hafnium oxide
National Institutes of Health
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Single crystals of (NH4)14[Hf9O8(OH)6(SO4)14]·nH2O (1) were obtained by heating a sealed aqueous solution of HfOCl2·8H2O, (NH4…
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We present a class of electrowetting systems in which lipid bilayers on thin hafnium oxide films function as reversibly wettable…
ZrO2 and reference HfO2 films grown by atomic layer deposition from metal cyclopentadienyls and ozone as precursors to…
In this paper, the electrochemical deposition and anneal method has been developed to modulate the contact performance of…
We demonstrate current-voltage spectroscopy of the one-dimensional subband structure of pinched-off quantum point contacts (QPCs…
Atomic layer deposition (ALD) is an important method for depositing the nanometer-scale, conformal high κ dielectric layers…
The physics and effects of nitrogen incorporation into HfO2 films were studied in detail. The authors found that only a trace…
Low-temperature supercritical fluid (SCF) technology is employed to improve the dielectric characteristics of metal oxide film…
Two ultra-high-temperature materials, hafnium carbide and hafnium diboride, were oxidized in the temperature range 1400 to 2100 C…