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Quantum lithography
Quantum lithography is a type of photolithography, which exploits non-classical properties of the photons, such as quantum entanglement, in order to…
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8 relations
NOON state
Quantum
Quantum entanglement
Quantum imaging
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Quantum information science
Quantum mechanics
Papers overview
Semantic Scholar uses AI to extract papers important to this topic.
Highly Cited
2008
Highly Cited
2008
Imprinted large-scale high density polymer nanopillars for organic solar cells
Mukti Aryal
,
F. Buyukserin
,
+4 authors
Wenchuang (Walter) Hu
2008
Corpus ID: 96068726
Nanoimprint with a large-scale nanoporous Si mold is developed to fabricate high density periodic nanopillars (∼1010∕cm2) in…
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Highly Cited
2006
Highly Cited
2006
Well-ordered ZnO nanowire arrays on GaN substrate fabricated via nanosphere lithography
H. Fan
,
B. Fuhrmann
,
+4 authors
M. Zacharias
2006
Corpus ID: 55301704
Highly Cited
2005
Highly Cited
2005
6 nm half-pitch lines and 0.04 µm2 static random access memory patterns by nanoimprint lithography
Michael D. Austin
,
Wei Zhang
,
Haixiong Ge
,
D. Wasserman
,
S. Lyon
,
S. Chou
2005
Corpus ID: 17417070
A key issue in nanoimprint lithography (NIL) is determining the ultimate pitch resolution achievable for various pattern shapes…
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Highly Cited
2004
Highly Cited
2004
8 Gb MLC (multi-level cell) NAND flash memory using 63 nm process technology
Jong-Ho Park
,
S. Hur
,
+16 authors
B. Ryu
IEDM Technical Digest. IEEE International…
2004
Corpus ID: 41792224
For the first time, 8 Gb multi-level cell (MLC) NAND flash memory with 63 nm design rule is developed for mass storage…
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Highly Cited
2003
Highly Cited
2003
Nanolithography Using Hierarchically Assembled Nanowire Masks
D. Whang
,
†§ and Song Jin
,
Charles M. Lieber
2003
Corpus ID: 138371197
A general and scalable method has been developed for patterning nanometer scale lines hierarchically over large areas using…
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Highly Cited
2000
Highly Cited
2000
Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
Mingtao Li
,
J. Wang
,
L. Zhuang
,
S. Chou
2000
Corpus ID: 122623227
We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm…
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Highly Cited
1999
Highly Cited
1999
Nanosphere Lithography: Surface Plasmon Resonance Spectrum of a Periodic Array of Silver Nanoparticles by Ultraviolet−Visible Extinction Spectroscopy and Electrodynamic Modeling
Traci R. Jensen
,
G. Schatz
,
R. P. Duyne
1999
Corpus ID: 54828139
In this paper we measure the optical extinction spectrum of a periodic array of silver nanoparticles fabricated by nanosphere…
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Highly Cited
1997
Highly Cited
1997
Nanostructure fabrication using electron beam and its application to nanometer devices
S. Matsui
Proceedings of the IEEE
1997
Corpus ID: 62365783
Nanofabrication developed by using electron beam (EB) are described. Ten-nm structures of organic positive and negative resist…
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Highly Cited
1995
Highly Cited
1995
Atomic force microscope lithography using amorphous silicon as a resist and advances in parallel operation
S. Minne
,
P. Flueckiger
,
H. Soh
,
C. Quate
1995
Corpus ID: 51694478
Lithography on (100) single‐crystal silicon and amorphous silicon is performed by electric‐field‐enhanced local oxidation of…
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Highly Cited
1993
Highly Cited
1993
Multiple-exposure interferometric lithography
S. H. Zaidi
,
S. Brueck
Advanced Lithography
1993
Corpus ID: 95019657
Interferometric lithography provides a simple, inexpensive technique for the fabrication of large areas of extreme sub…
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