Skip to search form
Skip to main content
Skip to account menu
Semantic Scholar
Semantic Scholar's Logo
Search 230,668,841 papers from all fields of science
Search
Sign In
Create Free Account
Enhanced Graphics Adapter
Known as:
Ega
, EGA graphics
, IBM Enhanced Graphics Adapter
Expand
The Enhanced Graphics Adapter (EGA) is a historical IBM PC computer display standard from 1984 that superseded and exceeded the capabilities of the…
Expand
Wikipedia
(opens in a new tab)
Create Alert
Alert
Related topics
Related topics
50 relations
Audio and video interfaces and connectors
BIOS
BSAVE (bitmap format)
Bane of the Cosmic Forge
Expand
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2015
2015
Factors influencing women’s sexual health and reproductive choices in Estonia
M. Laanpere
2015
Corpus ID: 58346287
2013
2013
Advances in Soft Computing and Its Applications
Félix Castro
,
Alexander Gelbukh
,
Miguel A. González
Lecture Notes in Computer Science
2013
Corpus ID: 1139915
Genetic Algorithms (GAs) have long been recognized as powerful tools for optimization of complex problems where traditional…
Expand
2013
2013
A Petri Net and Extended Genetic Algorithm Combined Scheduling Method for Wafer Fabrication
F. Qiao
,
Yumin Ma
,
Li Li
,
Hongfei Yu
IEEE Transactions on Automation Science and…
2013
Corpus ID: 14468898
As one of the most complicated manufacturing processes, semiconductor manufacturing consists of four steps, wafer sort, wafer…
Expand
2009
2009
Recent progress of EUV full-field exposure tool in Selete
K. Tawarayama
,
H. Aoyama
,
S. Magoshi
,
Yuusuke Tanaka
,
S. Shirai
,
Hiroyuki Tanaka
Advanced Lithography
2009
Corpus ID: 120089870
The Selete full-field EUV exposure tool, the EUV1, was manufactured by Nikon and is being set up at Selete. Its lithographic…
Expand
2006
2006
Overlay improvement by using new framework of grid compensation for matching
A. Sukegawa
,
S. Wakamoto
,
Shinichi Nakajima
,
Masaharu Kawakubo
,
N. Magome
SPIE Advanced Lithography
2006
Corpus ID: 109543774
Overlay accuracy is a key issue in the semiconductor manufacturing process. To achieve overlay requirements, we developed…
Expand
2006
2006
Releases of NO and its precursors from coal combustion in a fixed bed
Yinhe Liu
,
D. Che
2006
Corpus ID: 55372096
2003
2003
Temperature effect on the formation of uniform self-assembled Ge dots
G. Jin
,
Jianlin Liu
,
Kang L. Wang
2003
Corpus ID: 8099874
The effect of the growth temperature on the formation of uniform self-assembled Ge dots on Si (001) substrates was studied. The…
Expand
1999
1999
Dopant diffusion in C-doped Si and SiGe: physical model and experimental verification
Holger Rücker
,
B. Heinemann
,
+7 authors
Peter Zaumseil
International Electron Devices Meeting…
1999
Corpus ID: 43588157
We show that B and P exhibit suppressed, and As and Sb enhanced diffusion in C-rich Si. This can be well described by coupled…
Expand
1996
1996
Using doping superlattices to study transient‐enhanced diffusion of boron in regrown silicon
K. Jones
,
R. Elliman
,
M. Petravić
,
P. Kringho
1996
Corpus ID: 16387205
A boron‐doped silicon superlattice consisting of three boron spikes separated by 1700 A of undoped silicon has been grown by…
Expand
Highly Cited
1981
Highly Cited
1981
Reaction time, evoked brain potentials, and psychometric g in the severely retarded
A. Jensen
,
E. W. Schafer
,
F. Crinella
1981
Corpus ID: 53484340
By clicking accept or continuing to use the site, you agree to the terms outlined in our
Privacy Policy
(opens in a new tab)
,
Terms of Service
(opens in a new tab)
, and
Dataset License
(opens in a new tab)
ACCEPT & CONTINUE