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triphenylsulfonium ion

National Institutes of Health

Papers overview

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2016
2016
Understanding of stochastic phenomena is essential to the development of highly sensitive resist for nanofabrication. In this… 
2014
2014
Negative tone resists based on cross-linking via epoxide/cationic polymerization have a variety of potential advantages over more… 
2010
2010
Molecular resists are of increasing interest as a route to improving the resolution - line width roughness - sensitivity trade… 
2007
2007
A novel method for performing top surface imaging (TSI) on a single polymeric photoresist film using area selective atomic layer… 
2006
2006
As reported previously, we developed a novel oxime sulfonate type of photoacid generator (PAG), 2-[2,2,3,3,4,4,5,5,6,6,7,7… 
2005
2005
We have investigated the possibility of amorphous low molecular weight polyphenols as a chemically amplified positive-tone… 
2005
2005
The microelectronics industry is increasingly looking towards high resolution lithographic techniques, such as electron beam (E… 
2004
2004
It is confirmed that strong inhibitors must not only interact with the polymer but also are highly hydrophobic. A proportional… 
1998
1998
A new, simple, highly sensitive, and reliable technique has been developed for measuring acid concentration in solutions and in… 
1991
1991
The reverse polarity change from a polar to a nonpolar state has been successfully incorporated in the design of chemical…