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Texture mapping unit
Known as:
Texture-mapping unit
, TMU
, Texture mapping units
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A texture mapping unit (TMU) is a component in modern graphics processing units (GPUs), historically it was a separate physical processor. A TMU is…
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Related topics
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44 relations
AMD Radeon Rx 200 series
ARM Cortex-A15
ATI video card suffixes
ATi Radeon R300 Series
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Broader (1)
Graphics hardware
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
2014
2014
Impact of shrinking measurement error budgets on qualification metrology sampling and cost
M. Sendelbach
,
Niv Sarig
,
+7 authors
C. Archie
Advanced Lithography
2014
Corpus ID: 122621440
When designing an experiment to assess the accuracy of a tool as compared to a reference tool, semiconductor metrologists are…
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2010
2010
Aggregate Statistics of National Traffic Management Initiatives
J. Rios
2010
Corpus ID: 167327449
Balancing traffic demand and capacity in the National Airspace System is accomplished through the use of various Traffic…
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Highly Cited
2007
Highly Cited
2007
Movement-Aware Vertical Handoff of WLAN and Mobile WiMAX for Seamless Ubiquitous Access
Wonjun Lee
,
Eunkyo Kim
,
Joongheon Kim
,
Inkyu Lee
,
Choonhwa Lee
IEEE transactions on consumer electronics
2007
Corpus ID: 20396986
This paper addresses a movement-aware vertical (MAV) handover algorithm between WLAN and Mobile WiMAX for seamless ubiquitous…
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2006
2006
A comprehensive test of optical scatterometry readiness for 65-nm technology production
V. Ukraintsev
SPIE Advanced Lithography
2006
Corpus ID: 108886600
Measurement bias is a central concept of critical dimension (CD) metrology. Bias is a complex function of sample, tool and time…
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Review
2005
Review
2005
Multipurpose lidar system for observations of equatorial atmosphere
C. Nagasawa
,
M. Abo
,
Y. Shibata
SPIE Asia-Pacific Remote Sensing
2005
Corpus ID: 128960243
We have constructed the lidar facility for survey of atmospheric structure over troposphere, stratosphere, mesosphere and low…
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2004
2004
Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology
Bill Banke
,
C. Archie
,
+6 authors
E. Solecky
SPIE Advanced Lithography
2004
Corpus ID: 110702909
Perhaps never before in semiconductor microlithography has there been such an interest in the accuracy of measurement. This…
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2004
2004
Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis
M. Sendelbach
,
C. Archie
,
+4 authors
M. Hankinson
SPIE Advanced Lithography
2004
Corpus ID: 109398425
Currently, CD-SEMs are the tool of choice for in-line gate length measurements for most semiconductor manufacturers. This is in…
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2001
2001
A TIME-BASED APPROACH TO METERING ARRIVAL TRAFFIC TO PHILADELPHIA
Todd Parley
,
J. Foster
,
Ty Hoang
,
Katharine K. Lee
2001
Corpus ID: 51932948
Time-based metering via the Traffic Management Advisor (TMA) has significantly improved arrival operations at capacity…
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1998
1998
On-line quantitative determination of2H/1H isotope ratios in organic and water samples using an elemental analyser coupled to an isotope ratio mass spectrometer
S. Kelly
,
I. Parker
,
M. Sharman
,
M. Dennis
1998
Corpus ID: 42273270
A rapid continuous-flow technique for the quantitative determination of hydrogen isotope ratios in organic materials and water…
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1992
1992
A Posteriori Agreement for Clock Synchronization on Broadcast Networks
Luís E. T. Rodrigues
,
P. Veríssimo
1992
Corpus ID: 14679210
We present a clock synchronization algorithm, dubbed a posteriori agreement, based on a new variant of the well-known convergence…
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