008
Review
2008
  • M. Adel
  • 2008
  • Corpus ID: 109012158
It could be argued that the biggest challenge of the 32 nm half pitch node is the production implementation of double patterning… 
2008
2008
Due to overprovisioning of infrastructure nodes in overlay networks, many nodes remain idle at times of low network load. Some of… 
2007
2007
Overlay requirements for DRAM devices are decreasing faster than anticipated. With current methods overlay becomes ever harder to… 
2007
2007
In the lithography section of the ITRS 2006 update, at the top of the list of difficult challenges appears the text "overlay of… 
2006
2006
A novel approach to overlay metrology, called Blossom, maximizes the number of layers measurable within a single optical field of… 
2004
2004
The effect of scanner aberrations on pattern placement errors (PPE) in the copper interconnect lithography process is studied… 
2003
2003
With each new technology node, there is as usual a corresponding tightening of the overlay requirements. To achieve these… 
2003
2003
Peer-to-peer networking enjoys euphoric support and fierce resistance simultaneously, and for the same reasons. It presents a…