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The goal of the SFIL development program is to enable patterning of sub-100 nm features at room temperature and with minimal… Expand This paper presents the design of orientation stages for high-resolution imprint lithography machines. These machines implement a… Expand Step and flash imprint lithography (SFIL) is a technique that has the potential to replace photolithography for patterning resist… Expand Step and flash imprint lithography (SFIL) is an alternative approach to high-resolution patterning based on a bilayer imprint… Expand Submicron patterning of 1 in. diameter curved surfaces with a 46 mm radius of curvature has been demonstrated with step and flash… Expand OBJECTIVES: To compare genotypic methods for epidemiologic typing of Legionella pneumophila serogroup (sg) 1, in order to… Expand A physical map of the chromosome of Oenococcus oeni PSU-1 was constructed. This represents the first map for a strain of this… Expand A physical map of the chromosome of Neisseria meningitidis B1940 has been constructed by one‐ and two‐dimensional pulsed‐field… Expand Genetic and molecular studies show that the Duchenne muscular dystrophy (DMD) locus at Xp21 is large and complex. We have… Expand Employing pulsed field gradient electrophoresis, we constructed a 4.5 million bp (Mb) Sfil restriction map of the human X… Expand