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The successful design of nanofluidic devices for the manipulation of biopolymers requires an understanding of how the predictions of soft condensed matter physics scale with device dimensions. Here we present measurements of DNA extended in nanochannels and show that below a critical width roughly twice the persistence length there is a crossover in the(More)
High density metal cross bars at 17 nm half-pitch were fabricated by nanoimprint lithography. Utilizing the superlattice nanowire pattern transfer technique, a 300-layer GaAs/AlGaAs superlattice was employed to produce an array of 150 Si nanowires (15 nm wide at 34 nm pitch) as an imprinting mold. A successful reproduction of the Si nanowire pattern was(More)
We introduce the concept of wafer bowing to affect nanoimprinting. This approach allows a design that can fit the key imprinting mechanism into a compact module, which we have constructed and demonstrated with an overlay and resolution of <0.5 microm and <10 nm, respectively. In the short term, this wafer bowing approach makes nanoimprint lithography much(More)
The dynamical conductance of electrically contacted single-walled carbon nanotubes is measured from dc to 10 GHz as a function of source-drain voltage in both the low-field and high-field limits. The ac conductance of the nanotube itself is found to be equal to the dc conductance over the frequency range studied for tubes in both the ballistic and diffusive(More)
To optimize nanoimprint lithography (NIL), it is essential to be able to characterize and control the NIL process in situ and in real time. Here, we present a method for in situ real-time NIL process characterization using time-resolved diffractive scatterometry (TRDS). A surface relief diffraction grating is used as the imprint mold, and the diffracted(More)
In this article we report on the fabrication of subwavelength antireflection structures on silicon substrates using a trilayer resist nanoimprint lithography and liftoff process. We have fabricated cone-shaped nanoscale silicon pillars with a continuous effective index gradient, which greatly enhances its antireflective performances. Our measurements show(More)
Line edge roughness is an important factor contributing to the problem of performance degradation in various nanoscale devices. We have developed two smoothing techniques based on nanoimprint lithography for the fabrication of nanoscale gratings with significantly reduced line edge roughness. Compared with other smoothing techniques reported before, our(More)
In this article we report on the fabrication of 100 nm pitch gratings over a large area ~;10 cm! using a simple, low-cost, fast process. This method includes ~1! generation of the grating pattern using interferometric lithography and spatial frequency doubling and ~2! pattern replication using nanoimprint lithography. The form birefringence of a 100 nm(More)
We propose and demonstrate a nanopatterning technique, laser-assisted nanoimprint lithography ~LAN!, in which the polymer is melted by a single excimer laser pulse and then imprinted by a mold made of fused quartz. LAN has been used to pattern nanostructures in various polymer films on a Si or quartz substrate with high fidelity over the entire mold area.(More)